Patents by Inventor Masayuki Hatano
Masayuki Hatano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11953825Abstract: According to one embodiment, an imprint apparatus that presses a fine pattern of an original plate against a photo-curable resin dropped onto a substrate, and transfers the fine pattern to the photo-curable resin by applying light, includes a dropping unit that drops the photo-curable resin onto a shot region obtained by dividing the substrate into a plurality of sections, an original plate supporting unit that stamps the original plate on the photo-curable resin on the substrate, the original plate being supported the fine pattern towards the substrate side, and a substrate supporting unit that supports the substrate and moves the substrate such that a position of a predetermined shot region of the substrate is a dropping position of the dropping unit or a stamping position of the original plate, in which the dropping unit is controlled such that the photo-curable resin is sequentially dropped onto the plurality of shot regions of the substrate, and the original plate supporting unit is controlled such thatType: GrantFiled: January 16, 2023Date of Patent: April 9, 2024Assignee: Kioxia CorporationInventors: Masayuki Hatano, Kei Kobayashi, Tetsuro Nakasugi
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Patent number: 11837469Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.Type: GrantFiled: April 7, 2021Date of Patent: December 5, 2023Assignee: Kioxia CorporationInventors: Kazuya Fukuhara, Tetsuro Nakasugi, Masayuki Hatano
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Publication number: 20230288797Abstract: According to one embodiment, an imprint method for a substrate having a plurality of shot regions includes performing a first process on each target shot region in the plurality of shot regions and performing a second process on a non-target shot region in the plurality of shot regions. The first process includes pressing a template against resin in the target shot region to transfer a pattern to the resin, curing the resin, and releasing the template from the cured resin while supplying inert gas towards the substrate from an outer edge side of the template. The second process includes causing the template to approach the non-target shot region without coming into contact with resin in the non-target shot region, and moving the template away from the resin in the non-target shot region while supplying inert gas towards the substrate from the outer edge side of the template.Type: ApplicationFiled: August 26, 2022Publication date: September 14, 2023Inventors: Hirokazu MIYOSHI, Masayuki HATANO
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Publication number: 20230221635Abstract: According to one embodiment, an imprint apparatus that presses a fine pattern of an original plate against a photo-curable resin dropped onto a substrate, and transfers the fine pattern to the photo-curable resin by applying light, includes a dropping unit that drops the photo-curable resin onto a shot region obtained by dividing the substrate into a plurality of sections, an original plate supporting unit that stamps the original plate on the photo-curable resin on the substrate, the original plate being supported the fine pattern towards the substrate side, and a substrate supporting unit that supports the substrate and moves the substrate such that a position of a predetermined shot region of the substrate is a dropping position of the dropping unit or a stamping position of the original plate, in which the dropping unit is controlled such that the photo-curable resin is sequentially dropped onto the plurality of shot regions of the substrate, and the original plate supporting unit is controlled such thatType: ApplicationFiled: January 16, 2023Publication date: July 13, 2023Applicant: Kioxia CorporationInventors: Masayuki HATANO, Kei KOBAYASHI, Tetsuro NAKASUGI
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Patent number: 11333969Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.Type: GrantFiled: November 14, 2018Date of Patent: May 17, 2022Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., KABUSHIKI KAISHA TOSHIBAInventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
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Publication number: 20220082934Abstract: According to one embodiment, an imprint template includes a substrate having a first surface and a mesa part protruding from the first surface. The mesa part has a second surface with a pattern thereon. The mesa part includes a sloped region. The sloped region is on at least an outer circumferential portion of the second surface. The second surface in the sloped region slopes downward towards the first surface to an outer edge of the mesa part when the substate is in a non-pressurized state.Type: ApplicationFiled: March 2, 2021Publication date: March 17, 2022Inventors: Takahiro IWASAKI, Hirokazu MIYOSHI, Shogo ASO, Masayuki HATANO
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Publication number: 20210225638Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.Type: ApplicationFiled: April 7, 2021Publication date: July 22, 2021Inventors: Kazuya FUKUHARA, Tetsuro NAKASUGI, Masayuki HATANO
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Patent number: 11004683Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.Type: GrantFiled: August 21, 2018Date of Patent: May 11, 2021Assignee: TOSHIBA MEMORY CORPORATIONInventors: Kazuya Fukuhara, Tetsuro Nakasugi, Masayuki Hatano
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Patent number: 10773425Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.Type: GrantFiled: January 2, 2018Date of Patent: September 15, 2020Assignees: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATIONInventors: Kensuke Demura, Satoshi Nakamura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
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Patent number: 10668496Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.Type: GrantFiled: September 27, 2017Date of Patent: June 2, 2020Assignees: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATIONInventors: Satoshi Nakamura, Kensuke Demura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
