Patents by Inventor Masatoshi HATAYAMA

Masatoshi HATAYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180137948
    Abstract: To suppress the breakage of a mirror for reflecting high-intensity EUV light, an EUV multilayer mirror presenting a Bragg diffraction effect is formed by a pile of a plurality of heavy-element layers (102) and a plurality of light-element layers (103) disposed on a substrate (101), wherein the light-element layers and the heavy-element layers are alternately deposited. The heavy-element layers (102) contain niobium as a main component, and the light-element layers (103) contain silicon as a main component. For example, the heavy-element layers (102) made of niobium and the light-element layers (103) made of silicon are alternately deposited on the substrate (101) made of single-crystal silicon.
    Type: Application
    Filed: July 20, 2016
    Publication date: May 17, 2018
    Inventors: Satoshi ICHIMARU, Masatoshi HATAYAMA, Masaharu NISHIKINO, Masahiko ISHINO