Patents by Inventor Masayuki Kouketsu
Masayuki Kouketsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8840049Abstract: A liquid ejecting apparatus having a storage portion (20) for storing a treatment liquid, a slit-shaped opening portion (41) for ejecting the treatment liquid, and a connecting passage (42) that has a slit-shaped cross-section and connects the storage portion (20) to the slit-shaped opening portion (41) includes: a valve body portion (50) that is provided in the storage portion (20) to cover the connecting passage (42), and forms a gap (22) together with a lower wall (43) of the storage portion (20) so that the treatment liquid is caused to flow into the connecting passage (42) through the gap (22); a first curved surface portion (44a) that smoothly connects a surface of the lower wall (43) of the storage portion (20) to an inner wall surface (42a) of the connecting passage (42); and a second curved surface portion (51a) that is provided on the valve body portion (50) so as to project to an identical side to the first curved surface portion (44a).Type: GrantFiled: April 16, 2010Date of Patent: September 23, 2014Assignee: CKD CorporationInventors: Masayuki Kouketsu, Hiroshi Itafuji
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Publication number: 20140015151Abstract: A liquid vaporizer includes a first housing having a liquid-supplied surface to which a chemical solution is supplied, a heater, a mesh, a first holder and a second holder attached to the outer edge portions of the mesh, the outer edge portions opposing each other in a direction of spreading of the mesh, first cover bolts, stems supported by the first housing so as to be movable along a specific direction inclined with respect to the liquid-supplied surface, second cover bolts, coil springs biasing the stems along the specific direction and bring the mesh into intimate contact with the liquid-supplied surface, and a lid member covering the mesh from a side of the liquid-supplied surface to seal a space around the liquid-supplied surface with the first housing.Type: ApplicationFiled: July 11, 2013Publication date: January 16, 2014Inventors: Masayuki KOUKETSU, Hiroshi ITAFUJI, Masayo OKADA
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Publication number: 20140007958Abstract: A chemical liquid circuit apparatus includes a main circuit member, a sub-circuit member, and a frame member. The main circuit member has a chemical liquid channel for flowing a chemical fluid, and a main opening formed on an end of the chemical liquid channel. The sub-circuit member is mounted on and in contact with the main circuit member and applies a first load to the main circuit member. The sub-circuit member has a sealing surface for sealing the main opening from outside of the apparatus. The frame member has a storing portion for storing the main circuit member, and a connecting opening disposed in a position in communication with the main opening of the main circuit member stored in the storing portion. The shape of the frame member allows a reaction force of the first load to be transferred from the storing portion to the main circuit member.Type: ApplicationFiled: September 11, 2013Publication date: January 9, 2014Applicant: CKD CORPORATIONInventors: Hiroshi ITAFUJI, Masayuki KOUKETSU
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Publication number: 20130313458Abstract: A vacuum control valve connected between a vacuum chamber and a vacuum pump includes a control valve main body having a valve seat formed in a vacuum flow passage, a valve body that manipulates the valve opening by performing a linear motion to adjust a lift, a rod that transmits driving force from a linear driving unit that generates the driving force, a sliding/sealing member that seals the vacuum flow passage while allowing the rod to slide, and a cylindrical member that covers a sliding range of the rod. The sliding range includes a range movable from a valve body flow passage side to an exterior side. The cylindrical member has an outer peripheral surface, a working fluid absorption amount per unit area of the outer peripheral surface being smaller than that of an outer surface of the rod.Type: ApplicationFiled: August 1, 2013Publication date: November 28, 2013Applicant: CKD CORPORATIONInventors: Masayuki KOUKETSU, Hiroshi ITAFUJI
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Patent number: 8590942Abstract: The connected structure includes a plurality of vacuum double pipes and a joint connecting the plurality of vacuum double pipes. Each vacuum double pipe includes an inner pipe and an outer pipe, and a vacuum passage is formed between the inner pipe and the outer pipe. The vacuum passage is open at both ends in an extension direction of the inner pipe and sealed between the both ends. The joint includes an inner pipe joint portion having inner pipe connectors and an outer pipe joint portion having outer pipe connectors. The joint evacuation passage connects the vacuum passages and is sealed between the outer pipe connectors.Type: GrantFiled: March 28, 2011Date of Patent: November 26, 2013Assignees: CKD Corporation, Mirapro Co., Ltd.Inventors: Masayuki Kouketsu, Hiroshi Itafuji, Shinji Hayakawa, Yasushi Kohno
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Publication number: 20130298834Abstract: A liquid vaporizer is configured to vaporize a liquid reagent and mix the vaporized liquid reagent with a gaseous medium. The liquid vaporizer is equipped with a main vaporizer body having a mixed gas generating space, and a vaporizing unit disposed inside the mixed gas generating space. The vaporizing unit has a vaporizing unit main body having a vaporization surface and a net-shaped body formed in a planar shape by knitting wires regularly in a net-like shape. The net-shaped body forms a plurality of mesh spaces surrounded by the wires and arranged regularly in the in-plane direction. The vaporizing unit forms a plurality of liquid reagent supply spaces surrounded by the wires and the vaporization surface as a result of the net-shaped body and the vaporization surface being abutted against each other. The liquid reagent supply spaces are arranged regularly in the in-plane direction of the net-shaped body.Type: ApplicationFiled: July 18, 2013Publication date: November 14, 2013Inventors: Masayuki KOUKETSU, Hiroshi ITAFUJI