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Publication number: 20200073233Abstract: According to one embodiment, an imprint apparatus that presses a fine pattern of an original plate against a photo-curable resin dropped onto a substrate, and transfers the fine pattern to the photo-curable resin by applying light, includes a dropping unit that drops the photo-curable resin onto a shot region obtained by dividing the substrate into a plurality of sections, an original plate supporting unit that stamps the original plate on the photo-curable resin on the substrate, the original plate being supported the fine pattern towards the substrate side, and a substrate supporting unit that supports the substrate and moves the substrate such that a position of a predetermined shot region of the substrate is a dropping position of the dropping unit or a stamping position of the original plate, in which the dropping unit is controlled such that the photo-curable resin is sequentially dropped onto the plurality of shot regions of the substrate, and the original plate supporting unit is controlled such thatType: ApplicationFiled: March 11, 2019Publication date: March 5, 2020Applicant: TOSHIBA MEMORY CORPORATIONInventors: Masayuki HATANO, Kei KOBAYASHI, Tetsuro NAKASUGI
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Publication number: 20190221421Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.Type: ApplicationFiled: August 21, 2018Publication date: July 18, 2019Inventors: Kazuya FUKUHARA, Tetsuro NAKASUGI, Masayuki HATANO
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Publication number: 20190101824Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.Type: ApplicationFiled: November 14, 2018Publication date: April 4, 2019Inventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
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Patent number: 10168615Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.Type: GrantFiled: June 20, 2014Date of Patent: January 1, 2019Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., KABUSHIKI KAISHA TOSHIBAInventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
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Patent number: 10118317Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.Type: GrantFiled: August 31, 2015Date of Patent: November 6, 2018Assignee: Toshiba Memory CorporationInventors: Yoshihisa Kawamura, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
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Publication number: 20180117796Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a stage that support a template having a convex portion where a concavo-convex pattern is formed; a supply head that supplies a liquid-repellent material in liquid form to the template on the stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; and a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, a volatile solvent that dissolves the liquid-repellent component, and a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.Type: ApplicationFiled: January 2, 2018Publication date: May 3, 2018Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATIONInventors: Kensuke DEMURA, Satoshi NAKAMURA, Daisuke MATSUSHIMA, Masayuki HATANO, Hiroyuki KASHIWAGI
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Publication number: 20180117795Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.Type: ApplicationFiled: January 2, 2018Publication date: May 3, 2018Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATIONInventors: Kensuke DEMURA, Satoshi Nakamura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
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Publication number: 20180119288Abstract: According to one embodiment, a template forming method is provided. In the template forming method, a template pattern is formed on a first surface of a substrate. A high liquid repellent property portion is formed in a region different from the template pattern on a side of the first surface of the substrate. The high liquid repellent property portion has a higher contacting angle with respect to a resist than a portion without the high liquid repellent property portion formed therein.Type: ApplicationFiled: December 21, 2017Publication date: May 3, 2018Applicant: Toshiba Memory CorporationInventors: Masatoshi Tsuji, Masayuki Hatano, Yohko Komatsu, Tetsuro Nakasugi
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Patent number: 9885118Abstract: According to one embodiment, a template forming method is provided. In the template forming method, a template pattern is formed on a first surface of a substrate. A high liquid repellent property portion is formed in a region different from the template pattern on a side of the first surface of the substrate. The high liquid repellent property portion has a higher contacting angle with respect to a resist than a portion without the high liquid repellent property portion formed therein.Type: GrantFiled: September 3, 2015Date of Patent: February 6, 2018Assignee: Toshiba Memory CorporationInventors: Masatoshi Tsuji, Masayuki Hatano, Yohko Komatsu, Tetsuro Nakasugi
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Publication number: 20180022016Abstract: According to one embodiment, a template for imprint includes a base, a convex portion, and a liquid-repellent layer. The base has a main surface. The convex portion is provided on the main surface. The convex portion has an end surface on a side opposite to the main surface, and a concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The liquid-repellent layer is formed on at least the side surface of the convex portion so as to avoid the concavo-convex pattern. The liquid-repellent layer repels the liquid material to be transferred.Type: ApplicationFiled: September 29, 2017Publication date: January 25, 2018Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATIONInventors: Satoshi NAKAMURA, Kensuke DEMURA, Daisuke MATSUSHIMA, Masayuki HATANO, Hiroyuki KASHIWAGI