Patents by Inventor Masayoshi Arai

Masayoshi Arai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11965049
    Abstract: Photosensitive compositions containing nanosized light emitting materials and (meth)acrylic polymer are suitable for use in a variety of optical applications, for example the preparation of quantum material doped photoresist films, especially for optical devices. Optical films can be prepared be by: a) providing the photosensitive composition onto a substrate, and b) polymerizing the photosensitive composition by exposing the photosensitive composition to radiation.
    Type: Grant
    Filed: July 31, 2019
    Date of Patent: April 23, 2024
    Assignee: MERCK PATENT GMBH
    Inventors: Tadashi Kishimoto, Yuko Arai, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 9371301
    Abstract: A compound represented by the general formula (C): (wherein R101 represents a substituted or unsubstituted aromatic heterocyclic group, R102, R103, R104 and R105 may be the same or different, and each represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms, or a haloalkyl group having 1 to 3 carbon atoms, and R106 represents a hydrogen atom, or a saturated or unsaturated hydrocarbon group which is a straight or branched chain having 1 to 12 carbon atoms, but excluded is the case where R101 is a 3-furyl group, R102, R103, R104 and R105 are all methyl groups, and R106 is a methyl group, a 4-methyl-3-pentenyl group or a 4,8-dimethyl-3,7-nonadienyl group); or a pharmaceutically acceptable salt thereof has selective inhibitory activity on hypoxic cell growth in a broad range of the concentration and therefore is useful as an active ingredient of a medicament for cancer prevention or treatment.
    Type: Grant
    Filed: May 6, 2011
    Date of Patent: June 21, 2016
    Assignee: Osaka University
    Inventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Takashi Kawachi
  • Patent number: 8791263
    Abstract: A compound represented by the general formula (M): (wherein R1 represents a substituted or unsubstituted aromatic heterocyclic group, R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms, OR3, N(R3)2, C(?O)OR3 or C(?O)N(R3)2, R3 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an acyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, an oxygen atom or OR5, and R5 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an acyl group having 1 to 3 carbon atoms); or a pharmaceutically acceptable salt thereof is a cortistatin A analog which is useful as an active ingredient of medicaments for cancer prevention or treatment in that the analog can be mass-produced by chemical synthesis due to its simple chemical structure and retains the same biological activities as those of cortistatin A.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: July 29, 2014
    Assignee: Osaka University
    Inventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Satoru Tamura
  • Publication number: 20130210859
    Abstract: A compound represented by the general formula (M): (wherein R1 represents a substituted or unsubstituted aromatic heterocyclic group, R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms, OR3, N(R3)2, C(?O)OR3 or C(?O)N(R3)2, R3 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an acyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, an oxygen atom or OR5, and R5 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an acyl group having 1 to 3 carbon atoms); or a pharmaceutically acceptable salt thereof is a cortistatin A analog which is useful as an active ingredient of medicaments for cancer prevention or treatment in that the analog can be mass-produced by chemical synthesis due to its simple chemical structure and retains the same biological activities as those of cortistatin A.
    Type: Application
    Filed: September 16, 2011
    Publication date: August 15, 2013
    Inventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Satoru Tamura
  • Publication number: 20130065937
    Abstract: A compound represented by the general formula (C): (wherein R101 represents a substituted or unsubstituted aromatic heterocyclic group, R102, R103, R104 and R105 may be the same or different, and each represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms, or a haloalkyl group having 1 to 3 carbon atoms, and R106 represents a hydrogen atom, or a saturated or unsaturated hydrocarbon group which is a straight or branched chain having 1 to 12 carbon atoms, but excluded is the case where R101 is a 3-furyl group, R102, R103, R104 and R105 are all methyl groups, and R106 is a methyl group, a 4-methyl-3-pentenyl group or a 4,8-dimethyl-3,7-nonadienyl group); or a pharmaceutically acceptable salt thereof has selective inhibitory activity on hypoxic cell growth in a broad range of the concentration and therefore is useful as an active ingredient of a medicament for cancer prevention or treatment.
    Type: Application
    Filed: May 6, 2011
    Publication date: March 14, 2013
    Applicant: Osaka University
    Inventors: Motomasa Kobayashi, Naoyuki Kotoku, Masayoshi Arai, Takashi Kawachi
  • Patent number: 8025087
    Abstract: The present invention solves the problem that a connecting portion between a horn and a vibration transmission rod has a tendency to get damaged and the problem associated with the structure in which a chip is attached to an end of the vibration transmission rod, which occur with the known ultrasonic vibration welder. A vibration transmission rod has an end surface serving as a vibration-and-pressure application surface, and a polygonal cross section. The vibration transmission rod is disposed at an end of a horn in such a manner that they vibrate together. The vibration transmission rod and a mass are formed separately. The mass applies pressure to a projection formed at a nodal point of the vibration transmission rod.
