Abstract: A relay device is provided that is provided on a first network hierarchy level and relays communications via a network hierarchy level higher than the first level, between a plurality of nodes subordinate to the relay device and a sales broker website, and includes: an application storage unit storing a sales broker application; and an application execution unit executing the sales broker application to cause the relay device to function as: an order data reception unit receiving order data including a plurality of contents; a first order data transmission unit transmitting the order data to the sales broker website; and a second order data transmission unit transmitting, when an order receiver node receiving an order for the product is any of the plurality of nodes, at least a part of the plurality of contents to the order receiver node without involving a level higher than the first level.

Abstract: A relay device is provided that is provided on a first network hierarchy level and relays communications via a network hierarchy level higher than the first level, between a plurality of nodes subordinate to the relay device and a sales broker website, and includes: an application storage unit storing a sales broker application; and an application execution unit executing the sales broker application to cause the relay device to function as: an order data reception unit receiving order data including a plurality of contents; a first order data transmission unit transmitting the order data to the sales broker website; and a second order data transmission unit transmitting, when an order receiver node receiving an order for the product is any of the plurality of nodes, at least a part of the plurality of contents to the order receiver node without involving a level higher than the first level.

Abstract: A system is provided that includes: a first relay device provided on a first network hierarchy level; and a second relay device provided on a second network hierarchy level higher than the first network hierarchy level. The first relay device includes: a first information reception unit that receives target object information about a target object, transmitted by a radio tag attached to the target object in accordance with a predetermined timing; a first information storage unit that stores the target object information received by the first information reception unit; a first change determination unit that determines whether there has been a change in a status of the target object, based on a status of reception of the target object information; and a first information transmission unit that transmits the target object information to the second relay device, when the first change determination unit determines that there has been the change.

Abstract: The present invention provides a power-supply device, which can continuously supply a voltage from a power supply to a load even if a breakdown of a circuit is generated. The power-supply device includes a booster circuit, a normally-closed bypass relay, a CPU, and a switching circuit. A first switch of the switching circuit is turned on by a switching signal from the CPU, and a second switch is turned on by a boosting request signal from a boosting request signal generator. In the case that one of or both the switching signal and the boosting request signal are not input to the switching circuit 14, because a coil of a bypass relay is not energized, a contact turns on, and a voltage is supplied from a DC power supply to the load through the contact.

Abstract: Provided is a fine-processing agent which, when fine-processing a laminated film stacked at least with a silicon dioxide film and a silicon nitride film, can selectively fine-process the silicon dioxide film. Also provided is a fine-processing method utilizing the fine-processing agent. The fine-processing agent is characterized by including: (a) 0.01-15.0 weight % hydrogen fluoride and/or 0.1-40.0 weight % ammonium fluoride, (b) water, and (c) 0.001-10.00 weight % water-soluble polymer selected from among a group consisting of acrylic acid, ammonium acrylate, acrylic acid ester, acrylamide, styrenesulfonic acid, ammonium styrenesulfonate, and styrenesulfonic acid ester.

Abstract: The present invention provides a power-supply device, which can continuously supply a voltage from a power supply to a load even if a breakdown of a circuit is generated. The power-supply device includes a booster circuit, a normally-closed bypass relay, a CPU, and a switching circuit. A first switch of the switching circuit is turned on by a switching signal from the CPU, and a second switch is turned on by a boosting request signal from a boosting request signal generator. In the case that one of or both the switching signal and the boosting request signal are not input to the switching circuit 14, because a coil of a bypass relay is not energized, a contact turns on, and a voltage is supplied from a DC power supply to the load through the contact.

Abstract: A production method of high purity silver tetrafluoroborate, capable of producing silver tetrafluoroborate (AgBF4) at purity higher than the conventional, without using an organic solvent. The production method of the present invention is characterized in that the method comprises the step of: reacting silver fluoride with boron trifluoride in the presence of anhydrous hydrofluoric acid. Boron trifluoride is delivered into a solution obtained by dissolving or suspending silver fluoride in an anhydrous hydrofluoric acid solution.

