Patents by Inventor Masayoshi Arai
Masayoshi Arai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11965049Abstract: Photosensitive compositions containing nanosized light emitting materials and (meth)acrylic polymer are suitable for use in a variety of optical applications, for example the preparation of quantum material doped photoresist films, especially for optical devices. Optical films can be prepared be by: a) providing the photosensitive composition onto a substrate, and b) polymerizing the photosensitive composition by exposing the photosensitive composition to radiation.Type: GrantFiled: July 31, 2019Date of Patent: April 23, 2024Assignee: MERCK PATENT GMBHInventors: Tadashi Kishimoto, Yuko Arai, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi
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Patent number: 9371301Abstract: A compound represented by the general formula (C): (wherein R101 represents a substituted or unsubstituted aromatic heterocyclic group, R102, R103, R104 and R105 may be the same or different, and each represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms, or a haloalkyl group having 1 to 3 carbon atoms, and R106 represents a hydrogen atom, or a saturated or unsaturated hydrocarbon group which is a straight or branched chain having 1 to 12 carbon atoms, but excluded is the case where R101 is a 3-furyl group, R102, R103, R104 and R105 are all methyl groups, and R106 is a methyl group, a 4-methyl-3-pentenyl group or a 4,8-dimethyl-3,7-nonadienyl group); or a pharmaceutically acceptable salt thereof has selective inhibitory activity on hypoxic cell growth in a broad range of the concentration and therefore is useful as an active ingredient of a medicament for cancer prevention or treatment.Type: GrantFiled: May 6, 2011Date of Patent: June 21, 2016Assignee: Osaka UniversityInventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Takashi Kawachi
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Patent number: 8791263Abstract: A compound represented by the general formula (M): (wherein R1 represents a substituted or unsubstituted aromatic heterocyclic group, R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms, OR3, N(R3)2, C(?O)OR3 or C(?O)N(R3)2, R3 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an acyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, an oxygen atom or OR5, and R5 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an acyl group having 1 to 3 carbon atoms); or a pharmaceutically acceptable salt thereof is a cortistatin A analog which is useful as an active ingredient of medicaments for cancer prevention or treatment in that the analog can be mass-produced by chemical synthesis due to its simple chemical structure and retains the same biological activities as those of cortistatin A.Type: GrantFiled: September 16, 2011Date of Patent: July 29, 2014Assignee: Osaka UniversityInventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Satoru Tamura
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Publication number: 20130210859Abstract: A compound represented by the general formula (M): (wherein R1 represents a substituted or unsubstituted aromatic heterocyclic group, R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms, OR3, N(R3)2, C(?O)OR3 or C(?O)N(R3)2, R3 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an acyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, an oxygen atom or OR5, and R5 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an acyl group having 1 to 3 carbon atoms); or a pharmaceutically acceptable salt thereof is a cortistatin A analog which is useful as an active ingredient of medicaments for cancer prevention or treatment in that the analog can be mass-produced by chemical synthesis due to its simple chemical structure and retains the same biological activities as those of cortistatin A.Type: ApplicationFiled: September 16, 2011Publication date: August 15, 2013Inventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Satoru Tamura
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Publication number: 20130065937Abstract: A compound represented by the general formula (C): (wherein R101 represents a substituted or unsubstituted aromatic heterocyclic group, R102, R103, R104 and R105 may be the same or different, and each represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms, or a haloalkyl group having 1 to 3 carbon atoms, and R106 represents a hydrogen atom, or a saturated or unsaturated hydrocarbon group which is a straight or branched chain having 1 to 12 carbon atoms, but excluded is the case where R101 is a 3-furyl group, R102, R103, R104 and R105 are all methyl groups, and R106 is a methyl group, a 4-methyl-3-pentenyl group or a 4,8-dimethyl-3,7-nonadienyl group); or a pharmaceutically acceptable salt thereof has selective inhibitory activity on hypoxic cell growth in a broad range of the concentration and therefore is useful as an active ingredient of a medicament for cancer prevention or treatment.Type: ApplicationFiled: May 6, 2011Publication date: March 14, 2013Applicant: Osaka UniversityInventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Takashi Kawachi
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Patent number: 8025087Abstract: The present invention solves the problem that a connecting portion between a horn and a vibration transmission rod has a tendency to get damaged and the problem associated with the structure in which a chip is attached to an end of the vibration transmission rod, which occur with the known ultrasonic vibration welder. A vibration transmission rod has an end surface serving as a vibration-and-pressure application surface, and a polygonal cross section. The vibration transmission rod is disposed at an end of a horn in such a manner that they vibrate together. The vibration transmission rod and a mass are formed separately. The mass applies pressure to a projection formed at a nodal point of the vibration transmission rod.Type: GrantFiled: July 23, 2008Date of Patent: September 27, 2011Assignee: Branson Ultrasonics CorporationInventors: Masayoshi Arai, Shigetomi Morita
