Abstract: An imaging lens (PL) has an image surface (I) curved to have a concave surface facing an object and consists of, in order from the object along an optical axis (Ax): a front group (Ga) including four lenses (L1 to L4); and a back group (Gb) including a single lens (L5). The following conditional expression is satisfied. 0.25<Dab/TL<0.50 0.30<La/TL<0.55 where, Dab denotes a distance between the front group (Ga) and the back group (Gb) on the optical axis, La denotes a length of the front group (Ga) on the optical axis, and TL denotes a total length of the imaging lens (PL) (a distance between a vertex of a lens surface closest to the object and an axial image point corresponding to an infinite distant object).

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a?, which orthogonally projects point a on the plate, and a second line segment linking point B and point b?, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.

Abstract: When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, the mask pattern is minimized in size. A projection exposure apparatus relatively moves a mask and a substrate and forms a magnified image of a pattern of the mask. The apparatus includes projection optical systems, each having an enlargement magnification and forming an image of a pattern of the mask on the substrate. A first line segment formed by connecting view points of the projection optical systems on the mask and a second line segment formed by connecting conjugate points of the view points on the substrate form corresponding sides of two similar figures of which magnification ratio is the magnification.

Abstract: When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a?, which orthogonally projects point a on the plate, and a second line segment linking point B and point b?, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

Abstract: A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

Abstract: An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.

Abstract: There is disclosed an exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of the first object onto the second object.

Abstract: An exposure/imaging apparatus and method effects projection exposure while moving a first object and a second object in a predetermined moving direction, effecting projection exposure of an image of the first object onto the second object. An adjusting member is used to adjust imaging characteristics of a projection optical system that is used to perform the projection exposure.

Abstract: An aperture stop that can be used in an exposure apparatus and method includes a central aperture region defined by a circular arc and a peripheral region having a decreased width.

Abstract: A condenser optical system obtains a predetermined, desired optical characteristic in a simple structure having a small number of lenses. A condenser optical system having an entrance focal plane and an exit focal plane, and that forms an image at the exit focal plane of an object located at the entrance focal plane, includes in order from an object side, a first lens group having a negative lens having a concave surface that faces the object side, a second lens group having a positive lens, and a third lens group. The first lens group has at least one aspherical lens surface.

Abstract: An exposure method includes first through third steps. In the first step, respective first and second illumination regions of a mask having a predetermined pattern are illuminated with an illumination light having a predetermined wavelength. In the second step, an image of the mask is formed, respectively, in first and second exposure regions (formed on a substrate) based on the illumination that passes through the first and second illumination regions. The first and second exposure regions each have a substantially polygonal shape defined by two parallel sides and two sides other than the two parallel sides. In the third step, the first and second exposure regions and the substrate are moved relatively in a first direction such that the first and second exposure regions are formed in different positions in a second direction which crosses the first direction.

Abstract: A closet storage arrangement for increasing closet storage capacity includes a shoe case having two vertical side walls with a plurality of vertically spaced tiers for shoe storage provided in the case. Each tier has three horizontal shoe support members on which a shoe is rested. A clothes hang bar for supporting clothing may also be provided with the hang bar secured on each end in a vertical support member. Each vertical support member is stabilized against the back wall of the closet by a stabilizing arrangement. A shelf may be supported by the vertical support members. A peg bar, having selectively removable pegs, for hanging articles may also be provided in the closet.