Abstract: A plating support system is provided and includes a simulator that predicts an in-plane uniformity value of a plating film formed on a substrate based on assumed conditions for an electroplating treatment of the substrate; a numerical analysis data storage unit that stores numerical analysis data in which each assumed condition is associated with the in-plane uniformity value for plural assumed conditions; a regression analysis unit that estimates a model that the in-plane uniformity value is an objective variable and variables of assumed conditions are explanatory variables by regression analysis based on the numerical analysis data; and an implement condition search unit that uses the estimated model to search for implement conditions that are recommended values of the assumed conditions related to the in-plane uniformity of the plating film formed in the electroplating treatment of the substrate to be plated.

Abstract: Provided is a technique for appropriately handling a substrate holder depending on a use state of the substrate holder. The substrate holder for holding a substrate that is a plating target in a plating apparatus is suggested. The substrate holder includes an RFID tag, and the RFID tag includes a storage region in which a use attribute is stored, the use attribute including an attribute indicating a state of being used for plating processing.

Abstract: Conventionally, in order to hold data with a high sampling rate in a control device, it has been necessary to increase the capacity of ring buffers. A data management method for a semiconductor manufacturing apparatus includes acquiring, by a control device, data related to operation of the semiconductor manufacturing apparatus, identifying, by the control device, first data and second data of the acquired data, writing, by the control device, the first data to a first ring buffer at first temporal granularity and the second data to a second ring buffer at second temporal granularity coarser than the first temporal granularity, and extracting, by a data management device, the first and second data from the first ring buffer and the second ring buffer respectively and storing the first and second data in a database.

Abstract: A plating support system is provided and includes a simulator that predicts an in-plane uniformity value of a plating film formed on a substrate based on assumed conditions for an electroplating treatment of the substrate; a numerical analysis data storage unit that stores numerical analysis data in which each assumed condition is associated with the in-plane uniformity value for plural assumed conditions; a regression analysis unit that estimates a model that the in-plane uniformity value is an objective variable and variables of assumed conditions are explanatory variables by regression analysis based on the numerical analysis data; and an implement condition search unit that uses the estimated model to search for implement conditions that are recommended values of the assumed conditions related to the in-plane uniformity of the plating film formed in the electroplating treatment of the substrate to be plated.

Abstract: A control system which can efficiently perform an operational adjustment work and can safely adjust a unit is disclosed. The control system 20 includes a controller 10 and a plurality of terminal devices connectable to the controller 10. The controller 10 includes a storage device 110 storing a processing program, and a processor 120 for performing operations and calculations based on the processing program. The processing program including instructions to give an access operation right, which permits access by an adjustment target unit to an access target unit, to a target terminal device which is one of the terminal devices in response to a request for the access operation right, transmitted from the target terminal device to the controller 10, on the condition that an exclusive operation right for the access target unit has not been given to any of the terminal devices.

Abstract: A method is provided, the method including: repeatedly acquiring a state of one or more devices included in the semiconductor manufacturing apparatus; providing a first animation indicating an operation of the semiconductor manufacturing apparatus by displaying at least an image indicating the state of one or more devices on a display unit each time the state is acquired; storing, in a memory, the acquired state of one or more devices and a time related to the state; receiving an input for switching a display mode; and providing a second animation of the semiconductor manufacturing apparatus by displaying, one by one on the display unit, at least one or more images respectively indicating the state of one or more devices related to one or more times including a reference time stored in the memory, after receiving the input for switching a display mode.

Abstract: A method is provided, the method including: repeatedly acquiring a state of one or more devices included in the semiconductor manufacturing apparatus; providing a first animation indicating an operation of the semiconductor manufacturing apparatus by displaying at least an image indicating the state of one or more devices on a display unit each time the state is acquired; storing, in a memory, the acquired state of one or more devices and a time related to the state; receiving an input for switching a display mode; and providing a second animation of the semiconductor manufacturing apparatus by displaying, one by one on the display unit, at least one or more images respectively indicating the state of one or more devices related to one or more times including a reference time stored in the memory, after receiving the input for switching a display mode.

Abstract: A thiazineindigo pigment dispersant represented by Formula (1) or (2): where E denotes a basic group. A pigment composition contains a pigment material, and the thiazine indigo pigment dispersant. A colored composition contains the pigment composition and a pigment carrier. A color filter includes a filter segment prepared from the colored composition.

Abstract: A thiazineindigo pigment dispersant represented by Formula (1) or (2): where E denotes a basic group. A pigment composition contains a pigment material, and the thiazine indigo pigment dispersant. A colored composition contains the pigment composition and a pigment carrier. A color filter includes a filter segment prepared from the colored composition.