Patents by Inventor Masatake JOYABU

Masatake JOYABU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11578028
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: February 14, 2023
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Masatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
  • Publication number: 20220372220
    Abstract: Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1): (in formula (1), A1 represents an alkylene group having 10 to 14 carbon atoms, A2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2): (in formula (2), A1, A2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.
    Type: Application
    Filed: September 23, 2020
    Publication date: November 24, 2022
    Applicant: DKS Co. Ltd.
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
  • Publication number: 20210277164
    Abstract: Provided is a surfactant composition having the capability of not only imparting excellent polymerization stability, but also imparting excellent mechanical stability to the aqueous resin dispersion to be obtained through emulsion polymerization, even when the amount of the surfactant composition used is small.
    Type: Application
    Filed: October 17, 2019
    Publication date: September 9, 2021
    Applicant: DKS Co. Ltd.
    Inventors: Takuro KIMURA, Masatake JOYABU
  • Patent number: 10940453
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: March 9, 2021
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Masatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
  • Publication number: 20200331830
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.
    Type: Application
    Filed: August 22, 2017
    Publication date: October 22, 2020
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
  • Publication number: 20200199277
    Abstract: Provided is a copolymer that can be used as a dispersant having high dispersibility and high slump retention capability. A copolymer according to an embodiment is a water-soluble copolymer that contains, as constituent monomers, at least one monomer selected from a monomer (A) represented by formula (1) and a monomer (B) represented by formula (2), and at least one monomer (C) selected from an unsaturated carboxylic acid monomer (C-1) and an oxyethylene group-containing unsaturated carboxylic acid ester (C-2). The content of the monomer (C) is 20 mass % or more and 99 mass % or less.
    Type: Application
    Filed: September 15, 2018
    Publication date: June 25, 2020
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO, Yuki TAKAMACHI
  • Patent number: 10457754
    Abstract: The present invention relates to an aqueous resin dispersion, obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: October 29, 2019
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako Ogasawara, Toshio Kagimasa, Masatake Joyabu
  • Patent number: 10400195
    Abstract: A gel composition having high adhesion, high whitening resistance, and high high-temperature stability is provided. The gel composition includes a polyoxyalkylene alkyl ether (A) represented by general formula (1) and water (B). R—O—(PO)m-(EO)n—H??(1) In the formula (1), R is a linear alkyl group having 12 to 22 carbon atoms, PO represents an oxypropylene group, EO represents an oxyethylene group, m and n each represent an average number of moles added, m is a number of 1 to 20, and n is a number of 1 to 80. PO and EO are added in a configuration of block addition.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: September 3, 2019
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Natsu Fukuda, Masatake Joyabu
  • Publication number: 20190217265
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
    Type: Application
    Filed: August 22, 2017
    Publication date: July 18, 2019
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
  • Patent number: 10280341
    Abstract: The present invention relates to an adhesive agent composition, containing an aqueous resin dispersion obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: May 7, 2019
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako Ogasawara, Shigeru Kigasawa, Masatake Joyabu
  • Publication number: 20180346847
    Abstract: A gel composition having high adhesion, high whitening resistance, and high high-temperature stability is provided. The gel composition includes a polyoxyalkylene alkyl ether (A) represented by general formula (1) and water (B). R—O—(PO)m-(EO)n—H ??(1) In the formula (1), R is a linear alkyl group having 12 to 22 carbon atoms, PO represents an oxypropylene group, EO represents an oxyethylene group, m and n each represent an average number of moles added, m is a number of 1 to 20, and n is a number of 1 to 80. PO and EO are added in a configuration of block addition.
    Type: Application
    Filed: June 15, 2017
    Publication date: December 6, 2018
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Natsu FUKUDA, Masatake JOYABU
  • Publication number: 20170327602
    Abstract: The present invention relates to an aqueous resin dispersion, obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Application
    Filed: October 28, 2015
    Publication date: November 16, 2017
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako OGASAWARA, Toshio KAGIMASA, Masatake JOYABU
  • Publication number: 20170306192
    Abstract: The present invention relates to an adhesive agent composition, containing an aqueous resin dispersion obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Application
    Filed: October 28, 2015
    Publication date: October 26, 2017
    Applicant: Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Asako OGASAWARA, Shigeru KIGASAWA, Masatake JOYABU