Abstract: Provided is a resin composition capable of being turned into a cured product having a high glass-transition temperature and excellent dielectric properties as well. The resin composition is a heat-curable bismaleimide resin composition containing: (A) a bismaleimide compound represented by the following formula (1) wherein A independently represents a tetravalent organic group having 4 to 200 carbon atoms, B independently represents a divalent organic group having 2 to 200 carbon atoms, n is 2 to 100, and wherein A and/or B has therein a fluorene frame represented by the following formula (2) wherein each of R1, R2, R3 and R4 independently represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a (hetero)aryl group having 4 to 10 carbon atoms, a hydroxyl group, an alkoxy group, a halogeno group, an amino group, or a sulfenyl group; and (B) a reaction accelerator.

Abstract: This polyimide film is superior in heat resistance, rigidity and high frequency properties, is free of inconveniences due to curling even when various functional layers are laminated by heating, and is preferable as a substrate film superior in thermal degradation stability for electronic parts. This polyimide film has a planar orientation coefficient of 0.79-0.89 as measured by an X-ray diffraction method, a difference in the surface planar orientation degree between one surface thereof and the other surface thereof of not more than 2 and a curling degree of not more than 5%, which is obtained by imidation of a polyimide precursor film having a particular imidation rate.

Abstract: A polishing pad includes a polishing layer having abrasive grains dispersed in a resin and is characterized in that the resin is a resin containing ionic groups in the range of 20 to 1500 eq/ton.

Abstract: A polishing pad includes at least a polishing layer and a cushion layer and is characterized in that the difference in hardness in Shore D hardness between the polishing layer and the cushion layer is 3 or more.

Abstract: The easy-to-tear stretched aliphatic polyester film of the present invention is characterized in that the edge tear strength in the longitudinal direction and the transverse direction is not more than 22 N. The easy-to-tear stretched aliphatic polyester film of the present invention is produced by a method of irradiation of actinic rays on an aliphatic polyester film or a method of film-forming a film obtained by laminating aliphatic polyesters having different melting points in three layers of A/B/A under particular film-forming conditions.

Abstract: An oriented syndiotactic polystyrene-based film composed of an oriented film made of a syndiotactic styrene polymer and an adhesiveness-improving layer formed from a specific water-dispersible resin on at least one surface of the oriented film, which is excellent in the tight adhesion between the oriented film and the adhesiveness-improving layer, the adhesion between the adhesiveness-improving layer and an ink layer or laminate layer applied thereon, economical efficiency, recyclability, and environmental compatibility in production. It is particularly preferable that the film be produced by applying the aqueous dispersion of the water-dispersible resin on unstretched or uniaxially stretched film to form the adhesiveness-improving layer, stretching the obtained laminate uni- or bi-axially at least one time, and then heat-treating the resulting laminate.

Abstract: The adhesive sheet contains a substrate film and an adhesive layer formed at least on one surface of the substrate film. The substrate film is made of a polyimide film showing a degree of curl after a heat treatment at 300° C. of not more than 10%. The adhesive sheet of the present invention can be used for electronic parts and the like exposed to high temperature particularly because warpage and distortion thereof caused by a high temperature treatment are suppressed, and can improve quality and yield of electronic parts and the like.

Abstract: The thin film-laminated polyimide film contains a substrate film and a thin film layer formed at least on one surface of the substrate film. The substrate film is made of a polyimide film showing a degree of curl after a heat treatment at 300° C. of not more than 10%. Use of this thin film-laminated polyimide film as a substrate of electronic parts such as solar battery, capacitor and the like exposed to high temperatures prevents easy development of warpage and distortion during production, and can improve quality and yield of electronic parts.

Abstract: A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.

Abstract: A curable resin composition that forms a continuous phase and a dispersoid at normal temperatures, wherein the continuous phase is a liquid at normal temperatures and comprises (a) an epoxy compound having two or more epoxy groups in a molecule, and the dispersoid comprises (b) a compound present as solid particles in a continuous phase at normal temperatures and having two or more amino groups in a molecule (preferably, an aromatic amine compound having a benzoxazole structure). The present invention provides a one-component epoxy curable composition superior in the preservation stability and showing good properties of the cured product.