Abstract: A power-supply device has a DC power supply, a load, a booster circuit disposed between the DC power supply and the load, wherein the booster circuit supplies a voltage at the DC power supply to the load while boosting the voltage, a bypass element disposed between the DC power supply and the load, wherein the bypass element constitutes a bypass path with respect to the booster circuit, a controller that controls an operation of the booster circuit, a first switching element that drives the bypass element in a first driving path, and a second switching element that drives the bypass element in a second driving path.

Abstract: Disclosed is a cleaning liquid which is capable of cleaning an object to be cleaned, to the surface of which cerium oxide adheres, by dissolving and removing cerium oxide in the form of cerium ions. A cleaning method using the cleaning liquid is also disclosed. The cleaning liquid for removing cerium oxide is characterized by containing hydrogen fluoride, at least one acid selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, phosphoric acid, iodic acid and hydrobromic acid, and water. The cleaning liquid is also characterized by dissolving and removing cerium oxide in the form of cerium ions.

Abstract: Provided is a fine-processing agent which, when fine-processing a laminated film stacked at least with a silicon dioxide film and a silicon nitride film, can selectively fine-process the silicon dioxide film. Also provided is a fine-processing method utilizing the fine-processing agent. The fine-processing agent is characterized by including: (a) 0.01-15.0 weight % hydrogen fluoride and/or 0.1-40.0 weight % ammonium fluoride, (b) water, and (c) 0.001-10.00 weight % water-soluble polymer selected from among a group consisting of acrylic acid, ammonium acrylate, acrylic acid ester, acrylamide, styrenesulfonic acid, ammonium styrenesulfonate, and styrenesulfonic acid ester.

Abstract: A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.

Abstract: Disclosed is a method for cleaning a semiconductor substrate that can solve a problem of a conventional cleaning method which should include at least five steps for cleaning a substrate such as a semiconductor substrate. The method for cleaning a semiconductor substrate comprises a first step of cleaning a substrate with ultrapure water containing ozone, a second step of cleaning the substrate with ultrapure water containing a surfactant, and a third step of removing an organic compound derived from the surfactant, with a cleaning liquid containing ultrapure water and 2-propanol. After the third step, plasma of noble gas such as krypton is applied to the substrate to further remove the organic compound derived from the surfactant.

Abstract: Disclosed is a method for cleaning a semiconductor substrate that can solve a problem of a conventional cleaning method which should include at least five steps for cleaning a substrate such as a semiconductor substrate. The method for cleaning a semiconductor substrate comprises a first step of cleaning a substrate with ultrapure water containing ozone, a second step of cleaning the substrate with ultrapure water containing a surfactant, and a third step of removing an organic compound derived from the surfactant, with a cleaning liquid containing ultrapure water and 2-propanol. After the third step, plasma of noble gas such as krypton is applied to the substrate to further remove the organic compound derived from the surfactant.

Abstract: A surface treatment solution for finely processing a glass substrate containing multiple ingredients like the one used for the construction of a liquid crystal-based or organic electroluminescence-based flat panel display device, without evoking crystal precipitation and surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution is adjusted.

Abstract: A production method of high purity silver tetrafluoroborate, capable of producing silver tetrafluoroborate (AgBF4) at purity higher than the conventional, without using an organic solvent. The production method of the present invention is characterized in that the method comprises the step of: reacting silver fluoride with boron trifluoride in the presence of anhydrous hydrofluoric acid. Boron trifluoride is delivered into a solution obtained by dissolving or suspending silver fluoride in an anhydrous hydrofluoric acid solution.

Abstract: A resin pipe has an inner layer made of a fluororesin, an intermediate layer of nylon, and an outermost layer made of a fluororesin and covering the intermediate layer.

Abstract: A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.

Abstract: A surface treatment solution for finely processing a glass substrate containing multiple ingredients like the one used for the construction of a liquid crystal-based or organic electroluminescence-based flat panel display device, without evoking crystal precipitation and surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution is adjusted.

Abstract: A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.

Abstract: A method for removing calcium from water containing a high concentration of calcium bicarbonate, permitting a reduction of the calcium bicarbonate equivalent to 200-500 ppm calcium to the level in accordance with the water quality standards for industrial use, not by a method using a large amount of heat and power as heating and deairing, but by a simple chemical treatment. Calcium hydroxide is added to waste water containing a high concentration of calcium in a form of calcium bicarbonate for making them react with each other, and removing calcium by fixing it to calcium bicarbonate.