Patents by Inventor Masayoshi Takeuchi
Masayoshi Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080111672Abstract: An entrapment detecting apparatus for detecting an entrapment of an object between a moving member and its paired member includes a pressure sensor serving for detecting the entrapment, and a protector provided at a portion of one of the moving member and the paired member for being opposed to the other of the moving member and the paired member, the protector being formed of an elastic material, the protector being provided therein with an insertion hole in which the pressure sensor is held by elasticity of the elastic member, the insertion hole having a diameter equal to or smaller than that of the pressure sensor, the holding of the pressure sensor in the insertion hole being established in such a manner that the insertion hole is expanded at room temperature to receive the pressure sensor and is restored upon completion of the reception of the pressure sensor.Type: ApplicationFiled: November 6, 2007Publication date: May 15, 2008Applicant: AISIN SEIKI KABUSHIKI KAISHAInventors: Masayoshi Takeuchi, Takehiko Sugiura
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Patent number: 7330007Abstract: An object detecting apparatus includes a piezoelectric sensor provided at an edge portion of an opening/closing body for emitting an output voltage which changes corresponding to an external force applied to the edge portion and a detection circuit for receiving the output voltage of the piezoelectric sensor and for judging an entrapment. The detection circuit includes a voltage-measuring circuit for measuring the output voltage of the piezoelectric sensor, a time-measuring circuit for measuring time, and a judging circuit configured to judge the entrapment. The judging circuit judges the entrapment corresponding to the output voltage of the piezoelectric sensor. The judging circuit calculates a changing value of the output voltage after the output voltage of the piezoelectric sensor reaches a predetermined first level. The judging circuit judges that the entrapment has not occurred in a situation where the changing value of the output voltage is larger than a predetermined value.Type: GrantFiled: July 25, 2006Date of Patent: February 12, 2008Assignee: Aisin Seiki Kabushiki KaishaInventors: Takehiko Sugiura, Masayoshi Takeuchi
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Publication number: 20070266635Abstract: A vehicle door opening/closing control apparatus includes an actuator for executing a door opening action and a door closing action by applying a driving force to a vehicle door, non-contact type object detecting means for detecting an object at an apertural area, contact type object detecting means for detecting a contact of the object to the vehicle door and control means for: controlling the actuator to execute the door closing action for the vehicle door with changing a speed of the door closing action for the vehicle, on the basis of a detection result from the non-contact type object detecting means, during the door closing action; and controlling the actuator to stop the door closing action after a stop operation or a reverse operation for the actuator is executed, on the basis of a detection result from the contact type object detecting means, during the door closing action.Type: ApplicationFiled: May 11, 2007Publication date: November 22, 2007Applicant: AISIN SEIKI KABUSHIKI KAISHAInventors: Takehiko Sugiura, Masayoshi Takeuchi
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Publication number: 20070236896Abstract: A wiring board in which silver is deposited near a via-conductor includes a ceramic substrate having a via-hole, a via-conductor disposed in the via-hole, and a metal thin-film pattern which is disposed on the ceramic substrate such that the metal thin-film pattern is connected to the via-conductor. The via-conductor contains silver or a material principally containing silver. A silver deposit that is a piece of the via-conductor is disposed on a surface portion of the ceramic substrate that is located near the via-hole. A catalyst layer containing a metal material is disposed over an exposed face of the via-conductor and the surface portion of the ceramic substrate. A metal layer is disposed on the catalyst layer. The metal thin-film pattern is disposed over the metal layer and the ceramic substrate.Type: ApplicationFiled: March 5, 2007Publication date: October 11, 2007Inventors: Masayoshi Takeuchi, Shinji Murata
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Publication number: 20070049535Abstract: The present invention provides a novel agent for the prophylaxis or treatment of diabetic complications. Specifically, the present invention provides an agent for the prophylaxis or treatment of diabetic complications, which contains, as an active ingredient, an oligopeptide containing at least two amino acid residues having an amino group or a guadinino group in the side chain, and which has AGE2 production inhibitory action and AGE2 blood concentration reduction promoting action.Type: ApplicationFiled: September 26, 2006Publication date: March 1, 2007Inventors: Yoshiro Kitahara, Masayoshi Takeuchi