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Patent number: 7931706Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.Type: GrantFiled: September 20, 2007Date of Patent: April 26, 2011Assignee: Taiheiyo Cement CorporationInventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
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Publication number: 20100206487Abstract: The present invention solves the problem that a connecting portion between a horn and a vibration transmission rod has a tendency to get damaged and the problem associated with the structure in which a chip is attached to an end of the vibration transmission rod, which occur with the known ultrasonic vibration welder. A vibration transmission rod has an end surface serving as a vibration-and-pressure application surface, and a polygonal cross section. The vibration transmission rod is disposed at an end of a horn in such a manner that they vibrate together. The vibration transmission rod and a mass are formed separately. The mass applies pressure to a projection formed at a nodal point of the vibration transmission rod.Type: ApplicationFiled: July 23, 2008Publication date: August 19, 2010Applicant: Branson Ultrasonics CorporationInventors: Masayoshi Arai, Shigetomi Morita
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Patent number: 7701555Abstract: An exposure apparatus is equipped with a laser unit that emits a laser beam, a memory that stores a first information which shows a first relation indicating a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from the laser unit, and a main controller that controls the spectral width of the laser beam via a laser controller, based on the first information and on information related to a reticle that is to be used. Main controller performs spectral width control of the laser beam so as to suppress linewidth error, based on the first information and on the information related to the reticle that is to be used.Type: GrantFiled: June 30, 2006Date of Patent: April 20, 2010Assignee: Nikon CorporationInventor: Masayoshi Arai
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Publication number: 20090201479Abstract: An exposure apparatus includes a laser light source that emits a laser beam as an exposure beam by pulse oscillation; a detection system that detects a rotation angle of an external shape of the laser beam emitted by the pulse oscillation from a corresponding laser light source; and a control device that controls a rotation angle of the external shape of the laser beam or a rotation angle of a linearly polarized light component of a corresponding laser beam or both of them, based on the rotation angle detected by the detection system.Type: ApplicationFiled: January 30, 2006Publication date: August 13, 2009Inventor: Masayoshi Arai
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Patent number: 7521428Abstract: Macrolide derivatives having enhancing effect for activities of azole antifungal agents, acting at low concentration and within a short time against fungal infection and reducing the frequency of appearance of resistant microorganisms. One such substance is a compound represented by the formula [I]: wherein R1 is Ac, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is H, when R1 Bzl, R2 and R3 are Bzl, and R4 is Me; when R1 is Ac, R2 and R3 are Pr, and R4 is Me; when R1 is Ac, R2 and R3 are Hex, and R4 is Me; when R1 is Ac, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 and R3 are Pr, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is Me; when R1 is H, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 is H, R3 is Bzl, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is H, or when R1 is H, R2 and R3 are Hex, and R4 is Et.Type: GrantFiled: October 29, 2002Date of Patent: April 21, 2009Assignee: The Kitasato InstituteInventors: Satoshi Omura, Hiroshi Tomoda, Toshiaki Sunazuka, Masayoshi Arai, Tohru Nagamitsu
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Publication number: 20080010899Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.Type: ApplicationFiled: September 20, 2007Publication date: January 17, 2008Inventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
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Publication number: 20070273852Abstract: An exposure apparatus is equipped with a laser unit that emits a laser beam, a memory that stores a first information which shows a first relation indicating a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from the laser unit, and a main controller that controls the spectral width of the laser beam via a laser controller, based on the first information and on information related to a reticle that is to be used. Main controller performs spectral width control of the laser beam so as to suppress linewidth error, based on the first information and on the information related to the reticle that is to be used.Type: ApplicationFiled: June 30, 2006Publication date: November 29, 2007Applicant: NIKON CORPORATIONInventor: Masayoshi Arai
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Patent number: 7285141Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.Type: GrantFiled: March 20, 2002Date of Patent: October 23, 2007Assignee: Taiheiyo Cement CorporationInventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
