Patents by Inventor Masato Kawakami

Masato Kawakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200239641
    Abstract: A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, wherein R1 and R2 each independently represent a substituted or unsubstituted C1-C50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX2, or (NH)(3-r)/2—SiR1R2r (R1 and R2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX2 is denoted by p, p satisfies 0?p/(2n+4)?0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a?1, 0?b<1, and a+b=1.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masato Kawakami, Shotaro Aoki, Ayumu Kiyomori
  • Publication number: 20190315972
    Abstract: A composition is provided comprising (a) a polysilazane having a monovalent hydrocarbon group, (b) untreated metal oxide nanoparticles, metal oxide nanoparticles having a monovalent hydrocarbon group, or metal oxide nanoparticles having an alkylsilyl or alkoxysilyl group, and (c) an aprotic solvent. The composition has storage stability and is suitable for forming a film having water repellent, especially superhydrophobic properties.
    Type: Application
    Filed: April 10, 2019
    Publication date: October 17, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ayumu Kiyomori, Shotaro Aoki, Masato Kawakami, Tohru Kubota
  • Patent number: 9862812
    Abstract: A composition consisting essentially of 90-99 parts by weight of a nitrogen-containing organoxysilane compound and 1-10 parts by weight of an isomer affords an appropriate cure behavior and is useful as paint additive, adhesive, silane coupling agent, textile treating agent, and surface treating agent.
    Type: Grant
    Filed: November 18, 2014
    Date of Patent: January 9, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoichi Tonomura, Tohru Kubota, Masato Kawakami, Naoki Yamauchi, Takayuki Honma
  • Patent number: 9475305
    Abstract: A liquid supply apparatus includes a supply passage for supplying a liquid stored in a liquid storage section to a liquid ejection head. The liquid supply apparatus further includes: a region set within a range including an inside of the liquid storage section and an inside of the supply passage, pressure applied to the liquid in the region varying according to an amount of the liquid remaining in the liquid storage section or in the supply passage; a gas chamber communicating with the region in such a manner that a pressure of gas in the gas chamber varies according to the pressure applied to the liquid in the region; and a pressure sensor detecting pressure in the gas chamber.
    Type: Grant
    Filed: March 24, 2015
    Date of Patent: October 25, 2016
    Assignee: CANON FINETECH INC.
    Inventors: Hideyuki Ito, Marie Ogata, Masato Kawakami, Yoshihito Fukuda
  • Patent number: 9371341
    Abstract: A method for producing a cyclic aminoorganoxysilane compound is provided. The method comprises the step of conducting dehydrochlorination coupling of a chloroalkylalkoxysilane compound represented by the formula: wherein R1 is a straight or branched divalent C1-10 hydrocarbon group, R2 is hydrogen atom or an unsubstituted or substituted C1-10 monovalent hydrocarbon group, R3 and R4 are respectively a C1-10 monovalent hydrocarbon group, and n is 0, 1, or 2 and an aminoalcohol represented by the formula: wherein R5 is a straight or branched C2-10 divalent hydrocarbon group which may contain a heteroatom and R6 is hydrogen atom or a straight or branched C1-10 monovalent hydrocarbon group, and promoting intramolecular transesterification to thereby produce a cyclic aminoorganoxysilane compound represented by the formula: wherein R1 to R6 and n are as defined above.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: June 21, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masato Kawakami, Yoichi Tonomura, Tohru Kubota
  • Publication number: 20160102111
    Abstract: A method for producing a cyclic aminoorganoxysilane compound is provided. The method comprises the step of conducting dehydrochlorination coupling of a chloroalkylalkoxysilane compound represented by the formula: wherein R1 is a straight or branched divalent C1-10 hydrocarbon group, R2 is hydrogen atom or an unsubstituted or substituted C1-10 monovalent hydrocarbon group, R3 and R4 are respectively a C1-10 monovalent hydrocarbon group, and n is 0, 1, or 2 and an aminoalcohol represented by the formula: wherein R5 is a straight or branched C2-10 divalent hydrocarbon group which may contain a heteroatom and R6 is hydrogen atom or a straight or branched C1-10 monovalent hydrocarbon group, and promoting intramolecular transesterification to thereby produce a cyclic aminoorganoxysilane compound represented by the formula: wherein R1 to R6 and n are as defined above.
