Patents by Inventor Masayuki Tooyama

Masayuki Tooyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical amplification resist composition
    Patent number: 6887646
    Abstract: The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: May 3, 2005
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Masayuki Tooyama
  • Copolymer, process for producing the same, and resist composition
    Patent number: 6706826
    Abstract: The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure.
    Type: Grant
    Filed: September 27, 2000
    Date of Patent: March 16, 2004
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Masayuki Tooyama, Yukiya Wakisaka, Koji Nishida, Akira Yanagase
  • Process for producing amphipathic polymers
    Publication number: 20030130454
    Abstract: A process for producing polymers which comprises polymerizing an amphipathic monomer or copolymerizing an amphipathic monomer and another monomer which is copolymerizable therewith, wherein a polymerization solvent, a nonionic chain transfer agent and 1,1′-azobis(cyclohexane-1-carbonitrile) as a polymerization initiator are used together with the monomer. It is thereby possible to produce polymers with high hydrate formation and dissociation-controlling performance, and to produce polymers of low molecular weight with low residual monomer contents using the same amounts of polymerization initiators.
    Type: Application
    Filed: November 7, 2002
    Publication date: July 10, 2003
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Masaaki Seya, Masayuki Tooyama