Patents by Inventor Masataka Tamura

Masataka Tamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020036190
    Abstract: An underwater laser processing apparatus includes an optical unit and a nozzle. The optical unit irradiates a condensed laser beam generated by a YAG laser oscillator to a certain point on a underwater workpiece. The nozzle has a gas exit for supplying a gas to the certain point. In the nozzle, an area surrounding the gas exit extends to the surface of the workpiece. This area keeps the supplied gas between the nozzle and the workpiece to improve the underwater laser process.
    Type: Application
    Filed: September 28, 2001
    Publication date: March 28, 2002
    Inventors: Masataka Tamura, Seiichiro Kimura, Yuuichi Motora, Hidenori Takahashi
  • Patent number: 5770785
    Abstract: A hydrogen source and carbon dioxide are activated by irradiating a high energy beam onto the hydrogen source formed of hydrogen gas and/or a gaseous hydrogen compound, and onto exhaust gas containing carbon dioxide. The carbon dioxide contained in the exhaust gas is reduced by the activated hydrogen in order to transform the carbon dioxide into a solid or liquid compound and then recover it. It is preferable to dispose mesh materials for promoting the reduction reaction with the carbon dioxide in the exhaust gas in multiple layers within the reaction container. The size of the aperture of the mesh materials is set so as to gradually decrease in the direction of the flow of the mixed gas. It is also preferable to form the cross-sectional area of the reaction container so as to gradually decrease in the direction of the flow of the mixed gas.
    Type: Grant
    Filed: July 8, 1993
    Date of Patent: June 23, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masataka Tamura, Yutaka Ishiwata, Yoshiyasu Itoh
  • Patent number: 5509472
    Abstract: A heat-resisting plate employed in various devices that handle high temperature plasma or high energy particles, including a metallic substrate having a cooling structure wherein cooling pipes are embedded against the substrate by a thermal spray layer of the same material as the metallic substrate on one or both faces of the metallic substrate. In forming the heat-resisting plate, the metallic substrate is processed to the form of a plate, cooling pipes are arranged on one or both faces of this metallic substrate, and the cooling pipes are fixed by spraying a thermal spray layer on the face or faces of the metallic substrate where the cooling pipes are arranged, thereby to embed the cooling pipes between the thermal spray layer and the metallic substrate.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: April 23, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masataka Tamura, Yutaka Ishiwata, Yoshiyasu Itoh
  • Patent number: 5210426
    Abstract: This invention provides an electron beam irradiation device employing a material containing a Ti-A1 intermetallic composite as the material of an electron beam permeable window for allowing passage to the outside of a chamber of an electron beam generated in the chamber. Also, this invention provides a method of manufacturing an electron beam permeable window containing a Ti-A1 intermetallic composite by manufacturing a window-frame mounted titanium foil by fixing titanium foil between an outer window frame and an inner window frame of an electron beam permeable window, coating this with aluminium and titanium by converting aluminium and titanium to a metallic vapor state and subjecting this to thermal diffusion treatment.
    Type: Grant
    Filed: October 15, 1991
    Date of Patent: May 11, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyasu Itoh, Yutaka Ishiwata, Masataka Tamura