Abstract: The imprint apparatus according to the present invention causes a supplying unit to supply an imprint material onto at least a first region in a predetermined shot region on a substrate, causes an energy supplying unit to supply energy to the imprint material on the first region so as to increase a degree of polymerization of the imprint material on the first region, causes a moving unit to move at least one of a mold and the substrate such that a pattern region formed on the mold and the imprint material on the substrate are brought into contact with each other, and causes the energy supplying unit to supply the energy to the imprint material on the predetermined shot region such that the imprint material on the predetermined shot region is solidified after the pattern region and the imprint material on the substrate are brought into contact with each other.

Abstract: An imprint apparatus including an irradiation unit configured to irradiate a peripheral region of a pattern region of a mold with light while the mold is in contact with an imprint material on a substrate so as to make a polymerization degree of the imprint material between the peripheral region and the substrate fall within a range higher than a polymerization degree in an initial state when the imprint material is supplied onto the substrate and lower than a polymerization degree in a final state when the imprint material is cured, and a control unit configured to control, for each shot region on the substrate, a value of a second parameter for controlling irradiation with the light from the irradiation unit based on a value of a first parameter for controlling a contact step.

Abstract: A data generation method generates data for controlling an arrangement step in an imprint process that includes the arrangement step of arranging an imprint material on a substrate, a contact step of bringing the imprint material and a pattern portion of a mold into contact with each other, and a curing step of curing the imprint material. The method includes performing a first step of determining a plurality of first positions, based on information related to a boundary of the pattern portion in the substrate, as positions where the imprint material is to be arranged, and performing a second step of determining, after the first step, a plurality of second positions different from the plurality of first positions, as positions where the imprint material is to be further arranged.

Abstract: The present invention provides an imprint apparatus including an irradiation unit configured to irradiate a peripheral region of a pattern region of a mold with light while the mold is in contact with an imprint material on a substrate so as to make a polymerization degree of the imprint material between the peripheral region and the substrate fall within a range higher than a polymerization degree in an initial state when the imprint material is supplied onto the substrate and lower than a polymerization degree in a final state when the imprint material is cured, and a control unit configured to control, for each shot region on the substrate, a value of a second parameter for controlling irradiation with the light from the irradiation unit based on a value of a first parameter for controlling a contact step.

Abstract: The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, including a processing unit configured to perform processing of locally irradiating the imprint material on the substrate with light in accordance with an irradiation condition to locally increase a viscosity of the imprint material, and a control unit configured to provide a user interface in which a first image including information included in the irradiation condition and indicating an irradiation region to be irradiated with light in a region on the substrate and a second image indicating at least one of a supply position to which the imprint material is to be supplied on the substrate and a shape of the pattern region of the mold are superimposed with each other and displayed.

Abstract: The present invention provides an imprint system including a processing unit configured to perform an imprint process, the processing unit including a dispenser configured to supply a droplet of an imprint material onto a substrate, a library configured to manage a plurality of different maps each indicating at least one of a supply position and a supply amount for a droplet to be supplied on the substrate from the dispenser, and a control unit configured to select one map to be used in the imprint process from the plurality of maps managed in the library based on information about a change of a result of the imprint process caused by a temporal change of at least one of a mold and the dispenser.

Abstract: A data generation method generates data for controlling an arrangement step in an imprint process that includes the arrangement step of arranging an imprint material on a substrate, a contact step of bringing the imprint material and a pattern portion of a mold into contact with each other, and a curing step of curing the imprint material. The method includes performing a first step of determining a plurality of first positions, based on information related to a boundary of the pattern portion in the substrate, as positions where the imprint material is to be arranged, and performing a second step of determining, after the first step, a plurality of second positions different from the plurality of first positions, as positions where the imprint material is to be further arranged.

Abstract: The present invention provides an imprint apparatus including a supply device including discharge ports which discharge a imprint material, and configured to supply the imprint material onto a substrate via the discharge ports, and a controller configured to cause, if there is a defective discharge port of the discharge ports, the supply device to discharge the imprint material from another discharge port, different from the defective discharge port, of the discharge ports, wherein a mold for the molding includes a line pattern, and the controller is configured to control the supply device such that an interval between supply positions of the imprint material do not become larger in a direction orthogonal to a direction along the line pattern than that before change from the defective discharge port to the other discharge port.

