Abstract: The present disclosure provides a method for stably supplying a highly pure n-butylamine gas having a constant composition. The present disclosure is a composition supply method including: a filling step of filling a container with a composition containing n-butylamine in an amount of 99.5% by volume or more and isobutylamine in an amount of 0.001% by volume or more and 0.5% by volume or less; a warming step of warming the container filled with the composition to 50° C. or higher; and a gas supply step of supplying a gas containing n-butylamine and isobutylamine from the warmed container to a predetermined device.

Abstract: The present disclosure provides a method for stably supplying a highly pure n-butylamine gas having a constant composition. The present disclosure is a composition supply method including: a filling step of filling a container with a composition containing n-butylamine in an amount of 99.5% by volume or more and isobutylamine in an amount of 0.001% by volume or more and 0.5% by volume or less; a warming step of warming the container filled with the composition to 50° C. or higher; and a gas supply step of supplying a gas containing n-butylamine and isobutylamine from the warmed container to a predetermined device.

Abstract: To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. A liquid chemical is used, which includes an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol.