Abstract: There is provided a gas handling device assembly of which one of gas handling devices can be removed from the gas handling device assembly without loosening other component devices. The gas handling device assembly has a base plate having a top surface and a bottom surface opposite to the top surface. A plurality of through holes extending from the top surface to the bottom surface are formed in the base plate so that the gas flows through the through holes. There is provided a gas-handling device having a mount surface via which the gas-handling device is fixed to the base plate, an inlet port and an outlet port for the gas being formed on the mount surface so that each of the inlet port and the outlet port is connected to one of through holes of the base plate. There is also provided a connecting tube having a first connecting member on one end and a second connecting member on the other end, the first connecting member and the second connecting member facing toward the same direction.

Abstract: A vacuum extraction system is connected to a reactor vessel in which a chemical vapor deposition (CVD) process is carried out by using a suitable starting gas. The system comprises a pump for extracting a vacuum from the vessel, and a trapping device provided in the vessel and the pump for treating a starting gas pulled from the vessel into the system during the CVD process. The treatment of the starting gas pulled from the vessel is performed by using a gaseous oxidizing agent for separating a deposition component from the starting gas pulled from the vessel as an oxide, whereby a build-up of the component of the gas can be prevented in the pump. The trapping device comprises a tank body for receiving the starting gas pulled therein, and a perforated tube for introducing the gaseous oxidizing agent into the tank body to separate the deposition component of the received starting gas therefrom as an oxide.