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Publication number: 20070022818Abstract: An object detecting apparatus includes a piezoelectric sensor provided at an edge portion of an opening/closing body for emitting an output voltage which changes corresponding to an external force applied to the edge portion and a detection circuit for receiving the output voltage of the piezoelectric sensor and for judging an entrapment. The detection circuit includes a voltage-measuring circuit for measuring the output voltage of the piezoelectric sensor, a time-measuring circuit for measuring time, and a judging circuit configured to judge the entrapment. The judging circuit judges the entrapment corresponding to the output voltage of the piezoelectric sensor. The judging circuit calculates a changing value of the output voltage after the output voltage of the piezoelectric sensor reaches a predetermined first level. The judging circuit judges that the entrapment has not occurred in a situation where the changing value of the output voltage is larger than a predetermined value.Type: ApplicationFiled: July 25, 2006Publication date: February 1, 2007Inventors: Takehiko Sugiura, Masayoshi Takeuchi
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Publication number: 20070022819Abstract: An object detecting apparatus includes: a piezoelectric sensor including a first electrode, a piezoelectric material surrounding the first electrode, and a second electrode surrounding the piezoelectric material and provided at an outer edge portion at a side of an opening of a door for a vehicle having a door panel; a signal processing circuit measuring a potential difference between the first electrode and the second electrode; and a connecting line connecting the first electrode and the second electrode to the signal processing circuit.Type: ApplicationFiled: July 25, 2006Publication date: February 1, 2007Inventors: Masayoshi Takeuchi, Takehiko Sugiura, Nobuhiro Yamauchi
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Publication number: 20060231953Abstract: There is provided a structure for mounting a semiconductor part having improved productivity, in which a bump is detached from a land portion and a method of manufacturing a mounting substrate used therein. The structure for mounting the semiconductor part includes a mounting substrate 1 having an insulating substrate 2 on which a wiring pattern 3 and a land portion 4 are provided, a semiconductor part 5 mounted on the mounting substrate 1 using a bump 7 and the land portion 4, and an underfill 8 inserted between the semiconductor part 5 and the insulating substrate 2. An undercut portion 4c having an inverse tapered shape from the insulating substrate 2 to an upper surface of the land portion 4 is provided in an edge 4a of the land portion 4 in which the bump 7 is located, and the bump is inserted into the undercut portion. Accordingly, since the couple between the bump 7 and the land portion 4 becomes stronger, the bump is not detached from the land portion 4 when the underfill 8 expands or contracts.Type: ApplicationFiled: March 20, 2006Publication date: October 19, 2006Inventors: Shinji Murata, Masayoshi Takeuchi
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Publication number: 20060113943Abstract: A contact-detecting apparatus provided at an open-and close device for detecting a state of contact with trapping object to be detected includes a piezoelectric sensor member for detecting a state of contact of the open-and close device with the trapping object to be detected, a detection circuit for receiving an output from the piezoelectric sensor, and a protector provided at the open-and close device and including a supporting member for supporting the piezoelectric sensor member and a base member integrally formed with the supporting member for supporting and protecting the detection circuit. Rigidity of the supporting member is lower than rigidity of the base member.Type: ApplicationFiled: November 16, 2005Publication date: June 1, 2006Applicant: AISIN SEIKI KABUSHIKI KAISHAInventors: Nobuhiro Yamauchi, Masayoshi Takeuchi
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Publication number: 20060087418Abstract: A pressure sensitive sensor includes a base member, a supporting member connected to one end of the base member and deformable upon receipt of a pressure, and a piezoelectric sensor provided in the supporting member.Type: ApplicationFiled: October 25, 2005Publication date: April 27, 2006Applicant: AISIN SEIKI KABUSHIKI KAISHAInventor: Masayoshi Takeuchi
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Patent number: 6503775Abstract: A production method of a micromachine includes a polysilicon film forming step which overlays grooves, defined in an upper surface of a sacrificial layer on a silicon substrate, with polysilicon layer so as to be flat. The production method includes a first processing step for filling the grooves by adding a lower laid portion of the polysilicon layer onto a sacrificial layer. The lower laid portion has a thickness greater than 0.625 times relative to a width of the grooves. The production method of the micromachine further includes a second processing step for making the polysilicon layer to have a predetermined thickness by adding a upper laid portion of the polysilicon layer on the lower laid portion to form the polysilicon layer, the upper laid portion formed by depositing polysilicon which has the same impurity concentration as the lower laid portion does.Type: GrantFiled: September 21, 2001Date of Patent: January 7, 2003Assignee: Aisin Seiki Kabushiki KaishaInventors: Satoru Nomoto, Masayoshi Takeuchi, Shuji Noda
