Patents by Inventor Masato Hagino

Masato Hagino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080001243
    Abstract: There is disclosed a crystalline silicon wafer (1) having irregularities formed at its surface. The irregularities include first irregularities (2) and second irregularities (3) smaller than the first irregularities (2). There are also disclosed a crystalline silicon wafer solar cell (11) using the crystalline silicon wafer (1), a method of manufacturing the crystalline silicon wafer (1), and a method of manufacturing the crystalline silicon wafer solar cell (11).
    Type: Application
    Filed: December 26, 2005
    Publication date: January 3, 2008
    Inventors: Yasutoshi Otake, Masato Hagino
  • Publication number: 20040112426
    Abstract: A solar cell includes a dopant diffusion layer formed on the side of a light-receiving surface of a silicon wafer and a light-receiving surface passivation film formed on the dopant diffusion layer. The light-receiving surface passivation film has an opening portion. The solar cell further includes a light-receiving surface electrode formed on the opening portion of the light-receiving surface passivation film. The dopant diffusion layer has a first region covered with the light-receiving surface passivation film and a second region under the opening portion of the light-receiving surface passivation film, and there is a difference between a dopant concentration in the first region and a dopant concentration in the second region. Thus, a solar cell suitable for manufacturing a mass-produced commercial solar battery at low cost and high efficiency as well as a method of manufacturing the same can be provided.
    Type: Application
    Filed: December 10, 2003
    Publication date: June 17, 2004
    Applicant: Sharp Kabushiki Kaisha
    Inventor: Masato Hagino
  • Patent number: 5401616
    Abstract: A patterning method includes the steps of irradiating an excimer laser beam to a material layer so as to form a pattern on the material layer; and transferring onto a substrate, the material layer formed with the pattern; and irradiating the excimer laser beam to the material layer transferred onto the substrate so as to form a further pattern on the material layer.
    Type: Grant
    Filed: September 15, 1993
    Date of Patent: March 28, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Akira Isomi, Masato Hagino
  • Patent number: 5362513
    Abstract: A pattern forming method comprises at least a lower pattern forming step for printing a setting ink on a substrate, a setting step for setting the setting ink, an upper layer pattern forming step for forming a metalo-organic compound paste layer on the lower layer pattern by a printing method, and a firing step for firing at high temperature to remove the lower layer pattern. In the upper layer pattern forming step, the metalo-organic compound paste is printed so that the metalo-organic compound paste may be divided on the hardened setting ink so as to fill up gaps of the lower layer pattern. Otherwise the metalo-organic compound paste is printed on the hardened setting ink, and the metalo-organic compound paste is mechanically cut off, before the metalo-organic compound paste is dried, on the hardened setting ink, thereby forming an upper layer pattern. The setting ink comprises a thermo-setting resin, a setting agent, and an organic solvent, with an amount of nonvolatile materials of 50 to 70 wt.
    Type: Grant
    Filed: May 10, 1991
    Date of Patent: November 8, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mikinari Shimada, Hirotoshi Watanabe, Satoru Fujii, Masato Hagino, Masahide Tsukamoto