Abstract: According to one embodiment a substrate treatment apparatus incorporates, into a frozen film, a contaminant adhered to a substrate surface by freezing a liquid film on the surface. The apparatus includes a placement part configured to rotate the substrate, a liquid supply part configured to supply a liquid via a nozzle to the frozen film including the contaminant, a moving part configured to move the nozzle parallel to the substrate surface, and a controller configured to control a rotation of the substrate by the placement part, a supply of the liquid by the liquid supply part, and a movement of the nozzle by the moving part. The controller rotates the substrate by controlling the placement part, supplies the liquid to the frozen film by controlling the liquid supply part, and moves the nozzle from a perimeter edge vicinity to a rotation center vicinity of the substrate by controlling the moving part.

Abstract: Provided is a water passage switching device capable of opening and closing valves by a very easy operation. The water passage switching device (10; 122) of the present invention capable of switching between at least three water spouting and stopping modes by opening and closing valves including: valve elements (26a, 26b, 26c; 142) configured to be moved between a valve-open position and a valve-closed position in response to the each water spouting and stopping mode; a pivotally movable tilting operation member (6; 112) directly operated by a user to switch between the each water spouting and stopping mode; and valve actuating rods (40a, 40b, 40c; 148) arranged around a pivot point of the tilting operation member, and each adapted to open and close a respective one of the plurality of valve elements based on a tilting movement in each direction of the tilting operation member.