Patents by Inventor Masayoshi ARIHISA

Masayoshi ARIHISA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation
    Patent number: 9263649
    Abstract: Disclosed is a layered product for fine pattern formation and a method of manufacturing the layered product for fine pattern formation, capable of easily forming a fine pattern having a thin or no remaining film in order to form a fine pattern having a high aspect ratio on a processing object. The layered product for fine pattern formation (1) of the present invention used to form a fine pattern (220) in a processing object (200) using a first mask layer (103) includes: a mold (101) having a concavo-convex structure (101a) on a surface; and a second mask layer (102) provided on the concavo-convex structure (101a), wherein in the second mask layer (102), a distance (lcc) and a height (h) of the concavo-convex structure (101a) satisfy Formula (1) 0<lcc<1.0 h, and a distance (lcv) and the height (h) satisfy Formula (2) 0?lcv?0.05 h.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: February 16, 2016
    Assignee: ASAHI KASEI E-MATERIALS CORPORATION
    Inventors: Jun Koike, Fujito Yamaguchi, Masatoshi Maeda, Shinji Arihisa, Masayoshi Arihisa
  • LAYERED PRODUCT FOR FINE PATTERN FORMATION AND METHOD OF MANUFACTURING LAYERED PRODUCT FOR FINE PATTERN FORMATION
    Publication number: 20140151733
    Abstract: Disclosed is a layered product for fine pattern formation and a method of manufacturing the layered product for fine pattern formation, capable of easily forming a fine pattern having a thin or no remaining film in order to form a fine pattern having a high aspect ratio on a processing object. The layered product for fine pattern formation (1) of the present invention used to form a fine pattern (220) in a processing object (200) using a first mask layer (103) includes: a mold (101) having a concavo-convex structure (101a) on a surface; and a second mask layer (102) provided on the concavo-convex structure (101a), wherein in the second mask layer (102), a distance (lcc) and a height (h) of the concavo-convex structure (101a) satisfy Formula (1) 0<lcc<1.0 h, and a distance (lcv) and the height (h) satisfy Formula (2) 0?lcv?0.05 h.
    Type: Application
    Filed: June 18, 2012
    Publication date: June 5, 2014
    Applicant: ASAHI KASEI KABUSHIKI KAISHA
    Inventors: Masayoshi ARIHISA, Masatoshi MAEDA, Fujito YAMAGUCHI, Jun KOIKE, Shinji ARIHISA