Patents by Inventor Masayuki Hatano

Masayuki Hatano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12271111
    Abstract: According to one embodiment, an imprint template includes a substrate having a first surface and a mesa part protruding from the first surface. The mesa part has a second surface with a pattern thereon. The mesa part includes a sloped region. The sloped region is on at least an outer circumferential portion of the second surface. The second surface in the sloped region slopes downward towards the first surface to an outer edge of the mesa part when the substate is in a non-pressurized state.
    Type: Grant
    Filed: March 2, 2021
    Date of Patent: April 8, 2025
    Assignee: Kioxia Corporation
    Inventors: Takahiro Iwasaki, Hirokazu Miyoshi, Shogo Aso, Masayuki Hatano
  • Publication number: 20250104135
    Abstract: A virtual fitting apparatus is provided with a user information acquiring unit, a wearing item information acquiring unit, a prediction condition acquiring unit, a prediction unit, and an output unit. The user information acquiring unit acquires physical information on a user. The wearing item information acquiring unit acquires wearing item information related to characteristics of a predetermined wearing item. The prediction condition acquiring unit acquires, as a prediction condition, information related to a situation in which a predetermined exercise is performed. The prediction unit predicts, based on the physical information, the wearing item information, and the prediction condition, a user state resulting when the user does the predetermined exercise by wearing the predetermined wearing item. The output unit outputs information related to the predicted user state.
    Type: Application
    Filed: September 24, 2024
    Publication date: March 27, 2025
    Inventors: Masayuki TSUTSUI, Shingo TAKASHIMA, Satoru ABE, Genki HATANO, Yuya KOZUKA, Lingyu HSU, Ryo KAMIYA
  • Publication number: 20240427234
    Abstract: An imprint method includes: forming a liquid film of a first photocurable resin to have a substantially flat upper surface on a central region of a substrate; depositing droplets of a second photocurable resin on an outer peripheral region of the substrate; pressing a template against the first photocurable resin and the second photocurable resin; irradiating the first photocurable resin and the second photocurable resin with light to cure the first photocurable resin and the second photocurable resin; and releasing the template from the first photocurable resin and the second photocurable resin to expose a pattern on the substrate, that is formed by the cured first photocurable resin and the cured second photocurable resin.
    Type: Application
    Filed: June 17, 2024
    Publication date: December 26, 2024
    Inventors: Kazuya FUKUHARA, Masayuki HATANO, Tetsuro NAKASUGI
  • Publication number: 20240427233
    Abstract: An imprint apparatus: a stage having a face on which an object is placed, the object having a first surface; a dropping device configured to drop a droplet of a photocurable resin in a first direction intersecting with the face; a irradiation device configured to irradiate a first light in a second direction intersecting with the first direction; a holder configured to hold a template having a second surface, the second surface having a pattern; an exposure device configured to irradiate a second light in a third direction intersecting with the face; and a control device configured to drive the dropping device and the irradiation device and control selecting whether to irradiate the first light to the droplet according to a position where the droplet is to be dropped on the first surface.
    Type: Application
    Filed: June 14, 2024
    Publication date: December 26, 2024
    Applicant: Kioxia Corporation
    Inventors: Shunsuke HONDA, Masayuki HATANO
  • Patent number: 12072622
    Abstract: According to one embodiment, an imprint method for a substrate having a plurality of shot regions includes performing a first process on each target shot region in the plurality of shot regions and performing a second process on a non-target shot region in the plurality of shot regions. The first process includes pressing a template against resin in the target shot region to transfer a pattern to the resin, curing the resin, and releasing the template from the cured resin while supplying inert gas towards the substrate from an outer edge side of the template. The second process includes causing the template to approach the non-target shot region without coming into contact with resin in the non-target shot region, and moving the template away from the resin in the non-target shot region while supplying inert gas towards the substrate from the outer edge side of the template.
    Type: Grant
    Filed: August 26, 2022
    Date of Patent: August 27, 2024
    Assignee: Kioxia Corporation
    Inventors: Hirokazu Miyoshi, Masayuki Hatano
  • Patent number: 11953825
    Abstract: According to one embodiment, an imprint apparatus that presses a fine pattern of an original plate against a photo-curable resin dropped onto a substrate, and transfers the fine pattern to the photo-curable resin by applying light, includes a dropping unit that drops the photo-curable resin onto a shot region obtained by dividing the substrate into a plurality of sections, an original plate supporting unit that stamps the original plate on the photo-curable resin on the substrate, the original plate being supported the fine pattern towards the substrate side, and a substrate supporting unit that supports the substrate and moves the substrate such that a position of a predetermined shot region of the substrate is a dropping position of the dropping unit or a stamping position of the original plate, in which the dropping unit is controlled such that the photo-curable resin is sequentially dropped onto the plurality of shot regions of the substrate, and the original plate supporting unit is controlled such that
    Type: Grant
    Filed: January 16, 2023
    Date of Patent: April 9, 2024
    Assignee: Kioxia Corporation
    Inventors: Masayuki Hatano, Kei Kobayashi, Tetsuro Nakasugi
  • Patent number: 11837469
    Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.