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Patent number: 8573560Abstract: The invention provides a vacuum control valve configured to control the vacuum pressure in the vacuum chamber. The vacuum control valve includes a control valve main body, an operation unit, a cylinder, a biasing unit, and a bellofram. The operation unit and the cylinder include a valve opening manipulation chamber and a shutoff load generation chamber. The shutoff load generation chamber is configured to have a common axial center line with the valve opening manipulation chamber and to generate a load applied to the operation unit in a direction for reducing the lift in accordance with a supply of the working fluid. And the shutoff load generation chamber may be formed in an interior of the rod.Type: GrantFiled: March 6, 2012Date of Patent: November 5, 2013Assignee: CKD CorporationInventors: Hiroshi Itafuji, Masayuki Kouketsu
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Patent number: 8544350Abstract: This invention provides a sample injector for injecting a fixed amount of a sample into a mobile phase medium and discharging the mobile phase medium with the sample. The sample injector includes a first member having a medium passage for supplying the mobile phase medium and a sample passage for supplying the sample and a second member having a discharge passage for discharging the mobile phase medium with the sample to an outside of the injector. The second member is provided in contact with the first member. The first member and the second member are configured to move to a sample charging position and a sample injection position. The sample charging position is for the sample chamber to connect with the sample passage. The sample injection position is for the sample chamber to connect with the medium passage and the discharge passage.Type: GrantFiled: March 4, 2011Date of Patent: October 1, 2013Assignee: CKD CorporationInventors: Hiroshi Itafuji, Masayuki Kouketsu
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Patent number: 8544500Abstract: This invention provides a chemical fluid flow channel coupling apparatus that couples and decouples chemical fluid flow channels. The coupling apparatus includes a first coupling unit; and a second coupling unit. The first coupling unit includes a first chemical fluid valve member chamber and a first valve member configured to open and close a first chemical fluid opening communicated with the first chemical fluid flow channel; and a purging fluid supply control valve configured to open and close the purging fluid supply flow channel. The second coupling unit includes a second chemical fluid valve member chamber, and a second valve member configured to open and close a second chemical fluid opening connected to the second chemical fluid flow channel; and a purging fluid discharge control valve.Type: GrantFiled: May 16, 2011Date of Patent: October 1, 2013Assignee: CKD CorporationInventors: Hiroshi Itafuji, Masayuki Kouketsu
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Patent number: 8361231Abstract: Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate.Type: GrantFiled: March 30, 2010Date of Patent: January 29, 2013Assignee: CKD CorporationInventors: Masayuki Kouketsu, Hiroshi Itafuji
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Publication number: 20120180724Abstract: Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate.Type: ApplicationFiled: March 30, 2010Publication date: July 19, 2012Applicant: CKD CORPORATIONInventors: Masayuki Kouketsu, Hiroshi Itafuji
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Patent number: 8210196Abstract: A vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber. The vacuum control system includes: a plurality of vacuum control valves, each of the valves being connected between each of a plurality of gas discharge ports and the vacuum pump; a pressure measurement unit configured to measure the vacuum pressure of the processing gas supplied to the object; and a controller configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure.Type: GrantFiled: January 6, 2011Date of Patent: July 3, 2012Assignee: CKD CorporationInventors: Hiroshi Itafuji, Masayuki Kouketsu
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Publication number: 20120160344Abstract: The invention provides a vacuum control valve configured to control the vacuum pressure in the vacuum chamber. The vacuum control valve includes a control valve main body, an operation unit, a cylinder, a biasing unit, and a bellofram. The operation unit and the cylinder include a valve opening manipulation chamber and a shutoff load generation chamber. The shutoff load generation chamber is configured to have a common axial center line with the valve opening manipulation chamber and to generate a load applied to the operation unit in a direction for reducing the lift in accordance with a supply of the working fluid. And the shutoff load generation chamber may be formed in an interior of the rod.Type: ApplicationFiled: March 6, 2012Publication date: June 28, 2012Applicant: CKD CORPORATIONInventors: Hiroshi ITAFUJI, Masayuki KOUKETSU
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Publication number: 20120024989Abstract: A liquid ejecting apparatus having a storage portion (20) for storing a treatment liquid, a slit-shaped opening portion (41) for ejecting the treatment liquid, and a connecting passage (42) that has a slit-shaped cross-section and connects the storage portion (20) to the slit-shaped opening portion (41) includes: a valve body portion (50) that is provided in the storage portion (20) to cover the connecting passage (42), and forms a gap (22) together with a lower wall (43) of the storage portion (20) so that the treatment liquid is caused to flow into the connecting passage (42) through the gap (22); a first curved surface portion (44a) that smoothly connects a surface of the lower wall (43) of the storage portion (20) to an inner wall surface (42a) of the connecting passage (42); and a second curved surface portion (51a) that is provided on the valve body portion (50) so as to project to an identical side to the first curved surface portion (44a).Type: ApplicationFiled: April 16, 2010Publication date: February 2, 2012Applicant: CKD CORPORATIONInventors: Masayuki Kouketsu, Hiroshi Itafuji
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Publication number: 20110285125Abstract: This invention provides a chemical fluid flow channel coupling apparatus that couples and decouples chemical fluid flow channels. The coupling apparatus includes a first coupling unit; and a second coupling unit. The first coupling unit includes a first chemical fluid valve member chamber and a first valve member configured to open and close a first chemical fluid opening communicated with the first chemical fluid flow channel; and a purging fluid supply control valve configured to open and close the purging fluid supply flow channel. The second coupling unit includes a second chemical fluid valve member chamber, and a second valve member configured to open and close a second chemical fluid opening connected to the second chemical fluid flow channel; and a purging fluid discharge control valve.Type: ApplicationFiled: May 16, 2011Publication date: November 24, 2011Applicant: CKD CORPORATIONInventors: Hiroshi Itafuji, Masayuki Kouketsu
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Publication number: 20110233923Abstract: This invention provides a connected structure of vacuum double pipes. The connected structure comprises a plurality of vacuum double pipes and a joint configured to connect the plurality of vacuum double pipes. The vacuum passage is open at both end in an extension direction of the inner pipe and sealed between the both ends. The joint includes an inner pipe joint unit having inner pipe connectors and an outer pipe joint unit having outer pipe connectors. The evacuation passage is sealed between the outer pipe connectors that connect the vacuum passages of the outer pipes.Type: ApplicationFiled: March 28, 2011Publication date: September 29, 2011Applicants: CKD CORPORATION, MIRAPRO CO., LTD.Inventors: Masayuki KOUKETSU, Hiroshi ITAFUJI, Shinji HAYAKAWA, Yasushi KOHNO
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Publication number: 20110219890Abstract: This invention provides a sample injector for injecting a fixed amount of a sample into a mobile phase medium and discharging the mobile phase medium with the sample. The sample injector includes a first member having a medium passage for supplying the mobile phase medium and a sample passage for supplying the sample and a second member having a discharge passage for discharging the mobile phase medium with the sample to an outside of the injector. The second member is provided in contact with the first member. The first member and the second member are configured to move to a sample charging position and a sample injection position. The sample charging position is for the sample chamber to connect with the sample passage. The sample injection position is for the sample chamber to connect with the medium passage and the discharge passage.Type: ApplicationFiled: March 4, 2011Publication date: September 15, 2011Applicant: CKD CORPORATIONInventors: Hiroshi ITAFUJI, Masayuki KOUKETSU
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Publication number: 20110174380Abstract: This invention provides a vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber. The vacuum control system includes: a plurality of vacuum control valves, each of the valves being connected between each of a plurality of gas discharge ports and the vacuum pump; a pressure measurement unit configured to measure the vacuum pressure of the processing gas supplied to the object; and a controller configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure.Type: ApplicationFiled: January 6, 2011Publication date: July 21, 2011Applicant: CKD CORPORATIONInventors: Hiroshi ITAFUJI, Masayuki KOUKETSU
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Patent number: 6913031Abstract: A flow controller and a flow controlling method are adapted to be released from conventional restrictions by using a novel type called a pulse shot type. A pulse shot (opening/closing operation of a first cutoff valve (12) and, after that, opening/closing operation of a second cutoff valve (17)) is repeated. Simultaneously, a volume flow Q of process gas exhausted from the second cutoff valve (17) per unit time on the basis of after-filling pressure and after-exhaust pressure of the process gas in a gas filling capacity (13) measure by a pressure sensor (14). Furthermore, a mode of the pulse shot is changed to control the volume flow Q of the process gas exhausted from the second cutoff valve (17) per unit time.Type: GrantFiled: October 16, 2002Date of Patent: July 5, 2005Assignee: CKD CorporationInventors: Tokuhide Nawata, Yoshihisa Sudoh, Masayuki Kouketsu, Masayuki Watanabe, Hiroki Doi
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Publication number: 20040244837Abstract: A flow controller and a flow controlling method are adapted to be released from conventional restrictions by using a novel type called a pulse shot type. A pulse shot (opening/closing operation of a first cutoff valve (12) and, after that, opening/closing operation of a second cutoff valve (17)) is repeated. Simultaneously, a volume flow Q of process gas exhausted from the second cutoff valve (17) per unit time on the basis of after-filling pressure and after-exhaust pressure of the process gas in a gas filling capacity (13) measure by a pressure sensor (14). Furthermore, a mode of the pulse shot is changed to control the volume flow Q of the process gas exhausted from the second cutoff valve (17) per unit time.Type: ApplicationFiled: April 8, 2004Publication date: December 9, 2004Inventors: Tokuhide Nawata, Yoshihisa Sudoh, Masayuki Kouketsu, Masayuki Watanabe, Hiroki Doi