Patents by Inventor Masato Imai

Masato Imai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060187388
    Abstract: A liquid crystal display includes a pair of substrates and a liquid crystal layer interposed between the substrates and has a reflective area and a transmissive area. At least one of the substrates is provided with a retardation film whose phase difference differs between the reflective area and the transmissive area. Alternatively, at least one of the substrates is provided with a retardation film whose slow axis differs between the reflective area and the transmissive area.
    Type: Application
    Filed: March 24, 2006
    Publication date: August 24, 2006
    Inventors: Tsuyoshi Ohyama, Masato Imai, Kazuyuki Endo
  • Publication number: 20060098143
    Abstract: A liquid crystal display device, by which a reduction of costs of a color filter is realized and declining of the transmittance or reflectance due to an alignment error is suppressed, comprising a pair of substrates arranged facing to each other over a liquid crystal layer, wherein one substrate is formed pixels PXL arranged in matrix. Each pixel is formed a reflection portion for reflecting an outside light and a transmission portion for transmitting a light. The other substrate is formed a color filter colored to be different colors (red, green and blue) corresponding to respective pixels. One or more color adjusting windows CFW having a coloring concentration of zero or less than that of other portions are provided on reflection regions CFR superposing with reflection portions inside pixel regions corresponding to respective pixels.
    Type: Application
    Filed: December 19, 2005
    Publication date: May 11, 2006
    Inventors: Shinji Nakamura, Masato Imai, Yoko Fukunaga, Akira Maehara
  • Patent number: 6863735
    Abstract: An epitaxial growth furnace is provided for effecting the formation of an epitaxial layer on the surface of a semiconductor wafer by CVD in a reaction chamber of the furnace. The furnace comprises a wafer holder having an opening for exposing a surface area of the wafer which is subject to epitaxial growth, an opening flange adapted for engagement with a chamfered tapered face of a whole peripheral edge of the wafer on the side of said surface area thereof, and a plurality of jaws for detachably engaging with an outer periphery of the wafer on a back surface side of said surface area.
    Type: Grant
    Filed: July 26, 1999
    Date of Patent: March 8, 2005
    Assignee: Super Silicon Crystal Research Institute Corp.
    Inventors: Shinji Nakahara, Masato Imai, Masanori Mayusumi, Kazutoshi Inoue, Shintoshi Gima
  • Publication number: 20050042528
    Abstract: A mask for photolithography in which a semi-transmission film is formed so that the phase difference of lights passing through a semi-transmission portion and a transmission portion of the mask for photolithography is between (?¼+2 m) ? and (¼+2 m) ? inclusive, where m is an integer. The invention makes it possible to efficiently and properly form a thin film having a multi-step structure by a single process.
    Type: Application
    Filed: September 29, 2004
    Publication date: February 24, 2005
    Inventors: Masato Imai, Akira Maehara, Yoko Fukunaga
  • Publication number: 20040105059
    Abstract: A liquid crystal display includes a pair of substrates and a liquid crystal layer interposed between the substrates and has a reflective area and a transmissive area. At least one of the substrates is provided with a retardation film whose phase difference differs between the reflective area and the transmissive area. Alternatively, at least one of the substrates is provided with a retardation film whose slow axis differs between the reflective area and the transmissive area.
    Type: Application
    Filed: November 14, 2003
    Publication date: June 3, 2004
    Applicant: Sony Corporation
    Inventors: Tsuyoshi Ohyama, Masato Imai, Kazuyuki Endo
  • Publication number: 20040095528
    Abstract: A liquid crystal display device, by which a reduction of costs of a color filter is realized and declining of the transmittance or reflectance due to an alignment error is suppressed, comprising a pair of substrates arranged facing to each other over a liquid crystal layer, wherein one substrate is formed pixels PXL arranged in matrix. Each pixel is formed a reflection portion for reflecting an outside light and a transmission portion for transmitting a light. The other substrate is formed a color filter colored to be different colors (red, green and blue) corresponding to respective pixels. One or more color adjusting windows CFW having a coloring concentration of zero or less than that of other portions are provided on reflection regions CFR superposing with reflection portions inside pixel regions corresponding to respective pixels.