    Type: Grant
    Filed: April 7, 2021
    Date of Patent: December 5, 2023
    Assignee: Kioxia Corporation
    Inventors: Kazuya Fukuhara, Tetsuro Nakasugi, Masayuki Hatano
  • Publication number: 20230288797
    Abstract: According to one embodiment, an imprint method for a substrate having a plurality of shot regions includes performing a first process on each target shot region in the plurality of shot regions and performing a second process on a non-target shot region in the plurality of shot regions. The first process includes pressing a template against resin in the target shot region to transfer a pattern to the resin, curing the resin, and releasing the template from the cured resin while supplying inert gas towards the substrate from an outer edge side of the template. The second process includes causing the template to approach the non-target shot region without coming into contact with resin in the non-target shot region, and moving the template away from the resin in the non-target shot region while supplying inert gas towards the substrate from the outer edge side of the template.
    Type: Application
    Filed: August 26, 2022
    Publication date: September 14, 2023
    Inventors: Hirokazu MIYOSHI, Masayuki HATANO
  • Publication number: 20230221635
    Abstract: According to one embodiment, an imprint apparatus that presses a fine pattern of an original plate against a photo-curable resin dropped onto a substrate, and transfers the fine pattern to the photo-curable resin by applying light, includes a dropping unit that drops the photo-curable resin onto a shot region obtained by dividing the substrate into a plurality of sections, an original plate supporting unit that stamps the original plate on the photo-curable resin on the substrate, the original plate being supported the fine pattern towards the substrate side, and a substrate supporting unit that supports the substrate and moves the substrate such that a position of a predetermined shot region of the substrate is a dropping position of the dropping unit or a stamping position of the original plate, in which the dropping unit is controlled such that the photo-curable resin is sequentially dropped onto the plurality of shot regions of the substrate, and the original plate supporting unit is controlled such that
    Type: Application
    Filed: January 16, 2023
    Publication date: July 13, 2023
    Applicant: Kioxia Corporation
    Inventors: Masayuki HATANO, Kei KOBAYASHI, Tetsuro NAKASUGI
  • Patent number: 11333969
    Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: May 17, 2022
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., KABUSHIKI KAISHA TOSHIBA
    Inventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
  • Publication number: 20220082934
    Abstract: According to one embodiment, an imprint template includes a substrate having a first surface and a mesa part protruding from the first surface. The mesa part has a second surface with a pattern thereon. The mesa part includes a sloped region. The sloped region is on at least an outer circumferential portion of the second surface. The second surface in the sloped region slopes downward towards the first surface to an outer edge of the mesa part when the substate is in a non-pressurized state.
    Type: Application
    Filed: March 2, 2021
    Publication date: March 17, 2022
    Inventors: Takahiro IWASAKI, Hirokazu MIYOSHI, Shogo ASO, Masayuki HATANO
  • Publication number: 20210225638
    Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.
    Type: Application
    Filed: April 7, 2021
    Publication date: July 22, 2021
    Inventors: Kazuya FUKUHARA, Tetsuro NAKASUGI, Masayuki HATANO
  • Patent number: 11004683
    Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: May 11, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Kazuya Fukuhara, Tetsuro Nakasugi, Masayuki Hatano
  • Patent number: 10773425
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.
    Type: Grant
    Filed: January 2, 2018
    Date of Patent: September 15, 2020
    Assignees: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Kensuke Demura, Satoshi Nakamura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
  • Patent number: 10668496
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: June 2, 2020
    Assignees: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Satoshi Nakamura, Kensuke Demura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
  • Publication number: 20200073233
    Abstract: According to one embodiment, an imprint apparatus that presses a fine pattern of an original plate against a photo-curable resin dropped onto a substrate, and transfers the fine pattern to the photo-curable resin by applying light, includes a dropping unit that drops the photo-curable resin onto a shot region obtained by dividing the substrate into a plurality of sections, an original plate supporting unit that stamps the original plate on the photo-curable resin on the substrate, the original plate being supported the fine pattern towards the substrate side, and a substrate supporting unit that supports the substrate and moves the substrate such that a position of a predetermined shot region of the substrate is a dropping position of the dropping unit or a stamping position of the original plate, in which the dropping unit is controlled such that the photo-curable resin is sequentially dropped onto the plurality of shot regions of the substrate, and the original plate supporting unit is controlled such that
    Type: Application
    Filed: March 11, 2019
    Publication date: March 5, 2020
    Applicant: TOSHIBA MEMORY CORPORATION
    Inventors: Masayuki HATANO, Kei KOBAYASHI, Tetsuro NAKASUGI
  • Publication number: 20190221421
    Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.
    Type: Application
    Filed: August 21, 2018
    Publication date: July 18, 2019
    Inventors: Kazuya FUKUHARA, Tetsuro NAKASUGI, Masayuki HATANO
  • Publication number: 20190101824
    Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.
    Type: Application
    Filed: November 14, 2018
    Publication date: April 4, 2019
    Inventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
  • Patent number: 10168615
    Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: January 1, 2019
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., KABUSHIKI KAISHA TOSHIBA
    Inventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
  • Patent number: 10118317
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshihisa Kawamura, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi