Abstract: A manifold includes a resin-made manifold main body including a plurality of housings joined to each other and having a plurality of flow paths therein, and a rotary valve that regulates a flow of a fluid flowing through the flow paths, wherein a first housing that is one of two housings having joint portions joined to each other among the plurality of housings constituting the manifold main body includes a cylindrical valve accommodation portion that is allowed to accommodate and support the rotary valve, and wherein at least part of the valve accommodation portion protrudes toward a second housing side relative to the joint portions, the second housing being the other of the two housings.

Abstract: A rotary valve includes: a rotor that includes a cylindrical rotor body having a rotor opening through which a fluid flows and that rotates about an axis; and a seal member that is disposed along a circumferential direction of the rotor body. The rotor body includes two facing portions that face each other in the circumferential direction among edge portions forming the rotor opening. The seal member includes a seal body that is disposed on an outer side with respect to the rotor body in a radial direction and in which a seal opening communicating with the rotor opening is formed, and an inner annular rib that surrounds the seal opening and that protrudes from the seal body toward an inner side in the radial direction. The inner annular rib includes an inclined rib portion that forms an acute angle with the facing portions.

Abstract: The present disclosure relates to lift pins that include an opening, and related components and chamber kits, for disposition in processing chambers for semiconductor manufacturing. In one or more embodiments, a processing chamber applicable for use in semiconductor manufacturing includes a chamber body and a window. The processing chamber includes one or more heat sources, a substrate support, and a plurality of lift pins disposed in a processing volume. The plurality of lift pins respectively include a shaft section having a first outer dimension, a head section having a second outer dimension, and an opening formed in the shaft section. The opening has a dimension that is a first ratio that is at least 0.3 of the first outer dimension of the shaft section. The dimension of the opening is a second ratio that is at least 0.2 of the second outer dimension of the head section.

Abstract: Disclosed herein are a gas delivery module, a processing chamber, and a method for depositing a film on a substrate. In one example, a gas delivery module is provided that includes a deposition precision flow device (PFD) flow controller, a carrier PFD flow controller, and a plurality of mass flow controllers (MFCs). The deposition PFD flow controller is configured to control a flow of a deposition gas through a plurality of outlets. The carrier PFD flow controller is configured to control a flow of a carrier gas through a plurality of outlets. The first MFC of the plurality of MFCs includes a first inlet and an outlet. The first inlet of the first MFC is fluidly coupled to a first outlet of the plurality of outlets of the deposition PFD and to a first outlet of the plurality of outlets of the carrier PFD. The second MFC of the plurality of MFCs includes a second inlet and an outlet.

Abstract: A display device includes: a plurality of display units; a display optical component that is placed to direct display light from the display units toward the viewer area, and has a plurality of layers. The total numerical number of the display optical component is one. The plurality of layers include: a base material layer; an optical function-applying layer that applies an optical function to the display optical component; and a balancer layer that balances stress with stress at a position close to the optical function-applying layer, wherein the balancer layer and the optical function-applying layer sandwich the base material layer.

Abstract: The information processing apparatus (2000) of the example embodiment 1 includes an acquisition unit (2020), a modeling unit (2040), an output unit (2080). The acquisition unit (2020) acquires a plurality of trajectory data. The trajectory data represents a time-sequence of observed positions of an object. The modeling unit (2040) assigns one of groups for each trajectory data. The modeling unit (2040) generates a generative model for each group. The generative model represents trajectories assigned to the corresponding group by a common time-sequence of velocity transformations. The velocity transformation represents a transformation of velocity of the object from a previous time frame, and is represented using a set of motion primitives defined in common for all groups. The output unit (2060) outputs the generated generative models.

Abstract: A cooling module includes: a pump configured to pressure-food a fluid; and a manifold having an outer wall on which an attachment surface for the pump is provided and including a fluid flow path therein through which the fluid pressure-fed by the pump flows. A discharge port of the pump is provided inside the manifold.

Abstract: A cooling module includes a manifold to which a valve configured to control flow of a fluid is attached and in which a fluid flow path configured to allow the fluid to flow therethrough is formed. The manifold includes a foreign matter reservoir having a flow path cross-sectional area larger than a flow path cross-sectional area of the fluid flow path and storing a foreign matter flowing through the fluid flow path. The foreign matter reservoir is connected to at least one of an inflow port configured to allow the fluid to flow therethrough into the valve and an outflow port configured to allow the fluid to flow therethrough out of the valve.

Abstract: A cooling module includes: a manifold including therein a first flow path configured to allow a first fluid to flow therethrough and a second flow path configured to allow a second fluid to flow therethrough; and a valve attached to the manifold and configured to control the flow of the first fluid and the second fluid. The manifold includes a pressure adjusting flow path configured to adjust a pressure between the first flow path and the second flow path.

Abstract: There is provided a rotary valve that suppresses deformation of a sealing member and prevents leakage of a fluid while reducing a size of the rotary valve. The rotary valve includes: a rotor that controls circulation of the fluid by rotating about an axis; a sealing member having an opening through which the fluid flows, the sealing member being disposed on a radially outer side of the rotor; a housing that accommodates the rotor and the sealing member; and a cover placed on the housing in such a way as to face against the rotor and the sealing member in an axial direction along the axis, and the cover includes a pressing portion that presses the sealing member when the cover is placed on the housing.

