Patents by Inventor Masatsugu Akiba
Masatsugu Akiba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8536258Abstract: The present invention provides a stabilizer containing, as a main component, a bisphenol monoester and a bisphenol-based compound, wherein the area of the bisphenol-based compound is 0.15 to 70 when the area of the bisphenol monoester is set to be 100 in a chromatograph obtained by liquid chromatography analysis of the stabilizer, a method of manufacturing the same, a thermoplastic polymer composition containing the stabilizer, as well as a stabilizer that can further improve the process stability of the thermoplastic polymer, as compared with the conventional one, by compounding the stabilizer into the thermoplastic polymer through a method of stabilizing the thermoplastic polymer using the stabilizer and a method of manufacturing the stabilizer.Type: GrantFiled: July 16, 2008Date of Patent: September 17, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Ryoji Soma, Kenji Kimura, Masatsugu Akiba
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Patent number: 8076402Abstract: A bisphenol monoester compound represented by the formula (1): (in the formula (1), Rs each represent independently a hydrogen atom or a methyl group, and R? represents an alkyl group of a carbon number of 1 to 6, or a hydrogen atom).Type: GrantFiled: November 26, 2008Date of Patent: December 13, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Ryoji Soma, Toyomochi Tamato, Masatsugu Akiba, Tatsumi Nuno
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Patent number: 7977418Abstract: The present invention provides a bisphenol monoester-based stabilizer composition that can improve resistance to discoloration at high temperature of a thermoplastic polymer compared with a conventional one using a bisphenol monoester-based stabilizer composition including a bisphenol monoester-based compound mainly, wherein a compound represented by the following formula: is contained in an area percentage by liquid chromatography analysis of 0.1 to 3%, a thermoplastic polymer composition and a method of manufacturing the thermoplastic polymer composition, a thermoplastic polymer molded product, and a method of stabilizing a thermoplastic polymer, as well as a thermoplastic polymer composition in which resistance to discoloration at high temperature is improved by using the stabilizer composition and a method of manufacturing the thermoplastic polymer composition, a thermoplastic polymer molded product, and a method of stabilizing a thermoplastic polymer.Type: GrantFiled: July 21, 2008Date of Patent: July 12, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Kenji Kimura, Ryoji Soma, Masatsugu Akiba, Toyomochi Tamato
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Publication number: 20090143517Abstract: A bisphenol monoester compound represented by the formula (1): (in the formula (1), Rs each represent independently a hydrogen atom or a methyl group, and R? represents an alkyl group of a carbon number of 1 to 6, or a hydrogen atom).Type: ApplicationFiled: November 26, 2008Publication date: June 4, 2009Inventors: Ryoji Soma, Toyomochi Tamato, Masatsugu Akiba, Tatsumi Nuno
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Publication number: 20090043027Abstract: The present invention provides a bisphenol monoester-based stabilizer composition that can improve resistance to discoloration at high temperature of a thermoplastic polymer compared with a conventional one using a bisphenol monoester-based stabilizer composition including a bisphenol monoester-based compound mainly, wherein a compound represented by the following formula: is contained in an area percentage by liquid chromatography analysis of 0.1 to 3%, a thermoplastic polymer composition and a method of manufacturing the thermoplastic polymer composition, a thermoplastic polymer molded product, and a method of stabilizing a thermoplastic polymer, as well as a thermoplastic polymer composition in which resistance to discoloration at high temperature is improved by using the stabilizer composition and a method of manufacturing the thermoplastic polymer composition, a thermoplastic polymer molded product, and a method of stabilizing a thermoplastic polymer.Type: ApplicationFiled: July 21, 2008Publication date: February 12, 2009Inventors: Kenji Kimura, Ryoji Soma, Masatsugu Akiba, Toyomochi Tamato
