Patents by Inventor Masato Kohsaka

Masato Kohsaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Two-wavelength antireflection film and objective lens coated with two-wavelength antireflection film
    Patent number: 6819498
    Abstract: A two-wavelength antireflection film to prevent light in two-wavelength regions of a deep-ultraviolet region and a region from a visible region to the near-infrared region on a surface of a substrate by coating the two-wavelength antireflection film on the surface of the substrate which penetrates light from the deep-ultraviolet region to the near-infrared region, comprising a first thin film which is formed on the substrate, and has a refractive index of 1.6 to 2.0 and optical film thickness of 0.4&lgr; to 0.7&lgr; for design main wavelength (&lgr;), a second thin film which is formed on the first thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.05&lgr; to 0.6&lgr; for the design main wavelength &lgr;, a third thin film which is formed on the second thin film, and has a refractive index of 1.6 to 2.0 and an optical film thickness of 0.1&lgr; to 0.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: November 16, 2004
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Tadashi Watanabe, Hideto Yamashita, Masato Kohsaka, Takao Yamauchi, Kiyonobu Kurata
  • TWO-WAVELENGTH ANTIREFLECTION FILM AND OBJECTIVE LENS COATED WITH TWO-WAVELENGTH ANTIREFLECTION FILM
    Publication number: 20040218282
    Abstract: A two-wavelength antireflection film to prevent light in two-wavelength regions of a deep-ultraviolet region and a region from a visible region to the near-infrared region on a surface of a substrate by coating the two-wavelength antireflection film on the surface of the substrate which penetrates light from the deep-ultraviolet region to the near-infrared region, comprising a first thin film which is formed on the substrate, and has a refractive index of 1.6 to 2.0 and optical film thickness of 0.4&lgr; to 0.7&lgr; for design main wavelength (&lgr;), a second thin film which is formed on the first thin film, and has a refractive index of 1.35 to 1.55 and an optical film thickness of 0.05&lgr; to 0.6&lgr; for the design main wavelength &lgr;, a third thin film which is formed on the second thin film, and has a refractive index of 1.6 to 2.0 and an optical film thickness of 0.1&lgr; to 0.
    Type: Application
    Filed: April 28, 2003
    Publication date: November 4, 2004
    Applicant: Olympus Optical Co. , Ltd.
    Inventors: Tadashi Watanabe, Hideto Yamashita, Masato Kohsaka, Takao Yamauchi, Kiyonobu Kurata