    Type: Grant
    Filed: July 23, 2008
    Date of Patent: September 27, 2011
    Assignee: Branson Ultrasonics Corporation
    Inventors: Masayoshi Arai, Shigetomi Morita
  • Patent number: 7931706
    Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: April 26, 2011
    Assignee: Taiheiyo Cement Corporation
    Inventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
  • Publication number: 20100206487
    Abstract: The present invention solves the problem that a connecting portion between a horn and a vibration transmission rod has a tendency to get damaged and the problem associated with the structure in which a chip is attached to an end of the vibration transmission rod, which occur with the known ultrasonic vibration welder. A vibration transmission rod has an end surface serving as a vibration-and-pressure application surface, and a polygonal cross section. The vibration transmission rod is disposed at an end of a horn in such a manner that they vibrate together. The vibration transmission rod and a mass are formed separately. The mass applies pressure to a projection formed at a nodal point of the vibration transmission rod.
    Type: Application
    Filed: July 23, 2008
    Publication date: August 19, 2010
    Applicant: Branson Ultrasonics Corporation
    Inventors: Masayoshi Arai, Shigetomi Morita
  • Patent number: 7701555
    Abstract: An exposure apparatus is equipped with a laser unit that emits a laser beam, a memory that stores a first information which shows a first relation indicating a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from the laser unit, and a main controller that controls the spectral width of the laser beam via a laser controller, based on the first information and on information related to a reticle that is to be used. Main controller performs spectral width control of the laser beam so as to suppress linewidth error, based on the first information and on the information related to the reticle that is to be used.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: April 20, 2010
    Assignee: Nikon Corporation
    Inventor: Masayoshi Arai
  • Publication number: 20090201479
    Abstract: An exposure apparatus includes a laser light source that emits a laser beam as an exposure beam by pulse oscillation; a detection system that detects a rotation angle of an external shape of the laser beam emitted by the pulse oscillation from a corresponding laser light source; and a control device that controls a rotation angle of the external shape of the laser beam or a rotation angle of a linearly polarized light component of a corresponding laser beam or both of them, based on the rotation angle detected by the detection system.
    Type: Application
    Filed: January 30, 2006
    Publication date: August 13, 2009
    Inventor: Masayoshi Arai
  • Patent number: 7521428
    Abstract: Macrolide derivatives having enhancing effect for activities of azole antifungal agents, acting at low concentration and within a short time against fungal infection and reducing the frequency of appearance of resistant microorganisms. One such substance is a compound represented by the formula [I]: wherein R1 is Ac, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is H, when R1 Bzl, R2 and R3 are Bzl, and R4 is Me; when R1 is Ac, R2 and R3 are Pr, and R4 is Me; when R1 is Ac, R2 and R3 are Hex, and R4 is Me; when R1 is Ac, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 and R3 are Pr, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is Me; when R1 is H, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 is H, R3 is Bzl, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is H, or when R1 is H, R2 and R3 are Hex, and R4 is Et.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: April 21, 2009
    Assignee: The Kitasato Institute
    Inventors: Satoshi Omura, Hiroshi Tomoda, Toshiaki Sunazuka, Masayoshi Arai, Tohru Nagamitsu
  • Publication number: 20080010899
    Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.
    Type: Application
    Filed: September 20, 2007
    Publication date: January 17, 2008
    Inventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
  • Publication number: 20070273852
    Abstract: An exposure apparatus is equipped with a laser unit that emits a laser beam, a memory that stores a first information which shows a first relation indicating a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from the laser unit, and a main controller that controls the spectral width of the laser beam via a laser controller, based on the first information and on information related to a reticle that is to be used. Main controller performs spectral width control of the laser beam so as to suppress linewidth error, based on the first information and on the information related to the reticle that is to be used.
    Type: Application
    Filed: June 30, 2006
    Publication date: November 29, 2007
    Applicant: NIKON CORPORATION
    Inventor: Masayoshi Arai
  • Patent number: 7285141
    Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.
    Type: Grant
    Filed: March 20, 2002
    Date of Patent: October 23, 2007
    Assignee: Taiheiyo Cement Corporation
    Inventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
  • Publication number: 20060252930
    Abstract: A microorganism belonging to Beauveria sp. and having ability to produce FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C (Beauveria sp. FKI-1366 FERM BP-08459) is cultured in a medium, accumulating FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C in the culture liquid and isolating FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C from the cultured mass. Since the thus obtained FKI-1366 substance A and/or FKI-1366 substance B and/or FKI-1366 substance C or composition thereof have activity to enhance azole antifungal agent, the substance has an action against various fungal infections such as deep-seated mycosis and other fungal infections in the low concentration within short term. Consequently, the substance is useful for reducing frequency of appearance of resistant microorganisms and overcoming resistance, and is expected as a medicament.