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Publication number: 20090030127Abstract: The present invention provides a stabilizer containing, as a main component, a bisphenol monoester and a bisphenol-based compound, wherein the area of the bisphenol-based compound is 0.15 to 70 when the area of the bisphenol monoester is set to be 100 in a chromatograph obtained by liquid chromatography analysis of the stabilizer, a method of manufacturing the same, a thermoplastic polymer composition containing the stabilizer, as well as a stabilizer that can further improve the process stability of the thermoplastic polymer, as compared with the conventional one, by compounding the stabilizer into the thermoplastic polymer through a method of stabilizing the thermoplastic polymer using the stabilizer and a method of manufacturing the stabilizer.Type: ApplicationFiled: July 16, 2008Publication date: January 29, 2009Inventors: Ryoji Soma, Kenji Kimura, Masatsugu Akiba
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Patent number: 6011130Abstract: Provided is an epoxy resin composition comprising a crystalline epoxy resin and an amorphous epoxy curing agent, wherein the crystalline epoxy resin is dispersing uniformly in the amorphous epoxy curing agent as crystallites. The epoxy resin composition is excellent in preservation stability.Type: GrantFiled: September 12, 1997Date of Patent: January 4, 2000Assignee: Sumitomo Chemical Company, LimitedInventors: Noriyuki Arai, Masatsugu Akiba
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Patent number: 5939473Abstract: The stilbene epoxy resin having two different aryl groups and an epoxy resin mixture including this stilbene epoxy resin have lower melting points than those of the stilbene epoxy resin having two identical aryl groups and the epoxy resin mixture of the latter stilbene epoxy resin. Compared with the conventional resins, the present resin or resin mixture has improved working and molding properties, which shortens the time required for the molding and working process, resulting in economic advantages and a preferred affect on productivity. The present epoxy resin or resin mixture is preferably used as an adhesive, a coating, an insulating material, an electrical or electronic material for laminated sheets or the like. It is especially suited for use as material for encapsulating electronic parts.Type: GrantFiled: April 29, 1996Date of Patent: August 17, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuhiro Hirano, Masatsugu Akiba, Akira Yokota, Hiroshi Nakamura, Shigeki Naitoh
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Patent number: 5939509Abstract: The stilbene epoxy resin having two different aryl groups and an epoxy resin mixture including this stilbene epoxy resin have lower melting points than those of the stilbene epoxy resin having two identical aryl groups and the epoxy resin mixture of the latter stilbene epoxy resin. Compared with the conventional resins, the present resin or resin mixture has improved working and molding properties, which. shortens the time required for the molding and working process, resulting in economic advantages and a preferred affect on productivity. The present epoxy resin or resin mixture is preferably used as an adhesive, a coating, an insulating material, an electrical or electronic material for laminated sheets or the like. It is especially suited for use as material for encapsulating electronic parts.Type: GrantFiled: June 20, 1997Date of Patent: August 17, 1999Assignee: Sumitomo Chemical Company, Ltd.Inventors: Yasuhiro Hirano, Masatsugu Akiba, Akira Yokota, Hiroshi Nakamura, Shigeki Naitoh
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Patent number: 5854370Abstract: The invention provides a cis-stilbene type epoxy resin having lower melting point and lower viscosity than the trans-stilbene type epoxy resin hitherto known. The stilbene type epoxy resin has a cis-isomer content of essentially 100%, or in the alternative, at least about 10% with the rest being the trans-isomer, and is based on the following general formula (1): ##STR1## wherein R.sub.1 to R.sub.8 are independently an acyclic or cyclic alkyl group, a hydrogen atom, or a halogen atom. Production processes for these epoxy resins are also disclosed.Type: GrantFiled: May 27, 1997Date of Patent: December 29, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Akira Yokota, Yasuhiro Hirano, Masatsugu Akiba, Hiroshi Nakamura, Shigeki Naitoh
