Patents by Inventor Masayoshi TOKUDA

Masayoshi TOKUDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240218244
    Abstract: A cured film of a curable composition containing quantum dots and breakdown and a method enabling the production of the cured film. The cured film contains quantum dots (A) and a photopolymerizable compound (B), in which the cured film has a Martens hardness of more than 0.10 GPa, and a method for producing a cured film of a curable composition containing quantum dots (A) and a photopolymerizable compound (B), the method including an exposure step of irradiating a film of the curable composition with light and a thermal curing step of thermally curing the film of the curable composition, in which, when a light exposure in the exposure step is indicated by X (mJ/cm2), a thermal curing temperature in the thermal curing step is indicated by Y (° C.), and a thermal curing time is indicated by Z (hr), a formula (1): X×Y×Z2?6500 is satisfied.
    Type: Application
    Filed: February 21, 2022
    Publication date: July 4, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU, Koji NISHIOKA
  • Publication number: 20240166791
    Abstract: A cured film of a curable composition containing a light scattering agent and a method enabling the production of the cured film. A cured film containing a light scattering agent (A) and a photopolymerizable compound (B), in which the cured film has a Martens hardness of 0.10 GPa or more, and a method for producing the curable composition containing a light scattering agent (A) and a photopolymerizable compound (B), the method including an exposure step of irradiating a film of the curable composition with light and a thermal curing step of thermally curing the film of the curable composition, in which, when a light exposure in the exposure step is indicated by X (mJ/cm2), a thermal curing temperature in the thermal curing step is indicated by Y (° C.), and a thermal curing time is indicated by Z (hr), a formula (1): X×Y×Z2?3000 is satisfied.
    Type: Application
    Filed: February 21, 2022
    Publication date: May 23, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU, Koji NISHIOKA
  • Publication number: 20230350108
    Abstract: There are provided a layered body and a display device including the same, the layered body including a substrate layer and a resin layer disposed on at least one surface of the substrate layer, in which the resin layer contains a light scattering agent (A), and, when the contact angle of the substrate layer with respect to diiodomethane is indicated by ?s (°) and the contact angle of the resin layer with respect to diiodomethane is indicated by ?r (°), the following formula: |?s - ?r| ? 21 is satisfied.
    Type: Application
    Filed: August 12, 2021
    Publication date: November 2, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • Publication number: 20230340289
    Abstract: The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.
    Type: Application
    Filed: June 27, 2023
    Publication date: October 26, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomohiro FUKUURA, Yoshihiro HARADA, Yoshifumi KOMATSU, Masayoshi TOKUDA
  • Publication number: 20230257571
    Abstract: There is provided a resin composition containing a resin (A), a light scattering agent (B), a solvent (C), and a leveling agent (H), in which the content ratio of the solvent (C) is 40% by mass or more and less than 74% by mass based on the total amount of the resin composition, and the content ratio of the leveling agent (H) is 0.01% by mass or more and 1% by mass or less based on the total amount of the resin composition.
    Type: Application
    Filed: August 12, 2021
    Publication date: August 17, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • Publication number: 20230213690
    Abstract: There are provided a layered body and a display device including the same, the layered body including a substrate layer and a resin layer disposed on at least one surface of the substrate layer, in which the resin layer contains a light scattering agent (A), and, when the surface tension of the substrate layer is indicated by ?s (mN/m), and the surface tension of the resin layer is indicated by ?r (mN/m), the following formula: |?s??r|?11.0 is satisfied.
    Type: Application
    Filed: August 12, 2021
    Publication date: July 6, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • Publication number: 20230095579
    Abstract: A curable resin composition containing quantum dots (A), a resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), an antioxidant (E), and a solvent (F), wherein a water content based on a total mass of the curable resin composition is 50 ppm or more and less than 5000 ppm.
    Type: Application
    Filed: March 19, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • Publication number: 20230099979
    Abstract: There is provided a curable resin composition containing quantum dots (A), a resin (B), a photopolymerizable compound (C), and a photopolymerization initiator (D), in which the photopolymerization initiator (D) contains an oxime compound having a first molecular structure represented by the formula (1).
    Type: Application
    Filed: March 19, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshihiro HARADA, Masayoshi TOKUDA, Yoshifumi KOMATSU
  • Publication number: 20230083182
    Abstract: The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.
    Type: Application
    Filed: November 8, 2022
    Publication date: March 16, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomohiro FUKUURA, Yoshihiro HARADA, Yoshifumi KOMATSU, Masayoshi TOKUDA
  • Publication number: 20230074438
    Abstract: Provided is a curable resin composition containing quantum dots (A), a compound (B-1) having a first functional group and a second functional group, a resin (C), a photopolymerizable compound (D), and a photopolymerization initiator (E), wherein the first functional group is a carboxy group and the second functional group is a carboxy group or a thiol group.
    Type: Application
    Filed: March 19, 2021
    Publication date: March 9, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • Publication number: 20230034267
    Abstract: The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.
    Type: Application
    Filed: December 23, 2020
    Publication date: February 2, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomohiro FUKUURA, Yoshihiro HARADA, Yoshifumi KOMATSU, Masayoshi TOKUDA
  • Publication number: 20230013986
    Abstract: A composition contains quantum dots (A) and a resin (B), wherein the resin (B) contains a polymer (B1) having a sulfide group, a carboxyl group, and an unsaturated double bond.