Abstract: A manifold includes: a valve configured to control a flow of fluid; and a housing having, in an internal space, a plurality of flow path chambers which is partitioned by a partition wall and through which the fluid flows. The housing includes a joining portion where an upper housing having a first opening opened downward and a lower housing having a second opening opened upward are joined by thermally welding the first opening and the second opening, and the joining portion is disposed above or below a center of the housing in an upper-lower direction.

Abstract: Described herein are a susceptor, processing chambers having the same, and method for substrate processing using the same. In one example, a susceptor for supporting a substrate during processing is provided. The susceptor has a disk shaped body that includes a rim circumscribing an inner region. The inner region is recessed to form a recessed pocket that is configured to receive a substrate. A plurality of bumps extend radially into the inner region that are configured to contact an outer edge of the substrate when the substrate is disposed in the recessed pocket. A venting region is defined within the inner region. The venting region is defined by a plurality of vent holes formed through the body. The venting region terminates at a radius originating from a centerline of the body that is at least 4.0 millimeter less than a radius defining an inner wall of the rim.

Abstract: The present disclosure relates to transfer chambers, systems, and related components and methods, for pre-heating and pre-cooling substrate transfer apparatus. In one or more embodiments, the transfer apparatus are pre-heated and pre-cooled in relation to transferring substrates for substrate processing operations as part of semiconductor manufacturing. In one or more embodiments, a transfer chamber applicable for use in semiconductor manufacturing includes an internal volume, one or more sidewalls at least partially defining the internal volume, and a transfer apparatus disposed in the internal volume. The transfer apparatus includes one or more links, one or more motors configured to pivot the one or more links, and one or more substrate holders coupled to the one or more links. The transfer chamber includes a window that includes a transparent material, and one or more heat sources configured to direct heat into the internal volume through the window.

Abstract: Provided is an information processing system that performs processing related to a subjective evaluation of data generated using a machine learning model. An information processing system includes a system feedback acquisition unit that acquires generation data and evaluation information based on an evaluation model for the generation data, a system feedback presentation unit that presents the generation data and the evaluation information, a user feedback acquisition unit that acquires a user evaluation for the generation data or the evaluation information, and an output unit that outputs the user evaluation acquired by the user feedback acquisition unit.

Abstract: Provided is an image diagnostic system that diagnoses a medical image using an artificial intelligence function. The image diagnostic system includes: a control unit; a diagnosis unit that estimates a diagnosis result using a machine learning model on the basis of an input image; a diagnosis result report output unit that outputs a diagnosis result report on the basis of the diagnosis result; a selection unit that selects a part of a diagnostic content included in the diagnostic result report; and an extraction unit that extracts determination basis information that has affected estimation of the diagnosis content selected, in which the control unit outputs the determination basis information. The image diagnostic system further includes a correction unit that corrects the determination basis information, in which the determination basis information corrected is used for relearning of the machine learning model.

Abstract: The present disclosure relates to transfer apparatus, and related components and methods, for transferring substrates in relation to substrate processing operations for semiconductor manufacturing. In one implementation, a transfer apparatus for moving a substrate in relation to semiconductor manufacturing includes a body, and a plurality of substrate supports inserted at least partially into the body. Each of the plurality of substrate supports includes an inner segment, and one or more fins extending outwardly relative to the inner segment. Each of the inner segment and the one or more fins includes silicon carbide (SiC).

Abstract: The present invention improves estimation accuracy. An information processing system includes: an acquisition unit (102) configured to acquire adjustment information based on a feature value of learning data used for generation of a learned model that estimates a health condition of a patient or a subject; a processing unit (103) configured to perform processing on a biological sample to be judged on the basis of the adjustment information; and an estimation unit (104) configured to estimate a diagnosis result by inputting measurement data acquired by the processing to the learned model.

Abstract: An information processing system includes: a machine learning model learned using learning data including two or more types of modal information acquired from a patient or a subject; a setting unit that sets input data to be used as input to the machine learning model from the learning data; and an output unit that inputs the input data to the machine learning model and outputs an estimation result of efficacy of a medicine or a health condition for the patient or the subject, in which the setting unit sets the input data on the basis of the degree of influence given to estimation of a diagnosis result at the time of learning of the machine learning model, the degree of influence given by each piece of the modal information included in the learning data.

Abstract: In one aspect, a process operation is conducted at a first pressure in a process chamber, and an epitaxial deposition operation is conducted at an atmospheric pressure in an epitaxial deposition chamber. The atmospheric pressure is greater than the first pressure. The process chamber is mounted to a first mainframe that operates at the first pressure (a reduced pressure), and the epitaxial deposition chamber is mounted to a second mainframe that operates at the atmospheric chamber. In one aspect, the process chamber is a cleaning chamber (such as a pre-clean chamber) and the process operation is a cleaning operation. In one aspect, the process chamber is an atmospheric pressure epitaxial deposition chamber and the process operation is an atmospheric pressure epitaxial deposition operation.

Abstract: A method of moving a susceptor in a processing system, suitable for use in semiconductor processing, is provided. The method includes: moving a first susceptor from an interior volume of a first enclosure to an interior volume of a process chamber during a first time period; and positioning, during a second time period, a first substrate on the first susceptor when the first susceptor is in the process chamber, wherein the interior volume of the first enclosure and interior volume of the process chamber are maintained at a non-atmospheric pressure from the beginning of the first time period until the end of the second time period.