Abstract: The present invention provides an imprint system which performs an imprint process of forming a pattern of an imprint material on the substrate by using a mold, the system comprising a plurality of processing units each including a dispenser which supplies the imprint material onto the substrate and configured to perform the imprint process, a library configured to manage a plurality of pieces of layout information, and a control unit configured to, when the mold used by a first processing unit is used by a second processing unit, control the second processing unit, based on a difference in condition for the imprint process between the first and second processing units, by using layout information having a difference corresponding to the difference in condition for the imprint process with respect to layout information used by the first processing unit.

Abstract: The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus including a tilt unit configured to tilt the mold and the substrate relatively, a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate, and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state.

Abstract: Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to move along a horizontal plane while carrying the substrate, and an adjusting unit configured to adjust an inclination of the mold with respect to the substrate. The adjusting unit adjusts the inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation. The information related to the state of the imprint material on the substrate is variable with the movement of the moving unit.

Abstract: The present invention provides an imprint apparatus including a supply device including discharge ports which discharge a imprint material, and configured to supply the imprint material onto a substrate via the discharge ports, and a controller configured to cause, if there is a defective discharge port of the discharge ports, the supply device to discharge the imprint material from another discharge port, different from the defective discharge port, of the discharge ports, wherein a mold for the molding includes a line pattern, and the controller is configured to control the supply device such that an interval between supply positions of the imprint material do not become larger in a direction orthogonal to a direction along the line pattern than that before change from the defective discharge port to the other discharge port.

Abstract: Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to move along a horizontal plane while carrying the substrate, and an adjusting unit configured to adjust an inclination of the mold with respect to the substrate. The adjusting unit adjusts the inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation. The information related to the state of the imprint material on the substrate is variable with the movement of the moving unit.

Abstract: Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to be movable along a horizontal plane while carrying the substrate on which the imprint material is provided, and an applying unit configured to apply the imprint material onto the substrate based on information related to a state of the imprint material and information related to an order of pattern formation, the information related to the state of the imprint material varying with the movement of the moving unit.

Abstract: The present invention provides an imprint system which performs an imprint process of forming a pattern of an imprint material on the substrate by using a mold, the system comprising a plurality of processing units each including a dispenser which supplies the imprint material onto the substrate and configured to perform the imprint process, a library configured to manage a plurality of pieces of layout information, and a control unit configured to, when the mold used by a first processing unit is used by a second processing unit, control the second processing unit, based on a difference in condition for the imprint process between the first and second processing units, by using layout information having a difference corresponding to the difference in condition for the imprint process with respect to layout information used by the first processing unit.

Abstract: The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus including a tilt unit configured to tilt the mold and the substrate relatively, a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate, and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state.

Abstract: The present invention provides an imprint system including a processing unit configured to perform an imprint process, the processing unit including a dispenser configured to supply a droplet of an imprint material onto a substrate, a library configured to manage a plurality of different maps each indicating at least one of a supply position and a supply amount for a droplet to be supplied on the substrate from the dispenser, and a control unit configured to select one map to be used in the imprint process from the plurality of maps managed in the library based on information about a change of a result of the imprint process caused by a temporal change of at least one of a mold and the dispenser.

Abstract: An imprint apparatus molds a resin on a substrate with a mold and cures it by irradiation with a light to form a pattern on the substrate. This imprint apparatus includes an light irradiation unit configured to irradiate the light, and a mold holding unit configured to hold the mold, and at which an opening is formed to allow passage of the light irradiated from the light irradiation unit toward the substrate via the mold. Here, at least a portion of the surface of the mold holding unit which a reflected light that is reflected by at least either the substrate or the mold is can be incident has a reflectance that is lower than the reflectance of the surface of the mold relative to the light that is irradiated from the light irradiation unit.