Patents by Inventor Masatsugu Niimi

Masatsugu Niimi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROCESS FOR PRODUCTION OF PHOTORESIST RESINS
    Publication number: 20100216959
    Abstract: The object of the present invention is to provide a method for production of a photoresist resin which enables to reduce the amount of solvent used, to remove effectively impurities such as low molecular components and metal components and to prepare easily a resin having a narrow molecular weight distribution. The present invention is a method for production of a photoresist resin by polymerizing a polymerizable compound in the presence of a solvent and the method comprises (1) a resin solution preparation process in which a resin solution containing a photoreist resin is prepared, and (2) a purification process in which the resin solution is purified using a ultrafilter membrane.
    Type: Application
    Filed: October 21, 2008
    Publication date: August 26, 2010
    Applicant: JSR Corporation
    Inventors: Isamu Yonekura, Fumie Honda, Yasuhiro Ito, Masatsugu Niimi