    Type: Application
    Filed: September 9, 2003
    Publication date: May 20, 2004
    Inventors: Shinji Nakamura, Masato Imai, Yoko Fukunaga, Akira Maehara
  • Patent number: 6721024
    Abstract: The liquid crystal display device of the present invention includes a first substrate, a second substrate, and a liquid crystal layer sandwiched by the first and second substrates. The first substrate includes polymer walls made of a transparent resin, the liquid crystal layer has a plurality of liquid crystal regions separated from one another by the polymer walls, and liquid crystal molecules in the plurality of liquid crystal regions are aligned axially symmetrically with respect to respective axes formed in the plurality of liquid crystal regions, the axes being vertical to a surface of the first substrate, and liquid crystal molecules above the polymer walls are aligned axially symmetrically with respect to respective axes formed on the polymer walls, the axes being vertical to the surface of the first substrate.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: April 13, 2004
    Assignees: Sharp Kabushiki Kaisha, Sony Corporation
    Inventors: Katsuhiko Kishimoto, Toshihisa Uchida, Masato Imai
  • Publication number: 20030165641
    Abstract: A mask for photolithography in which a semi-transmission film is formed so that the phase difference of lights passing through a semi-transmission portion and a transmission portion of the mask for photolithography is between (−¼+2 m).&pgr; and (¼+2 m).&pgr; inclusive, where m is an integer. The invention makes it possible to efficiently and properly form a thin film having a multi-step structure by a single process.
    Type: Application
    Filed: December 9, 2002
    Publication date: September 4, 2003
    Inventors: Masato Imai, Akira Maehara, Yoko Fukunaga
  • Patent number: 6578589
    Abstract: Disclosed is a compact apparatus for manufacturing semiconductor wafers, which is aimed at complete removing of moisture from the wafers after final cleaning while reducing the manufacturing time. The apparatus includes a cleaning chamber (1) for final cleaning, a storage chamber (3) for storing wafers, a transfer chamber (2) communicating with the both cleaning and storage chambers (1, 3), and formed in its upper wall with a heat-conducting window (7), a robot hand (5) and a robot arm (4) for transporting the wafer (W) from the cleaning chamber (1) to the storage chamber (3) within the transfer chamber, infrared lamps (6) arranged to face the window (7) outside the transfer chamber (2) so as to heat the wafer (W) in the course of transportation within the transfer chamber, gas supply ports (8) for producing a laminar flow of inert gas from the storage chamber (3) to the cleaning chamber (1) to expose wafers (W) with the gas, and exhaust ports (9) for exhausting the moisture removed from wafers.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: June 17, 2003
    Assignee: Super Silicon Crystal Research Institute Corp.
    Inventors: Masanori Mayusumi, Masato Imai, Kazutoshi Inoue, Shinji Nakahara, Shintoshi Gima
  • Publication number: 20030011119
    Abstract: A quartz coil spring which has a spiral coil formed of a quartz band. A mandrel bar having a length greater than the predetermined overall length of the coil spring is coaxially disposed in a preliminarily prepared quartz tube. Thermoplastic wax is charged into a space between the mandrel bar and the inner wall of the quartz tube and solidified, the space being filled with the wax filler. The quartz tube is rotated together with the wax filler around the axis by rotatively driving the mandrel bar. The quartz tube being rotated is spirally cut with a predetermined width from the outer peripheral surface by a rotatry cutter disc, thereby forming a spiral coil body. The wax filler is melted for removal by thermal treatment, whereby the spiral coil is released from the mandrel bar. The released spiral coil is immersed in a bath containing fluorinated acid and etched until a predetermined band thickness is obtained.
    Type: Application
    Filed: August 6, 2002
    Publication date: January 16, 2003
    Inventor: Masato Imai
  • Publication number: 20020145698
    Abstract: A liquid crystal display device can be improved in orientation by exploiting axially symmetrical orientation. The liquid crystal display device includes a pair of substrates arranged facing each other with a pre-set gap in-between, liquid crystals held in the gap, a unit for applying an electrical field to the liquid crystals to change its state of orientation, a wall structure formed in each of small-sized areas obtained on sub-division along at least one substrate for orienting the liquid crystals lying in each small-sized area axially symmetrically on application of the electrical field, and a groove structure formed in each of the small-sized areas and adapted for adjusting the axial symmetrical orientation of the liquid crystals in cooperation with the wall structure.
