Abstract: An exposure apparatus includes a supplying device for supplying a band-narrowed laser beam, an optical system for directing the laser beam to a substrate, a detecting device for detecting a change in bandwidth of the laser beam and a stop provided on a path of the laser beam, the stop including an opening having a size which is variable to substantially compensate for the change in bandwidth of the laser beam. Also, a device is manufactured by a method of exposing a photosensitive layer of a substrate through an optical system with a band-narrowed laser beam to print a circuit pattern on the photosensitive layer, in which a bandwidth of the laser beam is substantially compensated for, upon detecting a change in bandwidth of the laser beam, by adjusting a size of an opening of a stop provided in a path of the laser beam.

Abstract: A method of exposing a photosensitive substrate with a band-narrowed laser beam from an excimer laser includes providing a stop having an opening in a path of the laser beam; adjusting a size of the opening of the stop to substantially compensate for a change in bandwidth of the laser beam; and exposing after the adjustment the substrate with the laser beam.

Abstract: An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.

Abstract: A projection exposure apparatus includes an illumination system for illuminating a mask pattern; a projection optical system for projecting the mask pattern being illuminated upon the surface of a wafer so as to expose the same to the mask pattern; a wavelength detecting device effective to detect the wavelength of a light from a light source included in the illumination system; and a control device operable, in accordance with an output signal from the wavelength detecting device, to control at least one of the projection magnification of the projection optical system and the relative position of the wafer with respect to the imaging position of the mask pattern.

Abstract: An illumination device includes a light source for supplying light, an optical system for forming plural light fluxes from the light supplied by the light source, a scanning system disposed to receive the light fluxes formed by the forming optical system and for scanning the light fluxes substantially at the same time, and another optical system effective to superimpose the scanned light fluxes upon one another on a surface to be irradiated.

Abstract: A projection exposure system is disclosed, which includes: a laser; a mask stage for supporting a photomask; a wafer stage for supporting a wafer; an illumination optical system effective to illuminate the photomask by use of a light from the laser; a projection optical system for projecting, upon the wafer, a circuit pattern formed on the photomask; an adjusting device for adjusting the wavelength to be emitted from the laser; a discharge tube disposed on a path for at least a portion of the light from the laser and being adapted to emit a predetermined line spectrum; a detecting device for detecting a change in a discharged electric current from the discharge tube; and a control device for controlling the adjusting device on the basis of an output signal from the detecting device.

Abstract: An exposure apparatus for exposing, to a pattern of a first object, a second object by use of light is disclosed. The apparatus includes a light source for supplying light having a predetermined wavelength, for exposing the second object to the pattern of the first object, a detecting device for detecting a change in the wavelength of the light from the light source, and a control device operable in response to a signal from the detecting device, to bring the second object substantially unexposed to the pattern of the first object.