Patents by Inventor Masatake JOYABU
Masatake JOYABU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11578028Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.Type: GrantFiled: August 22, 2017Date of Patent: February 14, 2023Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Masatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
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Publication number: 20220372220Abstract: Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1): (in formula (1), A1 represents an alkylene group having 10 to 14 carbon atoms, A2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2): (in formula (2), A1, A2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.Type: ApplicationFiled: September 23, 2020Publication date: November 24, 2022Applicant: DKS Co. Ltd.Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
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Publication number: 20210277164Abstract: Provided is a surfactant composition having the capability of not only imparting excellent polymerization stability, but also imparting excellent mechanical stability to the aqueous resin dispersion to be obtained through emulsion polymerization, even when the amount of the surfactant composition used is small.Type: ApplicationFiled: October 17, 2019Publication date: September 9, 2021Applicant: DKS Co. Ltd.Inventors: Takuro KIMURA, Masatake JOYABU
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Patent number: 10940453Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.Type: GrantFiled: August 22, 2017Date of Patent: March 9, 2021Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Masatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
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Publication number: 20200331830Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.Type: ApplicationFiled: August 22, 2017Publication date: October 22, 2020Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
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Publication number: 20200199277Abstract: Provided is a copolymer that can be used as a dispersant having high dispersibility and high slump retention capability. A copolymer according to an embodiment is a water-soluble copolymer that contains, as constituent monomers, at least one monomer selected from a monomer (A) represented by formula (1) and a monomer (B) represented by formula (2), and at least one monomer (C) selected from an unsaturated carboxylic acid monomer (C-1) and an oxyethylene group-containing unsaturated carboxylic acid ester (C-2). The content of the monomer (C) is 20 mass % or more and 99 mass % or less.Type: ApplicationFiled: September 15, 2018Publication date: June 25, 2020Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTDInventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO, Yuki TAKAMACHI
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Patent number: 10457754Abstract: The present invention relates to an aqueous resin dispersion, obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.Type: GrantFiled: October 28, 2015Date of Patent: October 29, 2019Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Asako Ogasawara, Toshio Kagimasa, Masatake Joyabu
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Patent number: 10400195Abstract: A gel composition having high adhesion, high whitening resistance, and high high-temperature stability is provided. The gel composition includes a polyoxyalkylene alkyl ether (A) represented by general formula (1) and water (B). R—O—(PO)m-(EO)n—H??(1) In the formula (1), R is a linear alkyl group having 12 to 22 carbon atoms, PO represents an oxypropylene group, EO represents an oxyethylene group, m and n each represent an average number of moles added, m is a number of 1 to 20, and n is a number of 1 to 80. PO and EO are added in a configuration of block addition.Type: GrantFiled: June 15, 2017Date of Patent: September 3, 2019Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Natsu Fukuda, Masatake Joyabu
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Publication number: 20190217265Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.Type: ApplicationFiled: August 22, 2017Publication date: July 18, 2019Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
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Patent number: 10280341Abstract: The present invention relates to an adhesive agent composition, containing an aqueous resin dispersion obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.Type: GrantFiled: October 28, 2015Date of Patent: May 7, 2019Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Asako Ogasawara, Shigeru Kigasawa, Masatake Joyabu
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Publication number: 20180346847Abstract: A gel composition having high adhesion, high whitening resistance, and high high-temperature stability is provided. The gel composition includes a polyoxyalkylene alkyl ether (A) represented by general formula (1) and water (B). R—O—(PO)m-(EO)n—H ??(1) In the formula (1), R is a linear alkyl group having 12 to 22 carbon atoms, PO represents an oxypropylene group, EO represents an oxyethylene group, m and n each represent an average number of moles added, m is a number of 1 to 20, and n is a number of 1 to 80. PO and EO are added in a configuration of block addition.Type: ApplicationFiled: June 15, 2017Publication date: December 6, 2018Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Natsu FUKUDA, Masatake JOYABU
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Publication number: 20170327602Abstract: The present invention relates to an aqueous resin dispersion, obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.Type: ApplicationFiled: October 28, 2015Publication date: November 16, 2017Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.Inventors: Asako OGASAWARA, Toshio KAGIMASA, Masatake JOYABU
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Publication number: 20170306192Abstract: The present invention relates to an adhesive agent composition, containing an aqueous resin dispersion obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.Type: ApplicationFiled: October 28, 2015Publication date: October 26, 2017Applicant: Dai-Ichi Kogyo Seiyaku Co., Ltd.Inventors: Asako OGASAWARA, Shigeru KIGASAWA, Masatake JOYABU