Patents by Inventor Masataka GOSHO

Masataka GOSHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11901197
    Abstract: A substrate processing apparatus includes: a processing container to which a supercritical fluid is supplied, the processing container being configured to dry a substrate by replacing a drying liquid collected on the substrate with the supercritical fluid; a discharge line configured to discharge a mixed fluid containing the supercritical fluid and the drying liquid from an interior of the processing container; and a density detector configured to detect a density of the mixed fluid flowing through the discharge line.
    Type: Grant
    Filed: March 8, 2022
    Date of Patent: February 13, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Masataka Gosho, Reijiro Yamanaka
  • Publication number: 20230282493
    Abstract: A substrate processing system includes: a carry-in/out section in which a cassette accommodating a plurality of substrates is carried in/out; a batch processing section in which a wafer lot including the plurality of substrates is collectively processed in a state where each of the plurality of substrates stand upright; a single-wafer processing section in which the plurality of substrates included in the wafer lot are processed one by one in a horizontal state; and an interface section that delivers the plurality of substrates from the batch processing section to the single-wafer processing section. The interface section includes: a standby table that horizontally holds a substrate in a state of being in contact with pure water; and a transfer mechanism that delivers the substrate from the batch processing section to the standby table.
    Type: Application
    Filed: February 28, 2023
    Publication date: September 7, 2023
    Inventors: Keita HIRASE, Yukiyoshi SAITO, Akihiro TERAMOTO, Koji TANAKA, Shota TAKEI, Masataka GOSHO, Kazuaki KITAMURA, Shinichi IKEDA, Shunsuke KURIZAKI, Yuji KIMURA
  • Publication number: 20230187233
    Abstract: There is provided a substrate processing apparatus comprising a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.
    Type: Application
    Filed: February 9, 2023
    Publication date: June 15, 2023
    Inventors: Masataka GOSHO, Yuichi DOUKI, Satoshi BIWA, Satoshi OKAMURA, Katsuhiro OOKAWA, Yuichiro KUNUGIMOTO
  • Publication number: 20220301895
    Abstract: A substrate processing apparatus includes: a processing container to which a supercritical fluid is supplied, the processing container being configured to dry a substrate by replacing a drying liquid collected on the substrate with the supercritical fluid; a discharge line configured to discharge a mixed fluid containing the supercritical fluid and the drying liquid from an interior of the processing container; and a density detector configured to detect a density of the mixed fluid flowing through the discharge line.
    Type: Application
    Filed: March 8, 2022
    Publication date: September 22, 2022
    Inventors: Masataka GOSHO, Reijiro YAMANAKA
  • Publication number: 20220254658
    Abstract: A substrate processing apparatus configured to dry a substrate having a liquid film formed on a pattern formation surface thereof with a supercritical fluid includes a processing vessel which is configured to accommodate the substrate therein and into which the supercritical fluid is supplied; a substrate holder which has a base member configured to support the substrate from below while allowing the pattern formation surface of the substrate to face upwards, and which is configured to hold the substrate within the processing vessel; a first detector configured to detect an inclination of the base member with respect to a horizontal plane; a posture adjusting device configured to adjust the inclination of the base member with respect to the horizontal plane; and a controller configured to control the posture adjusting device to perform horizontal leveling of the base member based on a detection result of the first detector.
    Type: Application
    Filed: February 4, 2022
    Publication date: August 11, 2022
    Inventors: Shogo Fukui, Masataka Gosho, Satoshi Okamura, Tomohito Ura
  • Publication number: 20220074660
    Abstract: A substrate processing apparatus for drying a substrate by substituting a liquid film of a drying liquid formed on the substrate with a supercritical fluid incudes: a pressure container configured to accommodate the substrate on which the liquid film is formed; a discharge line configured to discharge a fluid inside the pressure container; a depressurizing valve provided in a middle of the discharge line; and a concentration measurement part configured to measure a concentration of vapor of the drying liquid in the fluid flowing through the discharge line, wherein the concentration measurement part is provided on a downstream side of the depressurizing valve of the discharge line and measures the concentration of the drying liquid in the fluid depressurized by the depressurizing valve.
    Type: Application
    Filed: September 1, 2021
    Publication date: March 10, 2022
    Inventors: Masataka GOSHO, Shu YAMAMOTO, Tomohito URA, Satoshi OKAMURA
  • Publication number: 20190206702
    Abstract: There is provided a substrate processing apparatus comprising a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.
    Type: Application
    Filed: January 2, 2019
    Publication date: July 4, 2019
    Inventors: Masataka GOSHO, Yuichi DOUKI, Satoshi BIWA, Satoshi OKAMURA, Katsuhiro OOKAWA, Yuichiro KUNUGIMOTO