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Patent number: 5780145Abstract: A molding resin composition containing, in a resin, a filler comprising a globular powder of which mean particle diameter is not smaller than 0.1 .mu.m and not greater than 1.5 .mu.m (x component), a globular powder of which mean particle diameter is not smaller than 2 .mu.m and not greater than 15 .mu.m (y component) and a globular powder of which mean particle diameter is not smaller than 20 .mu.m and not greater than 70 .mu.m (z component), wherein proportions of the x, y and z components based on the total volume of x, y and z components are not smaller than 10% by volume and not greater than 24% by volume, not smaller than 0.1% by volume and not greater than 36% by volume and not smaller than 57% by volume and not greater than 76% by volume, exhibits an excellent fluidity even when loaded with a high percentage of filler. Further, their cured products are lowered in the moisture absorption and thermal expansion coefficient of which increases result from the resin itself present in the cured product.Type: GrantFiled: June 30, 1997Date of Patent: July 14, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuhiro Hirano, Masatsugu Akiba, Yutaka Shiomi, Noriaki Saito
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Patent number: 5750789Abstract: An unsaturated imide compound represented by formula (1): ##STR1## wherein Q is an alicyclic structure-containing hydrocarbon group having 4-20 carbon atoms; each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.i and R.sub.j represents a hydrogen atom, a halogen atom, a hydrocarbon group having 1-6 carbon atoms or a halogen-containing hydrocarbon group having 1-6 carbon atoms; each of a, b, c, d, e and f represents an integer of 0 to 4 satisfying a+b.ltoreq.4, c+d.ltoreq.4 and e+f.ltoreq.4 and D represents a divalent organic group having 2-24 carbon atoms and an ethylenically unsaturated double bond, a process for producing the unsaturated imide compound of formula (1) and intermediates for producing the unsaturated imide compound of formula (1). The unsaturated imide compound of formula (1) is well soluble in organic solvents and can give cured products excellent in heat resistance, low water absorption and flexibility.Type: GrantFiled: September 29, 1995Date of Patent: May 12, 1998Assignee: Sumitomo Chemical Company LimitedInventors: Yasuhiro Hirano, Yasuhiro Endo, Kazuo Takebe, Mitsuhiro Shibata, Shuichi Kanagawa, Yutaka Shiomi, Masatsugu Akiba, Shinichiro Kitayama
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Patent number: 5719225Abstract: A molding resin composition containing, in a resin, a filler comprising a globular powder of which mean particle diameter is not smaller than 0.1 .mu.m and not greater than 1.5 .mu.m (x component), a globular powder of which mean particle diameter is not smaller than 2 .mu.m and not greater than 15 .mu.m (y component) and a globular powder of which mean particle diameter is not smaller than 20 .mu.m and not greater than 70 .mu.m (z component), wherein proportions of the x, y and z components based on the total volume of x, y and z components are not smaller than 10% by volume and not greater than 24% by volume, not smaller than 0.1% by volume and not greater than 36% by volume and not smaller than 57% by volume and not greater than 76% by volume, exhibits an excellent fluidity even when loaded with a high percentage of filler. Further, their cured products are lowered in the moisture absorption and thermal expansion coefficient of which increases result from the resin itself present in the cured product.Type: GrantFiled: June 7, 1995Date of Patent: February 17, 1998Assignee: Sumitomo Chemical Company, Ltd.Inventors: Yasuhiro Hirano, Masatsugu Akiba, Yutaka Shiomi, Noriaki Saito
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Patent number: 5705596Abstract: The invention provides a cis-stilbene type epoxy resin having lower melting point and lower viscosity than the trans-stilbene type epoxy resin hitherto known. The stilbene type epoxy resin has a cis-isomer content of essentially 100%, or in the alternative, at least about 10% with the rest being the trans-isomer, and is based on the following general formula (1): ##STR1## wherein R.sub.1 to R.sub.8 are independently an acyclic or cyclic alkyl group, a hydrogen atom, or a halogen atom. Production processes for these epoxy resins are also disclosed.Type: GrantFiled: June 3, 1996Date of Patent: January 6, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Akira Yokota, Yasuhiro Hirano, Masatsugu Akiba, Hiroshi Nakamura, Shigeki Naitoh
