Abstract: A method of applying heat shield material to form a heat shield layer on a crown surface of a piston of an engine is provided. The method includes the steps of disposing a dispenser that linearly discharges the heat shield material toward the crown surface, and moving an applied position of the heat shield material with respect to the crown surface in a circumferential direction of the crown surface, while discharging the heat shield material from the dispenser toward the crown surface.

Abstract: An actinic radiation sensitive polymer composition containing(a) a polyimide precursor obtainable by the interaction of an amine compound having a photocrosslinking group with carboxyl groups of a poly(amic acid) chain, and(b) a photoinitiator and/or photosensitizer,in which the degree of imidization Ia is 0.03.ltoreq.Ia.ltoreq.0.6, has the characteristic features of both good stability of viscosity with lapse of time and good photosensitive performance.

Abstract: A developer for quinonediazide/novlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a<bn or a>bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.

Abstract: The present invention relates to a positive electron beam resist composition containing a cresolnovolak resin, a lower molecular additive with a specific structure and a quinonediazide compound with a specific structure, and a developer for the positive electron beam resist, containing specific amounts of alkali metal ions, weak acid radical ions and a water soluble organic compound. The present invention can provide a positive electron beam resist composition with a novolak and a quinonediazide as main ingredients, excellent in dry etching resistance and resolution, and it if is used, a fine pattern can be obtained at high sensitivity especially when the developer of the present invention is used.

Abstract: The present invention relates to a method of forming positive polyimide patterns which includes a process wherein a film of a composition of actinic radiation-sensitive polyimide precursor is formed on a substrate which is selectively exposed to an actinic radiation, then such a treatment is applied to the film that the film in unexposed portion attains higher degree of curing than the film in exposed portion after the exposure, and the film is removed from the exposed portion. According to the invention, such an unexpected effect can be achieved as a positive polyimide pattern can be formed by using a composition of actinic radiation-sensitive polyimide precursor which has only been used in forming negative patterns. According to the invention, the positive polyimide pattern can be formed easily and the pattern obtained has excellent performance.

Abstract: A photosensitive polyimide precursor composition containing as main ingredients a poly(amic acid) wherein at least one molecular end is esterified with an alcohol, a compound containing carbon-carbon unsaturation having photoreactivity, and a photopolymerization initiator.The photosensitive polyimide precursor composition of the present invention can be prepared without the formation of any harmful by-product. When film formed from this composition is masked for patterning and then subjected to exposure and development using a developer, the amount of exposed portion dissolved in the developer until unexposed portion is dissolved off by the developer, is small and so it is possible to obtain a thick pattern. Further, by heat-treating this pattern, there can be obtained a thick polyimide pattern.

Abstract: The present invention is concerned with a printing plate of which image formation is done by photoirradiation, having a front side covered waith a peelable or removable protective layer which contains a photofading material. The printing plate is safe against fogging to light and can be used under ordinary illumination.

Abstract: A dry planographic plate has an image area and a non-image area in the shape of an image. The non-image area is constituted by a silicone rubber layer. The surface of the plate is coated with a thin film containing an organic polymer.

Abstract: Developing a dry planographic printing plate using a propylene oxide derivative.

Abstract: A presensitized dry planographic printing plate comprising a base layer, a photo-sensitive layer and a silicone rubber layer, characterized in that the photo-sensitive layer contains an effective amount of an organic acid.