    Type: Application
    Filed: October 13, 2015
    Publication date: April 14, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masato KAWAKAMI, Yoichi TONOMURA, Tohru KUBOTA
  • Patent number: 9278527
    Abstract: An ink jet recording ink including a pigment; water; and water-soluble compounds. The pigment comprises a resin-dispersed pigment dispersed with a (meth)acrylate-based random copolymer having an acid value of 100-160 mgKOH/g. The water-soluble compounds include at least ethylene urea and a water-soluble compound having a hydrophilicity-hydrophobicity coefficient defined by the following equation (A) of 0.37 or less The total content of the water-soluble compounds is 22-50 mass % with respect to the total amount of the ink The content of the ethylene urea is 11.0 mass % or more with respect to the total amount of the ink, and the proportion of the amount of the ethylene urea in the total amount of the water-soluble compounds is 50% by mass or less, Hydrophilicity-hydrophobicity coefficient=((water activity value of 20% aqueous solution)?(molar fraction of water in 20% aqueous solution))/(1?(molar fraction of water in 20% aqueous solution))??Equation (A).
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: March 8, 2016
    Assignee: Canon Finetech Inc.
    Inventors: Kanako Aratani, Ryuta Aoto, Yuusuke Sumikawa, Takahiro Tsutsui, Shintaro Suzuki, Masato Kawakami
  • Publication number: 20150273854
    Abstract: A liquid supply apparatus includes a supply passage for supplying a liquid stored in a liquid storage section to a liquid ejection head. The liquid supply apparatus further includes: a region set within a range including an inside of the liquid storage section and an inside of the supply passage, pressure applied to the liquid in the region varying according to an amount of the liquid remaining in the liquid storage section or in the supply passage; a gas chamber communicating with the region in such a manner that a pressure of gas in the gas chamber varies according to the pressure applied to the liquid in the region; and a pressure sensor detecting pressure in the gas chamber.
    Type: Application
    Filed: March 24, 2015
    Publication date: October 1, 2015
    Inventors: Hideyuki Ito, Marie Ogata, Masato Kawakami, Yoshihito Fukuda
  • Publication number: 20150135996
    Abstract: A composition consisting essentially of 90-99 parts by weight of a nitrogen-containing organoxysilane compound and 1-10 parts by weight of an isomer affords an appropriate cure behavior and is useful as paint additive, adhesive, silane coupling agent, textile treating agent, and surface treating agent.
    Type: Application
    Filed: November 18, 2014
    Publication date: May 21, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota, Masato Kawakami, Naoki Yamauchi, Takayuki Honma
  • Publication number: 20150070436
    Abstract: An ink jet recording ink including a pigment; water; and water-soluble compounds. The pigment comprises a resin-dispersed pigment dispersed with a (meth)acrylate-based random copolymer having an acid value of 100-160 mgKOH/g. The water-soluble compounds include at least ethylene urea and a water-soluble compound having a hydrophilicity-hydrophobicity coefficient defined by the following equation (A) of 0.37 or less The total content of the water-soluble compounds is 22-50 mass % with respect to the total amount of the ink The content of the ethylene urea is 11.0 mass % or more with respect to the total amount of the ink, and the proportion of the amount of the ethylene urea in the total amount of the water-soluble compounds is 50% by mass or less, Hydrophilicity-hydrophobicity coefficient=((water activity value of 20% aqueous solution)?(molar fraction of water in 20% aqueous solution))/(1?(molar fraction of water in 20% aqueous solution)) ??Equation (A).