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Patent number: 5646204Abstract: An epoxy resin composition comprising (A) an epoxy resin represented by the general formula (1) ##STR1## wherein each R.sub.1, independent of the other, represents hydrogen, a hologen atom, an alkyl group having 1 to 6 carbon atoms, substituted- or nonsubstituted-phenyl groups, and X represents ##STR2## and n represents an integer of 0 to 4, and (B) a curing agent, which composition provides a cured product exhibiting low hygroscopicity and high adhesiveness.Type: GrantFiled: September 8, 1995Date of Patent: July 8, 1997Assignee: Sumitomo Chemical Company, LimitedInventors: Masatsugu Akiba, Yutaka Shiomi, Kazuo Takebe, Noriaki Saito, Takashi Morimoto
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Patent number: 5498687Abstract: An unsaturated imide compound represented by formula (1): ##STR1## wherein Q is an alicyclic structure-containing hydrocarbon group having 4-20 carbon atoms; each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.i and R.sub.j represents a hydrogen atom, a halogen atom, a hydrocarbon group having 1-6 carbon atoms or a halogen-containing hydrocarbon group having 1-6 carbon atoms; each of a, b, c, d, e and f represents an integer of 0 to 4 satisfying a+b.ltoreq.4, c+d.ltoreq.4 and e+f.ltoreq.4 and D represents a divalent organic group having 2-24 carbon atoms and an ethylenically unsaturated double bond, a process for producing the unsaturated imide compound of formula (1) and intermediates for producing the unsaturated imide compound of formula (1). The unsaturated imide compound of formula (1) is well soluble in organic solvents and can give cured products excellent in heat resistance, low water absorption and flexibility.Type: GrantFiled: March 28, 1995Date of Patent: March 12, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuhiro Hirano, Yasuhiro Endo, Kazuo Takebe, Mitsuhiro Shibata, Shuichi Kanagawa, Yutaka Shiomi, Masatsugu Akiba, Shinichiro Kitayama
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Patent number: 5444165Abstract: An unsaturated imide compound represented by formula (1): ##STR1## wherein Q is an alicyclic structure-containing hydrocarbon group having 4-20 carbon atoms; each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.i and R.sub.j represents a hydrogen atom, a halogen atom, a hydrocarbon group having 1-6 carbon atoms or a halogen-containing hydrocarbon group having 1-6 carbon atoms; each of a, b, c, d, e and f represents an integer of 0 to 4 satisfying a+b.ltoreq.4, c+d.ltoreq.4 and e+f.ltoreq.4 and D represents a divalent organic group having 2-24 carbon atoms and an ethylenically unsaturated double bond, a process for producing the unsaturated imide compound of formula (1) and intermediates for producing the unsaturated imide compound of formula (1). The unsaturated imide compound of formula (1) is well soluble in organic solvents and can give cured products excellent in heat resistance, low water absorption and flexibility.Type: GrantFiled: February 25, 1994Date of Patent: August 22, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasuhiro Hirano, Yasuhiro Endo, Kazuo Takebe, Mitsuhiro Shibata, Shuichi Kanagawa, Yutaka Shiomi, Masatsugu Akiba, Shinichiro Kitayama
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Patent number: 5326881Abstract: An unsaturated imide compound represented by formula (1): ##STR1## wherein Q is an alicyclic structure-containing hydrocarbon group having 4-20 carbon atoms; each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.i and R.sub.j represents a hydrogen atom, a halogen atom, a hydrocarbon group having 1-6 carbon atoms or a halogen-containing hydrocarbon group having 1-6 carbon atoms; each of a, b, c, d, e and f represents an integer of 0 to 4 satisfying a+b.ltoreq.4, c+d.ltoreq.4 and e+f.ltoreq.4 and D represents a divalent organic group having 2-24 carbon atoms and an ethylenically unsaturated double bond, a process for producing the unsaturated imide compound of formula (1) and intermediates for producing the unsaturated imide compound of formula (1). The unsaturated imide compound of formula (1) is well soluble in organic solvents and can give cured products excellent in heat resistance, low water absorption and flexibility.Type: GrantFiled: October 28, 1993Date of Patent: July 5, 1994Assignee: Sumitomo Chemical Company Ltd.Inventors: Yasuhiro Hirano, Yasuhiro Endo, Kazuo Takebe, Mitsuhiro Shibata, Shuichi Kanagawa, Yutaka Shiomi, Masatsugu Akiba, Shinichiro Kitayama