Abstract: Provided are a modifying agent for a plastic fat to be used in a plastic fat comprising palm oil, which inhibits changes in physical properties of the plastic fat such as hardness or crude crystal formation and gives an air-containing plastic fat; and a plastic fat using the same. A plastic fat is prepared by using, as modifying agent, an appropriate amount of a fat composition which comprised triglycerides comprising, as constituting fatty acids, a saturated fatty acid (A) having a melting point of 60° C. or higher and a saturated fatty acid (B) having a melting point of 40° C. or lower, wherein the fat composition contains 40-85 wt %, relative to the total fat composition, of ABB type triglycerides, and the weight ratio (ABB/AAB) of said ABB type triglycerides o AAB type triglycerides is 2-15.

Abstract: Provided are a modifying agent for a plastic fat to be used in a plastic fat comprising palm oil, which inhibits changes in physical properties of the plastic fat such as hardness or crude crystal formation and gives an air-containing plastic fat; and a plastic fat using the same. A plastic fat is prepared by using, as modifying agent, an appropriate amount of a fat composition which comprised triglycerides comprising, as constituting fatty acids, a saturated fatty acid (A) having a melting point of 60° C. or higher and a saturated fatty acid (B) having a melting point of 40° C. or lower, wherein the fat composition contains 40-85 wt %, relative to the total fat composition, of ABB type triglycerides, and the weight ratio (ABB/AAB) of said ABB type triglycerides o AAB type triglycerides is 2-15.

Abstract: Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

Abstract: An optical apparatus having at least one optical element arranged along an optical path of an irradiation light. A first hermetic chamber is defined along the optical path separating the optical path from ambient air and charged with a predetermined gas. A second hermetic chamber is located in the first hermetic chamber separating the optical path from the gas in the first hermetic chamber and retaining the optical elements.

Abstract: Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

Abstract: An exposure apparatus and a method of operating the exposure apparatus. The exposure apparatus includes a light source generating illumination light and a projection optical system. A detector detects illumination light reaching a plurality of measuring positions within an image field of the projection optical system. An illumination area setting and changing device arranged between the light source and the detector sets an illumination area on a mask to illuminate a pattern on the mask, and changes the illumination area during detection of a projected image of the pattern by the detector while illumination light is maintained on the mask. The illumination area setting and changing device changes the illumination area from a first illumination area illuminating a first pattern on the mask to a second illumination area illuminating both the first pattern and a second pattern which differs from the first pattern.

Abstract: An optical apparatus having at least one optical element arranged along an optical path of an irradiation light. A first hermetic chamber is defined along the optical path separating the optical path from ambient air and charged with a predetermined gas. A second hermetic chamber is located in the first hermetic chamber separating the optical path from the gas in the first hermetic chamber and retaining the optical elements.

Abstract: Air-conditioning is effected in a chamber of an exposure apparatus for transferring a pattern formed on a mask onto a photosensitized substrate by exposure. The chamber houses at least a part of the exposure apparatus. An impurity-removing filter is provided for removing gaseous impurities from a stream of ambient air being introduced into the chamber and/or from a gas stream recirculating in the chamber. A pair of impurity-concentration-measuring devices are disposed upstream and downstream, respectively, of the filter. End-of-life of the filter is determined based on measurements from the impurity-concentration-measuring devices. Introducing the ambient air into the chamber is stopped when the impurity-concentration-measuring device disposed upstream of the filter has indicated a gaseous impurity concentration above a predetermined level. The integrity of the airtightness of the chamber around a negative pressure area in the chamber is sensed.

Abstract: Air-conditioning is effected in a chamber of an exposure apparatus for transferring a pattern formed on a mask onto a photosensitized substrate by exposure. The chamber houses at least a part of the exposure apparatus. An impurity-removing filter is provided for removing gaseous impurities from a stream of ambient air being introduced into the chamber and/or from a gas stream recirculating in the chamber. A pair of impurity-concentration-measuring devices are disposed upstream and downstream, respectively, of the filter. End-of-life of the filter is determined based on measurements from the impurity-concentration-measuring devices. Introducing the ambient air into the chamber is stopped when the impurity-concentration-measuring device disposed upstream of the filter has indicated a gaseous impurity concentration above a predetermined level. The integrity of the airtightness of the chamber around a negative pressure area in the chamber is sensed.

Abstract: Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

Abstract: A disclosed exposure apparatus has a projection optical system, an illumination system including a light source and adapted to send exposure illumination light to the projection optical system, and a substrate stage for supporting a sensitive substrate so that the sensitive substrate is exposed by the illumination light passed through the projection optical system. A shot area of the illumination light is formed on a plane corresponding to a top surface of the sensitive substrate.

Abstract: Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

Abstract: A disclosed exposure apparatus comprises a photo-electric sensor having a light receiving portion supported by the substrate stage for a shifting movement within the shot area along the plane, a blind disposed between the light source and the project ion optical system and adapted to shield the illumination light reaching the shot area excluding an area surrounding the light receiving portion while the light receiving portion is being shifted along the plane.

Abstract: A projection exposure apparatus for projecting a pattern image of an illuminated mask onto a substrate. The optical path can be divided into a plurality of hermetic blocks each having an inert gas sealed therein by a plurality of partition devices. According a one aspect of the invention, a hermetic sealing member is disposed in the space between the substrate-side of the projection optical system and the substrate for replacing the atmosphere existing in the optical path of the illuminating light in that space by a substance other than oxygen. According to another aspect of the invention, a plurality of independent chambers are formed in a frame. Lids, piping, and valves in the chambers are opened or closed in response to the value detected by oxygen density sensors.

Abstract: An exposure apparatus comprises a projection optical system, which projects a pattern formed on a mask on a photosensitive substrate, a mounting object table, which holds the photosensitive substrate, a positioning stage, which positions the mounting object table along a 2-dimensional movement coordinate system, a stage coordinate measurement device, which detects the position of the mounting object table in the 2-dimensional movement coordinate system, a height measurement device, which detects the deviation in the optical axis direction of the projection optical system from the surface of the photosensitive substrate to a specified standard surface in a measurement point fixed with regard to the 2-dimensional movement coordinate system, a levelling device, which adjusts the inclination of the mounting object table with regard to the positioning stage, a computation device, which calculates the amount of levelling necessary to match the surface of the photosensitive substrate with the standard surface, a con