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Patent number: 6501497Abstract: The present invention provides a thermal head having a long lifetime and a high printing quality by making the size of steps of a protective layer formed on a heating portion of a heating resistor small and a method for manufacturing the thermal heads. In the thermal head, respective lower-layer electrodes having a film thickness of approximately 2 &mgr;m are formed on outskirts portion of a bulging portion of a heat insulation layer excluding a heating portion of a heating resistor and portions in the vicinity of the heating portion. Then, respective upper-layer electrodes having a film thickness which falls in a range of 0.1 to 0.3 &mgr;m are continuously formed from portions at positions in the vicinity of the heating portion excluding the heating portion to upper surfaces of the lower-layer electrodes.Type: GrantFiled: August 27, 2001Date of Patent: December 31, 2002Assignee: Alps Electric Co., Ltd.Inventors: Takashi Shirakawa, Masayoshi Takeuchi, Satoshi Kubo, Daiki Sugiyama, Noboru Tsushima
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Publication number: 20020037601Abstract: A production method of a micromachine includes a polysilicon film forming step which overlays grooves, defined in an upper surface of a sacrificial layer on a silicon substrate, with polysilicon layer so as to be flat. The production method includes a first processing step for filling the grooves by adding a lower laid portion of the polysilicon layer onto a sacrificial layer. The lower laid portion has a thickness greater than 0.625 times relative to a width of the grooves. The production method of the micromachine further includes a second processing step for making the polysilicon layer to have a predetermined thickness by adding a upper laid portion of the polysilicon layer on the lower laid portion to form the polysilicon layer, the upper laid portion formed by depositing polysilicon which has the same impurity concentration as the lower laid portion does.Type: ApplicationFiled: September 21, 2001Publication date: March 28, 2002Applicant: AISIN SEIKI KABUSHIKI KAISHAInventors: Satoru Nomoto, Masayoshi Takeuchi, Shuji Noda
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Publication number: 20020024582Abstract: The present invention provides a thermal head having a long lifetime and a high printing quality by making the size of steps of a protective layer formed on a heating portion of a heating resistor small and a method for manufacturing the thermal heads. In the thermal head, respective lower-layer electrodes having a film thickness of approximately 2 &mgr;m are formed on outskirts portion of a bulging portion of a heat insulation layer excluding a heating portion of a heating resistor and portions in the vicinity of the heating portion. Then, respective upper-layer electrodes having a film thickness which falls in a range of 0.1 to 0.3 &mgr;m are continuously formed from portions at positions in the vicinity of the heating portion excluding the heating portion to upper surfaces of the lower-layer electrodes.Type: ApplicationFiled: August 27, 2001Publication date: February 28, 2002Applicant: Alps Electric Co., Ltd.Inventors: Takashi Shirakawa, Masayoshi Takeuchi, Satoshi Kubo, Daiki Sugiyama, Noboru Tsushima
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Patent number: 4714086Abstract: A method for washing and drying a substrate and an apparatus therefor are disclosed which are capable of effectively rapidly carrying out the washing and drying of a semiconductor substrate in good yields without damaging and contaminating the substrate. The method comprises the steps of immersing a carrier carrying at least one substrate thereon into wash liquid; drawing up the carrier from the wash liquid while oscillating the substrate; and feeding drying gas to the substrate during the drawing-up of the carrier to remove the wash liquid from the surface of the substrate. The apparatus of the invention is constructed to allow the method to be effectively practiced.Type: GrantFiled: September 25, 1986Date of Patent: December 22, 1987Assignees: Sharp Corporation, Dainichi Shoji Co., Ltd.Inventors: Yoshifumi Kishida, Masayoshi Takeuchi
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Patent number: 4643774Abstract: A method for washing and drying a substrate and an apparatus therefor are disclosed which are capable of effectively rapidly carrying out the washing and drying of a semiconductor substrate in good yields without damaging and contaminating the substrate. The method comprises the steps of immersing a carrier carrying at least one substrate thereon into wash liquid; drawing up the carrier from the wash liquid while oscillating the substrate; and feeding drying gas to the substrate during the drawing-up of the carrier to remove the wash liquid from the surface of the substrate. The apparatus of the invention is constructed to allow the method to be effectively practiced.Type: GrantFiled: April 17, 1985Date of Patent: February 17, 1987Assignees: Sharp Corporation, Dainichi Shoji Co., Inc.Inventors: Yoshifumi Kishida, Masayoshi Takeuchi
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Patent number: D549848Type: GrantFiled: February 25, 2005Date of Patent: August 28, 2007Assignee: Aisin Seiki Kabushiki KaishaInventors: Masayoshi Takeuchi, Yoshichika Ito
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Patent number: D549849Type: GrantFiled: September 2, 2005Date of Patent: August 28, 2007Assignee: Aisin Seiki Kabushiki KaishaInventors: Hironori Koeda, Masayoshi Takeuchi, Masaru Hoshina