Patents by Inventor Masatoshi Kawakita
Masatoshi Kawakita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11938511Abstract: A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.Type: GrantFiled: June 30, 2022Date of Patent: March 26, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Masatoshi Kawakita, Yusaku Hashimoto, Kosuke Yoshihara
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Publication number: 20230407482Abstract: A substrate processing apparatus for forming a coating film on a peripheral edge portion including a peripheral edge of a front surface and a side surface of a substrate, includes: a substrate holder for rotatably holding the substrate; a first chemical liquid supplier for supplying a first chemical liquid onto the peripheral edge including a rear surface of the substrate; a partial removing part for removing the first chemical liquid adhering to at least a portion of the front and side surfaces; a second chemical liquid supplier for supplying a second chemical liquid for forming the coating film onto the front and side surfaces; a first chemical liquid removing part for removing the first chemical liquid remaining on the substrate to which the second chemical liquid adheres; and a controller for controlling the parts described above.Type: ApplicationFiled: August 30, 2023Publication date: December 21, 2023Inventors: Shogo INABA, Masatoshi KAWAKITA
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Patent number: 11773492Abstract: A substrate processing apparatus for forming a coating film on a peripheral edge portion including a peripheral edge of a front surface and a side surface of a substrate, includes: a substrate holder for rotatably holding the substrate; a first chemical liquid supplier for supplying a first chemical liquid onto the peripheral edge including a rear surface of the substrate; a partial removing part for removing the first chemical liquid adhering to at least a portion of the front and side surfaces; a second chemical liquid supplier for supplying a second chemical liquid for forming the coating film onto the front and side surfaces; a first chemical liquid removing part for removing the first chemical liquid remaining on the substrate to which the second chemical liquid adheres; and a controller for controlling the parts described above.Type: GrantFiled: September 2, 2021Date of Patent: October 3, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Shogo Inaba, Masatoshi Kawakita
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Patent number: 11676844Abstract: A coating film forming apparatus includes a carry-in/out section in which a substrate is carried in and carried out; a periphery coating module configured to form a ring-shaped coating film by supplying a coating liquid along a periphery of the substrate based on a processing parameter for controlling a coating state by the coating film; an imaging module configured to image the substrate on which the ring-shaped coating film is formed; a transfer mechanism configured to transfer the substrate; and a controller configured to output a control signal to perform a process of forming the ring-shaped coating film on the substrate based on the processing parameter having different values and imaging the substrate by the imaging module, and configured to determine, based on an imaging result of the substrate, a value of the processing parameter for forming the ring-shaped coating film on the substrate in the periphery coating module.Type: GrantFiled: June 4, 2019Date of Patent: June 13, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Akiko Kiyotomi, Masatoshi Kawakita
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Publication number: 20220371047Abstract: A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method, includes mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution to the substrate.Type: ApplicationFiled: June 25, 2020Publication date: November 24, 2022Inventors: Yusaku HASHIMOTO, Masatoshi KAWAKITA, Kosuke YOSHIHARA
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Publication number: 20220323990Abstract: A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.Type: ApplicationFiled: June 30, 2022Publication date: October 13, 2022Inventors: Masatoshi Kawakita, Yusaku Hashimoto, Kosuke Yoshihara
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Patent number: 11407005Abstract: A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.Type: GrantFiled: May 8, 2020Date of Patent: August 9, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Masatoshi Kawakita, Yusaku Hashimoto, Kosuke Yoshihara
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Publication number: 20220074053Abstract: A substrate processing apparatus for forming a coating film on a peripheral edge portion including a peripheral edge of a front surface and a side surface of a substrate, includes: a substrate holder for rotatably holding the substrate; a first chemical liquid supplier for supplying a first chemical liquid onto the peripheral edge including a rear surface of the substrate; a partial removing part for removing the first chemical liquid adhering to at least a portion of the front and side surfaces; a second chemical liquid supplier for supplying a second chemical liquid for forming the coating film onto the front and side surfaces; a first chemical liquid removing part for removing the first chemical liquid remaining on the substrate to which the second chemical liquid adheres; and a controller for controlling the parts described above.Type: ApplicationFiled: September 2, 2021Publication date: March 10, 2022Inventors: Shogo INABA, Masatoshi KAWAKITA
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Publication number: 20210078035Abstract: A coating method, includes: rotating a substrate at a first rotation speed while supplying a film-forming liquid to a center of a front surface of the substrate; stopping the supply of the film-forming liquid before the film-forming liquid supplied to the front surface of the substrate reaches an outer periphery of the substrate; continuing to rotate the substrate at a second rotation speed after the supply of the film-forming liquid is stopped; and supplying a cooling fluid, which is a gas-liquid mixture, to an outer peripheral portion of a rear surface of the substrate during a supply period for the substrate including at least a part of a period from a time when the supply of the film-forming liquid is stopped to a time when the rotation of the substrate at the second rotation speed is completed.Type: ApplicationFiled: September 11, 2020Publication date: March 18, 2021Inventors: Yusaku HASHIMOTO, Masatoshi KAWAKITA, Daiki SHIBATA
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Publication number: 20200353503Abstract: A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.Type: ApplicationFiled: May 8, 2020Publication date: November 12, 2020Inventors: Masatoshi Kawakita, Yusaku Hashimoto, Kosuke Yoshihara
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Publication number: 20190378739Abstract: A coating film forming apparatus includes a carry-in/out section in which a substrate is carried in and carried out; a periphery coating module configured to form a ring-shaped coating film by supplying a coating liquid along a periphery of the substrate based on a processing parameter for controlling a coating state by the coating film; an imaging module configured to image the substrate on which the ring-shaped coating film is formed; a transfer mechanism configured to transfer the substrate; and a controller configured to output a control signal to perform a process of forming the ring-shaped coating film on the substrate based on the processing parameter having different values and imaging the substrate by the imaging module, and configured to determine, based on an imaging result of the substrate, a value of the processing parameter for forming the ring-shaped coating film on the substrate in the periphery coating module.Type: ApplicationFiled: June 4, 2019Publication date: December 12, 2019Inventors: Akiko Kiyotomi, Masatoshi Kawakita