Patents by Inventor Masasi Saito

Masasi Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5455082
    Abstract: A reduced pressure processing system includes a load lock chamber having an opening communicating with a process atmosphere in which a wafer is processed and/or the outer air atmosphere, a gate valve which is arranged at the opening to close/open the chamber with respect to the process atmosphere and/or the outer air atmosphere, a robot for loading/unloading the wafer into/from the chamber, an evacuation pump for evacuating the chamber, a heater for heating the wall of the chamber, and a controller for controlling the gate valve, the robot, the evacuation pump, and the heater.
    Type: Grant
    Filed: January 28, 1994
    Date of Patent: October 3, 1995
    Assignee: Tokyo Electron Limited
    Inventors: Masasi Saito, Teruo Iwata, Nobuo Ishii, Towl Ikeda, Hiroaki Saeki
  • Patent number: 5314541
    Abstract: A reduced pressure processing system includes a load lock chamber having an opening communicating with a process atmosphere in which a wafer is processed and/or the outer air atmosphere, a gate valve which is arranged at the opening to close/open the chamber with respect to the process atmosphere and/or the outer air atmosphere, a robot for loading/unloading the wafer into/from the chamber, an evacuation pump for evacuating the chamber, a heater for heating the wall of the chamber, and a controller for controlling the gate valve, the robot, the evacuation pump, and the heater.
    Type: Grant
    Filed: May 28, 1992
    Date of Patent: May 24, 1994
    Assignee: Tokyo Electron Limited
    Inventors: Masasi Saito, Teruo Iwata, Nobuo Ishii, Towl Ikeda, Hiroaki Saeki