    Type: Application
    Filed: September 2, 2014
    Publication date: March 12, 2015
    Inventors: Kanako Aratani, Ryuta Aoto, Yuusuke Sumikawa, Takahiro Tsutsui, Shintaro Suzuki, Masato Kawakami
  • Publication number: 20150070437
    Abstract: An ink jet recording ink including a coloring material; water; and three kinds of water-soluble compounds. The content of the water is 70 mass % or more with respect to the total amount of the ink. Each water-soluble compound has a molecular weight of 80 or more and is a liquid compound having a vapor pressure at 20° C. of 5 Pa or less or a solid compound, and at least one kind of the water-soluble compounds is a solid compound. In case that the water-soluble compounds are mixed at a ratio at which the water-soluble compounds are incorporated into the ink to provide a mixture, a 40% aqueous solution of the mixture has a water activity value of 0.88-0.91 and a viscosity of 3.3 mPa·s or less. The total content of the water-soluble compounds in the ink is 20-25 mass % with respect to the total amount of the ink.
    Type: Application
    Filed: September 4, 2014
    Publication date: March 12, 2015
    Inventors: Yuusuke Sumikawa, Masato Kawakami, Ryuta Aoto, Eriko Himura, Kanako Aratani, Takahiro Tsutsui, Shintaro Suzuki
  • Patent number: 8740336
    Abstract: An ink jet printing apparatus and an ink jet printing method, whereby high-permeation ink and low-permeation ink are employed to prevent a reduction in optical density is provided. The ink jet printing apparatus controls ejection of ink from print heads, so that only low-permeation ink is ejected onto the edge area of a print medium that is adjacent to a non-printing area, and this time, high-permeation ink is not employed. Further, the ink jet printing apparatus controls ejection of ink from the print heads, so that both low-permeation ink and high-permeation ink are employed for the non-edge area that is adjacent to the edge area, and to perform printing, the low-permeation ink is ejected onto the non-edge area prior to the high-permeation ink.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: June 3, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasunori Fujimoto, Masato Kawakami, Takeshi Honma
  • Publication number: 20130062035
    Abstract: A substrate cooling device includes a cylindrical heat shielding member 30 configured to be movable between an insertion position where the heat shielding member 30 is inserted between the substrate holding member 15 in a processing vessel 11 and a heating member 12 and an unloading position where the heat shielding member 30 is unloaded from the insertion position, and configured to block radiant heat toward the substrates W after completing a heat treatment; and an air cooling port 21 provided at an outside of the processing vessel 11. The heat shielding member 30 includes two half-cylindrical members 31 that are assembled and separated at the unloading position, and is movable between the unloading position and the insertion position. An outer surface and an inner surface of the heat shielding member 30 are made of materials having a relatively low emissivity and a relatively high emissivity, respectively.
    Type: Application
    Filed: August 29, 2012
    Publication date: March 14, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masato Kawakami, Hiromi Nitadori, Yun Mo
  • Publication number: 20120019583
    Abstract: An ink jet printing apparatus and an ink jet printing method, whereby high-permeation ink and low-permeation ink are employed to prevent a reduction in optical density is provided. The ink jet printing apparatus controls ejection of ink from print heads, so that only low-permeation ink is ejected onto the edge area of a print medium that is adjacent to a non-printing area, and this time, high-permeation ink is not employed. Further, the ink jet printing apparatus controls ejection of ink from the print heads, so that both low-permeation ink and high-permeation ink are employed for the non-edge area that is adjacent to the edge area, and to perform printing, the low-permeation ink is ejected onto the non-edge area prior to the high-permeation ink.
    Type: Application
    Filed: July 15, 2011
    Publication date: January 26, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yasunori Fujimoto, Masato Kawakami, Takeshi Honma
  • Publication number: 20110201208
    Abstract: According to one embodiment, a process gas containing a fluorocarbon-based gas being an etch gas having a deposition property and SF6 gas as an additional gas are introduced into a process chamber, a plasma is generated in the process chamber, and an etching is performed on a silicon-containing oxide film formed on a substrate by using a resist pattern as a mask through the plasma. At this time, based on a relationship between an etch rate and a resist selectivity that is changed with respect to a change in a flow rate of the additional gas, the flow rate of the additional gas is set to a range of the flow rate in which changes in the etch rate and the resist selectivity accompanying an increase in the flow rate of the additional gas tend to increase.
