Abstract: According to one embodiment, an inspection device includes: an image generation device configured to generate a second image corresponding to a first image; and a defect detection device configured to estimate a nonlinear shift based on a plurality of partial region sets, each of the partial region sets including a first partial region in the first image and a second partial region in the second image corresponding to the first partial region, and detect a defect in the second image from the first image.

Abstract: An electron beam inspection apparatus includes an acquisition processing circuitry to acquire surface material information presenting a surface material of the substrate and a value of an acceleration voltage of an electron beam; a sequence determination processing circuitry to determine a scan sequence of a plurality of stripe regions on the basis of the surface material of the substrate and the value of the acceleration voltage, the plurality of stripe regions obtained by virtually dividing an inspection region of the substrate in a stripe shape; a secondary electron image acquisition mechanism including a detector for detecting a secondary electron and configured to scan the plurality of stripe regions of the substrate according to a determined scan sequence and to acquire a secondary electron image of the substrate; and a comparison processing circuitry to compare the secondary electron image with a corresponding reference image.

Abstract: An apparatus according to an embodiment comprises: a laser source that outputs a laser beam; an optical system that modifies the laser beam, and directs the modified laser beam onto a test object; a signal detector that detects a change of signal in the process of irradiating the test object with the modified laser beam; and a computer system that performs a failure analysis based on the change detected by the signal detector, wherein the optical system modifies the laser beam so that the modified laser beam generates an irradiation zone that includes a first intensity component of which peak intensity is near an irradiation axis and a second intensity component of which peak intensity is around the irradiation axis.

Abstract: There is provided an inspection method including acquiring an inspection image by irradiating a sample with a plurality of electron beams and by simultaneously scanning the sample by the electron beams, performing first correction of a reference image corresponding to the inspection image or second correction of the inspection image based on a plurality of distortions of each of the electron beams and on a position scanned by each of the electron beams in the inspection image, and performing first comparison of the reference image subjected to the first correction with the inspection image or second comparison of the reference image with the inspection image subjected to the second correction.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes: a first sub-pixel interpolation processing circuitry configured to calculate a pixel value of a reference image corresponding to a position of each pixel of the inspection target image by performing an interpolation process using at least one pixel value of the reference image for each shift amount while variably and relatively shifting the inspection target image and the reference image by the unit of a sub-pixel using the reference image corresponding to the inspection target image; and an SSD calculation processing circuitry configured to calculate a sum of squared difference between each pixel value of the inspection target image and a corresponding pixel value of the reference image subjected to a filter process for the each shift amount.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes reference outline creation processing circuitry configured to create a reference outline of a reference figure pattern, which serves as a reference, by using pattern data of a design pattern that serves as a base of a figure pattern formed on a substrate; outline extraction processing circuitry configured to extract an outline of the figure pattern in the measurement image from the measurement image using, as starting points, a plurality of points that are positioned on the reference outline; and comparison processing circuitry configured to compare the reference outline with the outline of the figure pattern.

Abstract: In one embodiment, an illumination device includes a light-guiding unit having a light output surface which outputs light and a back surface facing the light output surface, wherein the light-guiding unit has a curved surface in a region of the back surface farther than a first position on the back surface that is away by a first distance from an axis passing the light output surface and the back surface, and a rough surface in a region of the light output surface farther than a second position on the light output surface that is away by a second distance from the axis in a same direction as a direction from the axis toward the first position, and where an intersection of the axis and the back surface is an origin point, and a direction of the axis from the back surface to the light output surface is positive, a normal line of the curved surface intersects with the axis at the positive side of the axis, and an angle formed by a normal line vector at the second position in a direction toward the light output s

Abstract: A charged particle beam inspection apparatus includes a first deflector to deflect N×N? multiple beams collectively to N×N? small regions having a size p/M in the first direction and arrayed at the pitch p in the first direction, perform tracking deflection, and re-deflect the multiple beams collectively to next N×N? small regions away from the N×N? small regions by N small regions in the first direction, by the stage completes a movement of a distance of N/M×p so as to reset the tracking deflection; and a second deflector to deflect the multiple beams collectively to scan the N×N? small regions concerned while the tracking deflection is performed.

Abstract: A charged particle beam inspection apparatus includes a first deflector to deflect N×N? multiple beams collectively to N×N? small regions having a size p/M in the first direction and arrayed at the pitch p in the first direction, perform tracking deflection, and re-deflect the multiple beams collectively to next N×N? small regions away from the N×N? small regions by N small regions in the first direction, by the stage completes a movement of a distance of N/M×p so as to reset the tracking deflection; and a second deflector to deflect the multiple beams collectively to scan the N×N? small regions concerned while the tracking deflection is performed.

Abstract: An apparatus according to an embodiment comprises: a laser source that outputs a laser beam; an optical system that modifies the laser beam, and directs the modified laser beam onto a test object; a signal detector that detects a change of signal in the process of irradiating the test object with the modified laser beam; and a computer system that performs a failure analysis based on the change detected by the signal detector, wherein the optical system modifies the laser beam so that the modified laser beam generates an irradiation zone that includes a first intensity component of which peak intensity is near an irradiation axis and a second intensity component of which peak intensity is around the irradiation axis.

Abstract: An LED lighting device of embodiment comprising an LED light source which generates an ultraviolet light or a visible light, an axisymmetric transparent member which is provided over the light source and which is transparent to visible light, and an axisymmetric light scattering member disposed in the transparent member apart from the light source. A distance of closest approach L2 between the light source and the light scattering member, and an area C of a light emitting surface of the light source satisfy the settled relation. A length L1 of the light scattering member, and an absorption coefficient ? (1/mm) of the light scattering member satisfy the settled relation. A diameter d1 of the bottom surface of the light scattering member, the distance of closest approach L2, and a refractive index n of the transparent member satisfy the settled relation.

Abstract: According to one embodiment, an image sensor includes an image-sensing element region formed by arranging a plurality of image-sensing elements on a semiconductor substrate, and a logic circuit region formed in a region different from the image-sensing element region on the substrate and including a plurality of gate patterns. Further, dummy gate patterns are formed with a constant pitch on the image-sensing element region.

Abstract: According to one embodiment, a microwave annealing apparatus is provided, including a housing shielding electromagnetic waves, a first electromagnetic wave source configured to apply a first electromagnetic wave into the housing, a second electromagnetic wave source configured to apply, into the housing, a second electromagnetic wave having a higher frequency than the first electromagnetic wave, a susceptor configured to hold a semiconductor substrate, made of a material transparent to the first electromagnetic wave and provided in the housing, a temperature measuring device configured to measure the temperature of the semiconductor substrate, and a control unit configured to control the power of each of the first and second electromagnetic wave sources in accordance with the temperature measured by the temperature measuring device.

Abstract: In one embodiment, a light emitting device includes: a light source which emits light; a light guide portion which has an emission surface which emits light and a back surface which opposes to the emission surface, and which has at the back surface a reflecting portion which the light emitted from the light source enters and which reflects the entering light toward the emission surface; a heat transfer portion which opposes to the back surface of the light guide portion and is provided with an interval which is a wavelength of the light or more being spaced from the back surface; and a support portion which is provided between the reflecting portion and the heat transfer portion, and which keeps the interval between the light guide portion and the heat transfer portion.

Abstract: According to an embodiment, a light beam scanner includes a first mirror and an angular magnification unit. The first mirror makes a normal direction of a reflecting surface change repeatedly. The angular magnification unit is configured to return, when viewed from a first direction, reflected light from the first mirror to the first mirror so that light is reflected at substantially the same points on the first mirror for a plural number of times, and increase, when viewed from the first direction, an angle each time light is reflected from the first mirror, the angle being between the normal direction of the reflecting surface and a reflection direction of light. Light is emitted from the angular magnification unit after the light is reflected from the first mirror for a predetermined number of times.

Abstract: According to one embodiment, a lighting apparatus comprises a light source configured to generate heat, a transparent heat transfer member located near the light source and having transparency and heat conductivity, and a means for transferring heat from the light source to the transparent heat transfer member.

Abstract: A light guide plate according to an embodiment includes an exit surface where light exits, a rear surface facing this exit surface, and an end face connecting the exit surface and the rear surface. The light guide plate is transparent when no light is entering from the end face. First light scattering means is provided in the rear surface to inwardly reflect the light which has entered from the end face. Second light scattering means is provided in the exit surface to transmit more light than the first light scattering means.

Abstract: A lighting apparatus, comprising: a light source that emits light; a hollow heat-transfer member including an outer surface on which the light source is disposed; and a light guiding member that covers the light source and at least part of the outer surface along the outer surface.

Abstract: According to one embodiment, a projector includes a light source unit, a light scanning unit, and a focus controller. The light source unit emits laser light. The light scanning unit includes a holder and a reflective surface. The holder is capable of a first rotation operation around a first direction. The reflective surface is held by the holder and is capable of a second rotation operation around a second direction intersecting the first direction. The light scanning unit scans the laser light by the first and second rotation operations. The focus controller is provided between the light source unit and the light scanning unit in an optical path of the laser light to modify a convergence of the laser light. An angle between a plane including the first and second directions, and an image surface is not less than 80 degrees and not more than 100 degrees.

Abstract: According to one embodiment, an image sensor includes an image-sensing element region formed by arranging a plurality of image-sensing elements on a semiconductor substrate and element isolation portions formed to isolate the image-sensing elements, and a logic circuit region formed in a region different from the image-sensing element region on the substrate and including a plurality of gate patterns. Further, dummy element isolation portions are arranged with a constant pitch in the boundary region between the image-sensing element region and the logic circuit region.