Patents by Inventor Masayoshi Imai

Masayoshi Imai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus
    Patent number: 7267130
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Grant
    Filed: May 3, 2004
    Date of Patent: September 11, 2007
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai
  • Substrate processing apparatus
    Patent number: 6951221
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: October 4, 2005
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai
  • Substrate processing apparatus
    Publication number: 20040206379
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Application
    Filed: May 10, 2004
    Publication date: October 21, 2004
    Applicant: DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai
  • Substrate processing apparatus
    Publication number: 20040206452
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Application
    Filed: May 10, 2004
    Publication date: October 21, 2004
    Applicant: DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai
  • Substrate processing apparatus
    Publication number: 20040206378
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Application
    Filed: May 5, 2004
    Publication date: October 21, 2004
    Applicant: DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai
  • Substrate processing apparatus
    Publication number: 20040200513
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Application
    Filed: May 3, 2004
    Publication date: October 14, 2004
    Applicant: DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai
  • Substrate processing apparatus
    Publication number: 20020035762
    Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
    Type: Application
    Filed: September 21, 2001
    Publication date: March 28, 2002
    Inventors: Seiichiro Okuda, Hiroaki Sugimoto, Takuya Kuroda, Masanobu Sato, Sadao Hirae, Shuichi Yasuda, Kenya Morinishi, Masayoshi Imai