Patents by Inventor Masato Hagiri

Masato Hagiri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical apparatus, exposure apparatus, method of manufacturing optical apparatus, and method of manufacturing article
    Patent number: 10539879
    Abstract: An optical apparatus includes an optical component, a support mechanism configured to support the optical component, a manipulation mechanism configured to manipulate the optical component while contacting the optical component such that a state of the optical component is changed. The optical component is changed by the manipulation mechanism from a first state in which the optical component is supported by the support mechanism to a second state in which the optical component is supported by the manipulation mechanism.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: January 21, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takeshi Nakajima, Satoshi Tomura, Masato Hagiri, Mitsuru Seki
  • OPTICAL APPARATUS, EXPOSURE APPARATUS, METHOD OF MANUFACTURING OPTICAL APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
    Publication number: 20190332016
    Abstract: An optical apparatus includes an optical component, a support mechanism configured to support the optical component, a manipulation mechanism configured to manipulate the optical component while contacting the optical component such that a state of the optical component is changed. The optical component is changed by the manipulation mechanism from a first state in which the optical component is supported by the support mechanism to a second state in which the optical component is supported by the manipulation mechanism.
    Type: Application
    Filed: April 22, 2019
    Publication date: October 31, 2019
    Inventors: Takeshi Nakajima, Satoshi Tomura, Masato Hagiri, Mitsuru Seki
  • Evaluation method and exposure apparatus
    Patent number: 8319948
    Abstract: An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
    Type: Grant
    Filed: September 17, 2009
    Date of Patent: November 27, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shu Watanabe, Masato Hagiri
  • EVALUATION METHOD AND EXPOSURE APPARATUS
    Publication number: 20100073654
    Abstract: An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
    Type: Application
    Filed: September 17, 2009
    Publication date: March 25, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Shu Watanabe, Masato Hagiri