Patents by Inventor Masataka Fukuizumi

Masataka Fukuizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7232504
    Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.
    Type: Grant
    Filed: November 22, 2002
    Date of Patent: June 19, 2007
    Assignee: Fujitsu Limited
    Inventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
  • Patent number: 7183117
    Abstract: A supply apparatus for preparing a mixed chemical solution of a predetermined mixing ratio at a low cost and for supplying the mixed chemical solution stably. The supply apparatus includes a measuring apparatus located on an intermediate portion of a flow channel through which the chemical solution flows upward for measuring properties of the mixed chemical solution. In the lower portion of the measuring apparatus, disposed is a nozzle for spouting the chemical solution upward.
    Type: Grant
    Filed: October 22, 2002
    Date of Patent: February 27, 2007
    Assignee: Fujitsu Limited
    Inventors: Masataka Fukuizumi, Hiroshi Osuda, Toru Matoba, Takeshi Nakamura
  • Patent number: 7144552
    Abstract: A chemical solution preparation apparatus for preparing a chemical solution from chemical gas of an industrial chemical grade. A dissolution unit dissolves the chemical gas in pure water, which is contained in a tank. A gas discharge control unit controls the amount of chemical gas discharged from the dissolution unit. A liquid discharge discharges a predetermined amount of the chemical solution from the tank. At least one of the gas discharge control unit and the liquid discharge control unit are operated at substantially the same time as the dissolution unit.
    Type: Grant
    Filed: July 19, 2000
    Date of Patent: December 5, 2006
    Assignee: Fujitsu Limited
    Inventors: Masataka Fukuizumi, Toru Matoba, Hiroshi Osuda
  • Patent number: 7052599
    Abstract: An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: May 30, 2006
    Assignee: Fujitsu Limited
    Inventors: Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi
  • Publication number: 20040069878
    Abstract: An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.
    Type: Application
    Filed: October 2, 2003
    Publication date: April 15, 2004
    Applicant: FUJITSU LIMITED
    Inventors: Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi
  • Patent number: 6656359
    Abstract: An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: December 2, 2003
    Assignee: Fujitsu Limited
    Inventors: Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi
  • Publication number: 20030119198
    Abstract: A supply apparatus for preparing a mixed chemical solution of a predetermined mixing ratio at a low cost and for supplying the mixed chemical solution stably. The supply apparatus includes a measuring apparatus located on an intermediate portion of a flow channel through which the chemical solution flows upward for measuring properties of the mixed chemical solution. In the lower portion of the measuring apparatus, disposed is a nozzle for spouting the chemical solution upward.
    Type: Application
    Filed: October 22, 2002
    Publication date: June 26, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Masataka Fukuizumi, Hiroshi Osuda, Toru Matoba, Takeshi Nakamura
  • Publication number: 20030079981
    Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.
    Type: Application
    Filed: November 22, 2002
    Publication date: May 1, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
  • Patent number: 6508915
    Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.
    Type: Grant
    Filed: December 17, 1997
    Date of Patent: January 21, 2003
    Assignee: Fujitsu Limited
    Inventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
  • Patent number: 6477323
    Abstract: A heating vessel for concentration is formed in an elongated one, and a baffle plate is arranged to increase sulfuric acid liquid concentration at an outlet to a high level. The heating vessel for concentration and a heating vessel for distillation are installed so that the respective heating vessels have substantially the same waste sulfuric acid liquid level therein, forming continuous flow of the sulfuric acid liquid without presence of a valve or an intermediate tank in a connecting pipe. The heating vessel for distillation is formed in an elongated one with a baffle plate arranged therein to increase the impurity concentration included in concentrated sulfuric acid liquid at an outlet to a high level.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: November 5, 2002
    Assignee: Asahi Techno Glass Corporation
    Inventors: Kiyohito Koizumi, Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi, Takayuki Sadakata
  • Publication number: 20010003555
    Abstract: A heating vessel for concentration is formed in an elongated one, and a baffle plate is arranged to increase sulfuric acid liquid concentration at an outlet to a high level. The heating vessel for concentration and a heating vessel for distillation are installed so that the respective heating vessels have substantially the same waste sulfuric acid liquid level therein, forming continuous flow of the sulfuric acid liquid without presence of a valve or an intermediate tank in a connecting pipe. The heating vessel for distillation is formed in an elongated one with a baffle plate arranged therein to increase the impurity concentration included in concentrated sulfuric acid liquid at an outlet to a high level.
    Type: Application
    Filed: March 30, 1998
    Publication date: June 14, 2001
    Inventors: KIYOHITO KOIZUMI, HIROSHI OSUDA, TORU MATOBA, MASATAKA FUKUIZUMI, TAKAYUKI SADAKATA