    Type: Application
    Filed: June 28, 2001
    Publication date: October 10, 2002
    Inventors: Masato Imai, Kazuyuki Endo, Toshihisa Uchida
  • Patent number: 6335780
    Abstract: A liquid crystal display device includes a first substrate, a second substrate, and a liquid crystal layer interposed between the first and second substrates. The first substrate includes a protrusion structure and a vertical alignment layer each facing the liquid crystal layer. The liquid crystal layer includes a plurality of liquid crystal regions separated from each other by the protrusion structure. Liquid crystal molecules in the plurality of liquid crystal regions are aligned axially symmetrically around an axis perpendicular to a surface of the second substrate at least in the presence of applied voltage. Each of the plurality of liquid crystal regions has a size such that each of the plurality of liquid crystal regions is included within a circular area circumscribing a square of approximately 70 &mgr;m or less.
    Type: Grant
    Filed: July 20, 1999
    Date of Patent: January 1, 2002
    Assignees: Sharp Kabushiki Kaisha, Sony Corporation
    Inventors: Takashi Kurihara, Yusuke Tsuda, Masato Imai
  • Patent number: 6327016
    Abstract: A liquid crystal display includes a first substrate having a substrate surface, a second substrate disposed facing the first substrate, a liquid crystal layer having liquid crystal molecules, interposed between the first and second substrates, a protrusion-like structure provided on the substrate surface facing the liquid crystal layer, and a vertical alignment layer provided on the first substrate so as to cover the protrusion-like structure. The liquid crystal layer is divided by the protrusion-like structure into a plurality of liquid crystal regions. The liquid crystal molecules have negative dielectric anisotropy and, in the presence of an applied voltage, are aligned axially symmetrically within at least one of the plurality of liquid crystal regions about an axis substantially perpendicular to the substrate surface. The protrusion-like structure includes a side wall sloped with respect to the substrate surface, and a pit region in a top portion of the protrusion-like structure.
    Type: Grant
    Filed: September 28, 1999
    Date of Patent: December 4, 2001
    Assignees: Sharp Kabushiki Kaisha, Sony Corporation
    Inventors: Nobuaki Yamada, Takashi Kurihara, Masato Imai
  • Patent number: 6323140
    Abstract: Disclosed is a method for manufacturing a semiconductor wafer having an epitxial layer on a surface thereof, by the steps of forming a pritective oxide film on a surface of a semiconductor wafer prior to loading of the wafer into an eptaxial growth furnace, removing the protective oxide film formed on the surface of the wafer by heating after the wafer is loaded in the furnace, and performing epitaxial growth of the epitaxial layer on the surface from which the protective oxide film is removed in the furnace. The protective oxide film is removed by heating the wafer in the furnace in an ambience of hydrogen gas at a pressure ranging from 0.0133×105 Pa to 1.013×105 Pa and at a temperature ranging from 800° C. to 1,000 ° C., or by heating the wafer in the furnace at a pressure of 5×106 Pa or under and at a temperature ranging from 800° C. to 1,000° C.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: November 27, 2001
    Assignee: Silicon Crystal Research Institute Corp.
    Inventors: Masanori Mayusumi, Masato Imai, Kazutoshi Inoue, Shinji Nakahara
  • Patent number: 6266122
    Abstract: A liquid crystal display device of the present invention includes: a first substrate and a second substrate; and a liquid crystal layer interposed between the first substrate and the second substrate. The first substrate includes a polymer wall formed of transparent resin, the liquid crystal layer includes a plurality of liquid crystal regions partitioned by the polymer wall, and liquid crystal molecules in the plurality of liquid crystal regions are aligned in axial symmetry, with respect to an axis in a direction substantially perpendicular to a surface of the first substrate.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: July 24, 2001
    Assignees: Sharp Kabushiki Kaisha, Sony Corporation
    Inventors: Katsuhiko Kishimoto, Kenji Hamada, Masato Imai
  • Patent number: 6262393
    Abstract: An epitaxial growth furnace comprising first and second partition walls arranged within a reaction chamber, a first separate space surrounded by the partition walls and the inner wall surface of the reaction chamber, a second separate space partitioned by the partition walls so as to be isolated from the inner wall surface of the reaction chamber, a holding mechanism adapted to hold a pair of semiconductor wafers respectively on the first and second partition walls so that the principal surfaces of the pair of wafers face each other with spacing therebetween and are also exposed to the second separate space, and a pair of heaters for respectively irradiating radiant heat to the back surfaces of the two wafers.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: July 17, 2001
    Assignee: Super Silicon Crystal Research Institute Corp.