    Type: Application
    Filed: August 29, 2003
    Publication date: November 9, 2006
    Inventors: Satoshi Omura, Hiroshi Tomoda, Rokura Masuma, Masayoshi Arai
  • Publication number: 20050176655
    Abstract: Macrolide derivatives having enhancing effect for activities of azole antifungal agents, acting at low concentration and within a short time against fungal infection and reducing the frequency of appearance of resistant microorganisms. One such substance is a compound represented by the formula [I]: wherein R1 is Ac, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is Me; when R1 is H, R2 and R3 are Ac, and R4 is H, when R1 Bzl, R2 and R3 are Bzl, and R4 is Me; when R1 is Ac, R2 and R3 are Pr, and R4 is Me; when R1 is Ac, R2 and R3 are Hex, and R4 is Me; when R1 is Ac, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 and R3 are Pr, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is Me; when R1 is H, R2 and R3 are Bzl, and R4 is Me; when R1 is H, R2 is H, R3 is Bzl, and R4 is Me; when R1 is H, R2 and R3 are Hex, and R4 is H, or when R1 is H, R2 and R3 are Hex, and R4 is Et.
    Type: Application
    Filed: October 29, 2002
    Publication date: August 11, 2005
    Inventors: Satoshi Omura, Hiroshi Tomoda, Toshiaki Sunazuka, Masayoshi Arai, Tohru Nagamitsu
  • Patent number: 6790968
    Abstract: A microorganism having ability to produce FKI-0076 substance represented by the following formula [I] is cultured in a medium allowing for the accumulation of FKI-0076 substance in the culture liquid. The FKI-0076 substance from can then be isolated the cultured mass. Since the substance has the ability to enhance azole antifungal agents, it provides an action against various fungal infections such as deep-seated mycosis and other fungal infections in low concentration and within a short term. Consequently, the FKI-0076 is useful for reducing the frequency of appearance of resistant microorganisms. Further, usefulness for overcoming resistance is expected.
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: September 14, 2004
    Assignee: The Kitasato Institute
    Inventors: Satoshi Omura, Hiroshi Tomoda, Rokuro Masuma, Masayoshi Arai
  • Publication number: 20030051396
    Abstract: A cement kiln from which its brick lining has been removed, or a rotary dryer for cement production is used as a fermentation treatment apparatus 202 for converting waste matter into compost. The waste matter to be subjected to the fermentation treatment includes city waste contained in garbage bags, and its fermentation treatment is carried out by introducing the waste matter directly into the aforesaid cement kiln or the aforesaid rotary dryer for cement production without tearing the aforesaid garbage bags.
    Type: Application
    Filed: March 20, 2002
    Publication date: March 20, 2003
    Applicant: Taiheiyo Cement Corporation
    Inventors: Masayoshi Arai, Tatsuro Watanabe, Akira Saito, Sachio Nakazaki, Toshihisa Maruta, Hiroyuki Takano
  • Patent number: 6509410
    Abstract: The aqueous coating composition of the present invention can form a high crosslink density owing to the high hydroxyl value, contains a soft urethane structure and alicyclic structure possessed by the water-soluble urethane polyol and the water-dispersible urethane resin, and also contains tough isocyanurate ring structures possessed by the water-dispersible acrylic resin and the hydrophilic polyisocyanate; accordingly, can give a coating film which is high in impact resistance, abrasion resistance, contamination resistance, etc., which has properties equivalent to those possessed by the films produced from organic solvent type coatings, and which has high durability; therefore, is most suitable for coating a golf ball to be hit by a golf club. A golf ball coated with the aqueous coating composition of the present invention is free from cracking or film peeling when hit by a golf club; is low in scratch, abrasion and contamination with grass sap; therefore, can retain gloss and fine appearance.
    Type: Grant
    Filed: March 14, 2001
    Date of Patent: January 21, 2003
    Assignees: Bridgestone Sports Co., Ltd., Cashew Co., Ltd.
    Inventors: Takashi Ohira, Hisako Nakahama, Masayoshi Arai, Katsunori Shiyama
  • Publication number: 20010034398
    Abstract: The aqueous coating composition of the present invention can form a high crosslink density owing to the high hydroxyl value, contains a soft urethane structure and alicyclic structure possessed by the water-soluble urethane polyol and the water-dispersible urethane resin, and also contains tough isocyanurate ring structures possessed by the water-dispersible acrylic resin and the hydrophilic polyisocyanate; accordingly, can give a coating film which is high in impact resistance, abrasion resistance, contamination resistance, etc., which has properties equivalent to those possessed by the films produced from organic solvent type coatings, and which has high durability; therefore, is most suitable for coating a golf ball to be hit by a golf club. A golf ball coated with the aqueous coating composition of the present invention is free from cracking or film peeling when hit by a golf club; is low in scratch, abrasion and contamination with grass sap; therefore, can retain gloss and fine appearance.
    Type: Application
    Filed: March 14, 2001
    Publication date: October 25, 2001
    Inventors: Takashi Ohira, Hisako Nakahama, Masayoshi Arai, Katsunori Shiyama