    Type: Application
    Filed: October 19, 2009
    Publication date: August 18, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masato Kawakami, Sumie Nagaseki
  • Publication number: 20100321029
    Abstract: Provided is a technique capable of ascertaining the process condition of the boundary between electrically positive and negative plasma regions. In a vacuum chamber, one of the parameters of process conditions is stepwisely changed to generate a plasma under at least three process conditions. The parameters include a flow rate ratio between an electrically negative gas and an electrically positive gas, a pressure in the vacuum chamber and the magnitude of an energy supplied to the gases. Next, a voltage is applied to a Langmuir probe positioned in that plasma, and a current-voltage curve indicating the relationship between the applied voltage and the electric current to flow through the probe is acquired for each of the process conditions. On the basis of the current-voltage curve group acquired, the process conditions are determined for the boundary between the electrically positive and negative plasma regions.
    Type: Application
    Filed: January 30, 2009
    Publication date: December 23, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Toru Ito, Masato Kawakami, Sumie Nagaseki, Kazuki Denpoh
  • Publication number: 20100267243
    Abstract: In the plasma processing by an electrically negative gas, the in-plane uniformity of plasma processing is enhanced compared to the conventional case by controlling the ion density in the plasma. Not only is a processing gas being an electrically negative gas introduced from a processing gas source 170 into a processing chamber 102 but also an electrically negative gas having electron attachment coefficient greater than that of the processing gas is introduced as an additional gas from an additional gas source 180 to thereby form a plasma. In the plasma formation, the ion density in the plasma is controlled by regulating the flow rate of the additional gas relative to that of the processing gas.
    Type: Application
    Filed: September 1, 2008
    Publication date: October 21, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masato Kawakami, Sumie Nagaseki, Toru Ito
  • Patent number: 7651733
    Abstract: A vapor-phase growing unit of this invention includes: a reaction container in which a substrate is arranged, a first gas-introducing part having a first gas-introducing tube in which a gas-spouting port opening in the reaction container is formed, the first gas-introducing part serving to supply into the reaction container a first gas consisting of an organic-metal including gas, and a second gas-introducing part having a second gas-introducing tube in which a gas-spouting port opening in the reaction container is formed, the second gas-introducing part serving to supply into the reaction container a second gas which reacts with the organic-metal including gas and whose density is smaller than that of the organic-metal including gas. The gas-spouting port of the first gas-introducing tube and the gas-spouting port of the second gas-introducing tube are arranged along an outside periphery of the substrate arranged in the reaction container.
    Type: Grant
    Filed: April 20, 2006
    Date of Patent: January 26, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Kazuhide Hasebe, Hiroyuki Yamamoto, Takahito Umehara, Masato Kawakami
  • Publication number: 20090269494
    Abstract: A film forming apparatus comprises a processing chamber for holding therein a to-be-processed substrate, a first gas supplying means for supplying into the processing chamber a first vapor source including a metal alkoxide having a tertiary butoxyl group as a ligand, and a second gas supplying means for supplying into the processing chamber a second vapor source including a silicon alkoxide source, wherein the first gas supplying means and the second gas supplying means are connected to a pre-reaction means for causing pre-reactions of the first vapor source and the second vapor source, and the film forming apparatus is configured to supply the first vapor source and the second vapor source after the pre-reactions into the processing chamber.
    Type: Application
    Filed: April 3, 2006
    Publication date: October 29, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tsuyoshi Takahashi, Shintaro Aoyama, Takahiro Shinada, Masato Kawakami
  • Publication number: 20080001983
    Abstract: An image-forming apparatus is provided for formation of a high-quality image without irregularity in the image density independently of the infiltration time of the pretreatment liquid or the delivery speed of the plain paper sheet for the printing. The interval between a pretreatment liquid applicator 30 and printing heads 21-24 is adjusted by a stepping motor 98 driven by a stepping motor control circuit 34 based on the delivery speed data read by a memory controller 68. Thereby an endless belt 90 is allowed to circulate in the direction of the arrow-C or arrow-D. This circulation movement of the endless belt displaces the applicator holder 82 or the pretreatment liquid applicator 30 at an intended distance in the arrow-A direction or the reverse direction along the guide rail 86,88.
    Type: Application
    Filed: June 26, 2007
    Publication date: January 3, 2008
    Applicant: CANON FINETECH INC.
    Inventors: Masato Kawakami, Hiromi Mochizuki