    Inventors: Masato Imai, Masanori Mayusumi, Shinji Nakahara, Kazutoshi Inoue
  • Patent number: 6245152
    Abstract: A method and apparatus for forming an epitaxial layer on a semiconductor wafer supported on a suscepter in an epitaxial growth furnace. Ther wafer to be processed is placed on the suscepter outside the furnace. The suscepter carrying the wafer is transferred into the furnace from the outside thereof and mounted in a loading position within the furnace. An epitaxial growth process is then performed on the wafer on the suscepter mounted in the loading position. After the completion of the growth process, the suscepter carrying the wafer thereon is removed from the furnace loading position and transferred to the outside of the furnace.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: June 12, 2001
    Assignee: Super Silicon Crystal Research Institute Corp.
    Inventors: Masato Imai, Masanori Mayusumi, Shinji Nakahara, Kazutoshi Inoue
  • Patent number: 6147721
    Abstract: Disclosed is a plasma addressed liquid crystal display improved to prevent deterioration of liquid crystal and an alignment film due to ultraviolet rays generated by plasma discharge. The plasma addressed liquid crystal display includes a liquid crystal cell including columns of signal electrodes, a plasma cell including rows of discharge channels, and an intermediate thin glass sheet through which the liquid crystal cell is joined to the plasma cell. The thin glass sheet includes an ultraviolet ray transmission preventive layer having a function of absorbing or reflecting ultraviolet rays generated in the discharge channels on the plasma cell side thereby preventing the ultraviolet rays from being made incident on the liquid crystal cell side.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: November 14, 2000
    Assignee: Sony Corporation
    Inventors: Masanobu Tanaka, Masato Imai, Tomoya Yano, Kiyoshige Matsuura
  • Patent number: 6115098
    Abstract: A liquid crystal display device of the present invention includes: first and second substrates; a liquid crystal layer interposed between the first and second substrates; a plurality of pillar-like spacers for defining a gap between the first and second substrates; a plurality of electrodes provided on a side of each of the first and second substrates which faces the liquid crystal layer, for applying a voltage through the liquid crystal layer; and a plurality of pixel regions defined by the plurality of electrodes. The liquid crystal layer has liquid crystal molecules having a negative dielectric anisotropy. A vertical alignment layer is provided on a surface of each of the first and second substrates which faces the liquid crystal layer and on surfaces of the pillar-like spacers. The liquid crystal layer includes a plurality of liquid crystal regions defined by the plurality of pillar-like spacers. Each of the pixel regions includes at least one of the liquid crystal regions.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: September 5, 2000
    Assignees: Sharp Kabushiki Kaisha, Sony Corporation
    Inventors: Yasuhiro Kume, Kenji Hamada, Masahiko Kondo, Takashi Kurihara, Masato Imai, Kazuyuki Endo
  • Patent number: 6067141
    Abstract: The liquid crystal display device of this invention includes a pair of substrates and a liquid crystal layer including liquid crystal molecules having a negative dielectric anisotropy interposed between the pair of substrates, vertical alignment layers being formed on surfaces of the pair of substrates in contact with the liquid crystal layer, a voltage being applied across the liquid crystal layer by voltage application means formed on the pair of substrates, the liquid crystal molecules being oriented substantially vertical to the pair of substrate when no voltage is applied, wherein a plurality of column structures are provided so as to be at least partly in contact with the pair of substrates, and the liquid crystal layer has a plurality of liquid crystal domains in a direction in the plane of the substrates, and, when a voltage is applied, orientation directions of the liquid crystal molecules are continuous in each of the liquid crystal domains, while the orientation directions of liquid crystal molecul
    Type: Grant
    Filed: December 28, 1998
    Date of Patent: May 23, 2000
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Nobuaki Yamada, Toshikazu Hirata, Takashi Kurihara, Masato Imai, Kazuyuki Endo