    Type: Application
    Filed: December 23, 2020
    Publication date: January 19, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshihiro HARADA, Yoshifumi KOMATSU, Masayoshi TOKUDA
  • Publication number: 20220411551
    Abstract: A curable resin composition contains quantum dots (A), a resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), an antioxidant (E), a leveling agent (F), and a solvent (G), wherein the resin (B) has a weight-average molecular weight in terms of polystyrene of less than 10000 and an acid value of 90 mg KOH/g or more and 150 mg KOH/g or less.
    Type: Application
    Filed: December 23, 2020
    Publication date: December 29, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshihiro HARADA, Yoshifumi KOMATSU, Masayoshi TOKUDA
  • Publication number: 20220220270
    Abstract: An object of the present invention is to provide a laminate which has a substrate, an intermediate layer, and a water-repellent layer laminated in this order, and has excellent abrasion resistance.
    Type: Application
    Filed: April 22, 2020
    Publication date: July 14, 2022
    Applicants: NIKON-ESSILOR CO.,LTD., SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuyoshi TAKESHITA, Hideyuki WAKIYASU, Tomohiro ITO, Tomonori MIYAMOTO, Masayoshi TOKUDA
  • Publication number: 20220213321
    Abstract: A mixed composition including an organosilicon compound (A) in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, a metal compound (B), an acid (C), and water (D), in which a molar ratio (C/D) of the acid (C) to the water (D) is 0.002 to 0.15.
    Type: Application
    Filed: April 1, 2020
    Publication date: July 7, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Sayaka SAKURAI
  • Publication number: 20220195240
    Abstract: The composition of the present invention is a mixed composition including at least one metal compound (G) selected from a metal compound represented by the following formula (G1) and a condensate thereof, a polysilazane (F), and a solvent (I), in which an amount of the polysilazane (F) is 0.01% by mass or more and less than 50% by mass. M(Rg10)r(Ag1)m-r??(G1) In formula (G1), M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta, Rg10 represents a hydrocarbon chain-containing group or a hydrogen atom, r is 0 or 1, a plurality of Ag1 each independently represent a hydrolyzable group, and m is an integer of 3 to 5 in accordance with the metal atom M.
    Type: Application
    Filed: April 1, 2020
    Publication date: June 23, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Sayaka SAKURAI, Masayoshi TOKUDA, Tomohiro ITO
  • Publication number: 20220185968
    Abstract: A mixed composition including an organosilicon compound (A) in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, a metal compound (B), an acid (C), and water (D), in which a ratio [D/(A+B)] of a molar amount of the water (D) to a total molar amount of the organosilicon compound (A) and the metal compound (B) is 3.1 to 130.
    Type: Application
    Filed: April 1, 2020
    Publication date: June 16, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Sayaka SAKURAI
  • Publication number: 20220186028
    Abstract: A mixed composition containing an organosilicon compound (A) and a silicon compound (B), wherein the organosilicon compound (A) is an organosilicon compound in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, the silicon compound (B) is one or more silicon compounds selected from the group consisting of a silicon compound (b) represented by the following formula (b) and a condensate (bb) thereof, and in a chromatogram obtained by GPC chromatography of the mixed composition, a weight average molecular weight Mw in terms of standard polystyrene of a compound derived from at least one of the organosilicon compound (A) and the silicon compound (B) is 2000 to 12000, Si(X)p(ORb)4?p??(b) wherein X is an alkyl group having 1 to 6 carbon atoms or a hydrogen atom, Rb is an alkyl group having 1 to 6 carbon atoms, and p is an integer of 0 to 3.
    Type: Application
    Filed: April 1, 2020
    Publication date: June 16, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Sayaka SAKURAI, Masayoshi TOKUDA
  • Publication number: 20220184657
    Abstract: The present invention aims at providing a coating film excellent in water repellency and oil repellency and further excellent in wear resistance, and a layered body comprising said coating film formed on a base material and a method for manufacturing the same. The present invention provides a coating film having at least an outermost surface layer (M) and a layer (K1) in contact with the layer (M), wherein a density of the layer (M) is 0.7 g/cm3 or more and less than 1.0 g/cm3, and a density of the layer (K1) is 1.0 g/cm3 or more and less than 2.2 g/cm3. The layer (M) preferably has a polydimethylsiloxane skeleton and/or a trialkylsilyl group.
    Type: Application
    Filed: April 1, 2020
    Publication date: June 16, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Sayaka SAKURAI, Masayoshi TOKUDA
  • Publication number: 20220185993
    Abstract: The composition of the present invention is a mixed composition including at least one metal compound (G) selected from a metal compound represented by the following formula (G1) and a condensate thereof, a polysilazane (F), and a compound (H) including a siloxane chain. M(Rg10)r(Ag1)m-r (G1) wherein M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta, Rg10 represents a hydrocarbon chain-containing group or a hydrogen atom, r is 0 or 1, a plurality of Ag1 each independently represent a hydrolyzable group, and m is an integer of 3 to 5 in accordance with the metal atom M.
    Type: Application
    Filed: April 1, 2020
    Publication date: June 16, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Sayaka SAKURAI, Tomohiro ITO