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Publication number: 20060252930Abstract: A microorganism belonging to Beauveria sp. and having ability to produce FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C (Beauveria sp. FKI-1366 FERM BP-08459) is cultured in a medium, accumulating FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C in the culture liquid and isolating FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C from the cultured mass. Since the thus obtained FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C or composition thereof have activity to enhance azole antifungal agent, the substance has an action against various fungal infections such as deep-seated mycosis and other fungal infections in the low concentration within short term. Consequently, the substance is useful for reducing frequency of appearance of resistant microorganisms and overcoming resistance, and is expected as a medicament.Type: ApplicationFiled: August 29, 2003Publication date: November 9, 2006Inventors: Satoshi Omura, Hiroshi Tomoda, Rokura Masuma, Masayoshi Arai
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Publication number: 20050176655Abstract: Macrolide derivatives having enhancing effect for activities of azole antifungal agents, acting at low concentration and within a short time against fungal infection and reducing the frequency of appearance of resistant microorganisms. One such substance is a compound represented by the formula [I]: wherein R1 is Ac, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is H, when R1 Bzl, R2 and R3 are Bzl, and R4 is Me; when R1 is Ac, R2 and R3 are Pr, and R4 is Me; when R1 is Ac, R2 and R3 are Hex, and R4 is Me; when R1 is Ac, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 and R3 are Pr, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is Me; when R1 is H, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 is H, R3 is Bzl, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is H, or when R1 is H, R2 and R3 are Hex, and R4 is Et.Type: ApplicationFiled: October 29, 2002Publication date: August 11, 2005Inventors: Satoshi Omura, Hiroshi Tomoda, Toshiaki Sunazuka, Masayoshi Arai, Tohru Nagamitsu
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Patent number: 6790968Abstract: A microorganism having ability to produce FKI-0076 substance represented by the following formula [I] is cultured in a medium allowing for the accumulation of FKI-0076 substance in the culture liquid. The FKI-0076 substance from can then be isolated the cultured mass. Since the substance has the ability to enhance azole antifungal agents, it provides an action against various fungal infections such as deep-seated mycosis and other fungal infections in low concentration and within a short term. Consequently, the FKI-0076 is useful for reducing the frequency of appearance of resistant microorganisms. Further, usefulness for overcoming resistance is expected.Type: GrantFiled: October 24, 2002Date of Patent: September 14, 2004Assignee: The Kitasato InstituteInventors: Satoshi Omura, Hiroshi Tomoda, Rokuro Masuma, Masayoshi Arai
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Publication number: 20030051396Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.Type: ApplicationFiled: March 20, 2002Publication date: March 20, 2003Applicant: Taiheiyo Cement CorporationInventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
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Patent number: 6509410Abstract: The aqueous coating composition of the present invention can form a high crosslink density owing to the high hydroxyl value, contains a soft urethane structure and alicyclic structure possessed by the water-soluble urethane polyol and the water-dispersible urethane resin, and also contains tough isocyanurate ring structures possessed by the water-dispersible acrylic resin and the hydrophilic polyisocyanate; accordingly, can give a coating film which is high in impact resistance, abrasion resistance, contamination resistance, etc., which has properties equivalent to those possessed by the films produced from organic solvent type coatings, and which has high durability; therefore, is most suitable for coating a golf ball to be hit by a golf club. A golf ball coated with the aqueous coating composition of the present invention is free from cracking or film peeling when hit by a golf club; is low in scratch, abrasion and contamination with grass sap; therefore, can retain gloss and fine appearance.Type: GrantFiled: March 14, 2001Date of Patent: January 21, 2003Assignees: Bridgestone Sports Co., Ltd., Cashew Co., Ltd.Inventors: Takashi Ohira, Hisako Nakahama, Masayoshi Arai, Katsunori Shiyama
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Publication number: 20010034398Abstract: The aqueous coating composition of the present invention can form a high crosslink density owing to the high hydroxyl value, contains a soft urethane structure and alicyclic structure possessed by the water-soluble urethane polyol and the water-dispersible urethane resin, and also contains tough isocyanurate ring structures possessed by the water-dispersible acrylic resin and the hydrophilic polyisocyanate; accordingly, can give a coating film which is high in impact resistance, abrasion resistance, contamination resistance, etc., which has properties equivalent to those possessed by the films produced from organic solvent type coatings, and which has high durability; therefore, is most suitable for coating a golf ball to be hit by a golf club. A golf ball coated with the aqueous coating composition of the present invention is free from cracking or film peeling when hit by a golf club; is low in scratch, abrasion and contamination with grass sap; therefore, can retain gloss and fine appearance.Type: ApplicationFiled: March 14, 2001Publication date: October 25, 2001Inventors: Takashi Ohira, Hisako Nakahama, Masayoshi Arai, Katsunori Shiyama