Abstract: This polyimide film is superior in heat resistance, rigidity and high frequency properties, is free of inconveniences due to curling even when various functional layers are laminated by heating, and is preferable as a substrate film superior in thermal degradation stability for electronic parts. This polyimide film has a planar orientation coefficient of 0.79-0.89 as measured by an X-ray diffraction method, a difference in the surface planar orientation degree between one surface thereof and the other surface thereof of not more than 2 and a curling degree of not more than 5%, which is obtained by imidation of a polyimide precursor film having a particular imidation rate.

Abstract: The polishing pad of this invention is a polishing pad effecting stable planarizing processing, at high polishing rate, materials requiring surface flatness at high level, such as a silicon wafer for semiconductor devices, a magnetic disk, an optical lens etc. This invention provides a polishing pad which can be subjected to surface processing to form a sheet or grooves, is excellent in thickness accuracy, attains a high polishing rate, achieves a uniform polishing rate, and also provides a polishing pad which is free of quality variations resulting from an individual variation, easily enables a change the surface patterns, enables fine surface pattern, is compatible with various materials to be polished, is free of burrs upon forming the pattern. This invention provides a polishing pad which can have abrasive grains mixed at very high density without using slurry, and generates few scratches by preventing aggregation of abrasive grains dispersed therein.

Abstract: A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.

Abstract: A polishing pad includes at least a polishing layer and a cushion layer and is characterized in that the difference in hardness in Shore D hardness between the polishing layer and the cushion layer is 3 or more.

Abstract: A polishing pad includes a polishing layer having abrasive grains dispersed in a resin and is characterized in that the resin is a resin containing ionic groups in the range of 20 to 1500 eq/ton.

Abstract: An oriented syndiotactic polystyrene-based film composed of an oriented film made of a syndiotactic styrene polymer and an adhesiveness-improving layer formed from a specific water-dispersible resin on at least one surface of the oriented film, which is excellent in the tight adhesion between the oriented film and the adhesiveness-improving layer, the adhesion between the adhesiveness-improving layer and an ink layer or laminate layer applied thereon, economical efficiency, recyclability, and environmental compatibility in production. It is particularly preferable that the film be produced by applying the aqueous dispersion of the water-dispersible resin on unstretched or uniaxially stretched film to form the adhesiveness-improving layer, stretching the obtained laminate uni- or bi-axially at least one time, and then heat-treating the resulting laminate.

Abstract: An emission control system has a catalyst and a sensor responding to a component of exhaust gas. In order to speed warming up the catalyst, the emission control system increases the amount of heat dissipated by exhaust gas. A diagnosis of the emission control system is carried out by determining whether the amount of heat dissipated by exhaust gas is sufficient or insufficient. The amount of heat dissipated by exhaust gas is represented by the length of time to an activated state of the sensor. In the diagnosis, the amount of heat generated by a heater provided in the sensor is taken into consideration.

Abstract: A detector (29) detects that a refrigerant gas has leaked from a refrigeration cycle, or detects in advance that a refrigerant is to leak. The alarming device (27) gives users an alarming signal warning against the refrigerant leak. The alarming device (27) is caused to stop giving an alarming signal after users open doors of storage compartments including a refrigerator compartment (4), a vegetable storage compartment (5) and a freezer compartment (6). For example, after all the doors of the storage compartments are opened, giving the alarming signal is stopped. Otherwise, giving the alarming signal is stopped after the door of a storage compartment into which cold air flows by causing a damper (12) to open is opened.

Abstract: The easy-to-tear stretched aliphatic polyester film of the present invention is characterized in that the edge tear strength in the longitudinal direction and the transverse direction is not more than 22 N. The easy-to-tear stretched aliphatic polyester film of the present invention is produced by a method of irradiation of actinic rays on an aliphatic polyester film or a method of film-forming a film obtained by laminating aliphatic polyesters having different melting points in three layers of A/B/A under particular film-forming conditions.

Abstract: The polishing pad of this invention is a polishing pad effecting stable planarizing processing, at high polishing rate, materials requiring surface flatness at high level, such as a silicon wafer for semiconductor devices, a magnetic disk, an optical lens etc. This invention provides a polishing pad which can be subjected to surface processing to form a sheet or grooves, is excellent in thickness accuracy, attains a high polishing rate, achieves a uniform polishing rate, and also provides a polishing pad which is free of quality variations resulting from an individual variation, easily enables a change the surface patterns, enables fine surface pattern, is compatible with various materials to be polished, is free of burrs upon forming the pattern. This invention provides a polishing pad which can have abrasive grains mixed at very high density without using slurry, and generates few scratches by preventing aggregation of abrasive grains dispersed therein.