Patents by Inventor Masayuki Utsumi

Masayuki Utsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10957815
    Abstract: To provide a light-emitting device for achieving fluorescence emission with higher efficiency and longer life, a light-emitting device includes an exciton generation layer in which quantum dots are dispersed, a light-emitting layer in which light emitters, which are phosphors or phosphorescent members, are dispersed, the light-emitting layer adjoining the exciton generation layer in a vertical direction, a first electrode located on a lower side of the exciton generation layer and the light-emitting layer, and a second electrode located on an upper side of the exciton generation layer and the light-emitting layer, and the light emission spectrum of the quantum dots and the absorption spectrum of the light emitters at least partially overlap.
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: March 23, 2021
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yuto Tsukamoto, Shinichi Kawato, Tokiyoshi Umeda, Manabu Niboshi, Youhei Nakanishi, Hisayuki Utsumi, Masayuki Kanehiro, Shota Okamoto
  • Publication number: 20210066630
    Abstract: To provide a light-emitting device that can obtain fluorescence having a narrow spectrum more efficiently, a light-emitting device includes: a light-emitting layer in which thermally activated delayed fluorescence bodies and quantum dots are dispersed; a first electrode in a lower layer than the light-emitting layer and a second electrode in an upper layer than the light-emitting layer, wherein a light emission spectrum of the thermally activated delayed fluorescence bodies and an absorption spectrum of the quantum dots at least partially overlap each other.
    Type: Application
    Filed: September 5, 2017
    Publication date: March 4, 2021
    Inventors: YUTO TSUKAMOTO, SHINICHI KAWATO, TOKIYOSHI UMEDA, MANABU NIBOSHI, YOUHEI NAKANISHI, HISAYUKI UTSUMI, MASAYUKI KANEHIRO, SHOTA OKAMOTO
  • Publication number: 20210024823
    Abstract: A QD particle dispersion contains a surface modification compound that protects a surface of QD phosphor particles dispersed in a solvent. The surface modification compound includes a heteroatom-containing functional group and a chain-type saturated hydrocarbon group. The QD particle dispersion is configured such that the absolute value of a difference between the surface free energy of an underlayer that provides a foundation for forming a QD layer in the light-emitting element and the surface free energy of the QD layer is 5 mN/m or less.
    Type: Application
    Filed: March 26, 2018
    Publication date: January 28, 2021
    Inventors: KANAKO NAKATA, TATSUYA RYOHWA, HIROSHI FUKUNAGA, MAKOTO IZUMI, YOUHEI NAKANISHI, HISAYUKI UTSUMI, MASAYUKI KANEHIRO
  • Publication number: 20200381585
    Abstract: To provide a light-emitting device for achieving fluorescence emission with higher efficiency and longer life, a light-emitting device includes an exciton generation layer in which quantum dots are dispersed, a light-emitting layer in which light emitters, which are phosphors or phosphorescent members, are dispersed, the light-emitting layer adjoining the exciton generation layer in a vertical direction, a first electrode located on a lower side of the exciton generation layer and the light-emitting layer, and a second electrode located on an upper side of the exciton generation layer and the light-emitting layer, and the light emission spectrum of the quantum dots and the absorption spectrum of the light emitters at least partially overlap.
    Type: Application
    Filed: September 5, 2017
    Publication date: December 3, 2020
    Inventors: Yuto TSUKAMOTO, Shinichi KAWATO, Tokiyoshi UMEDA, Manabu NIBOSHI, Youhei NAKANISHI, Hisayuki UTSUMI, Masayuki KANEHIRO, Shota OKAMOTO
  • Patent number: 10773280
    Abstract: An ultrasonic treatment apparatus including: an ultrasonic bath for performing an ultrasonic treatment on a treatment target object; a first ultrasonic vibrator provided on the front surface side of the treatment target object; and a second ultrasonic vibrator provided on the back surface side of the treatment target object; wherein the first ultrasonic vibrator does not face the second ultrasonic vibrator.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: September 15, 2020
    Assignee: C. UYEMURA & CO., LTD.
    Inventors: Hisamitsu Yamamoto, Masayuki Utsumi, Yoshikazu Saijo, Tomoji Okuda, Yutaka Nishinaka, Yoshinori Nakanishi
  • Publication number: 20200276608
    Abstract: A surface treatment apparatus for subjecting a workpiece immersed at least partly in a solution to a surface treatment has: a spray nozzle facing the workpiece for spraying a treatment solution towards a working surface of the workpiece. The surface treatment apparatus has at least one of: a spray nozzle rotator to rotate the spray nozzle in a plane parallel to the working surface of the workpiece; or a workpiece rotator to rotate the workpiece in a plane perpendicular to a spraying direction of the treatment solution sprayed from the spray nozzle.
    Type: Application
    Filed: August 23, 2018
    Publication date: September 3, 2020
    Inventors: Tomoji OKUDA, Daisuke MATSUYAMA, Shinji TACHIBANA, Masayuki UTSUMI
  • Publication number: 20200224315
    Abstract: In a flow down type surface treating apparatus, a scattering amount of a processing solution is reduced. A film forming mechanism 110 is provided on an inlet side and an outlet side of each treatment chamber. The film forming mechanism 110 ejects a continuous laminar liquid under pressure of about 0.01 MPa at a flow rate of 5 to 10 L/min. Such a liquid film prevents droplets reflected on a surface of an antiscattering member 60 from splashing and entering the adjacent treatment chamber. When a plate-like work 10 is shaken to collide with the liquid film, the film flows down along the plate-like work 10 since the film formed by the film forming mechanism 110 is liquid. Thereby, a shake of the plate-like work 10 is converged. An amount of air flowing in toward a transport direction in each treatment chamber is reduced.
    Type: Application
    Filed: December 26, 2019
    Publication date: July 16, 2020
    Inventors: Masayuki UTSUMI, Masaharu TAKEUCHI
  • Publication number: 20200224314
    Abstract: In a flow down type surface treating apparatus, a scattering amount of a processing solution Q is reduced. A honeycomb member 60 is provided vertically below a transport hanger 16. The honeycomb member 60 consists of a plurality of tubular members with hexagonal holes connected together. When the processing solution Q falls in a vertical direction (in the direction of an arrow ?), the processing solution Q passes through through-holes of the honeycomb member 60. When the processing solution Q hits liquid level H, a part of it is reflected. Since a part of the reflected processing solution Q is reflected obliquely, it collides with an inner wall of the through-hole of the honeycomb member 60. As a result, the amount of the treatment liquid Q that emerges again on an upper surface of the through-holes is reduced. Thereby, the honeycomb member 60 exhibits a scattering prevention function.
    Type: Application
    Filed: December 26, 2019
    Publication date: July 16, 2020
    Inventors: Masayuki UTSUMI, Masaharu TAKEUCHI
  • Publication number: 20200080204
    Abstract: To provide surface treatment that can reduce occurrence of defects caused by incorporation of dust. Rollers 40 are rotatably fixed to rotating shafts 72 provided to protrude from lateral protective walls 49. The lateral protective walls 49 are fixed perpendicularly to lower protective walls 47 fixed to outer walls 39. Hanging plates 64 of a hanger 50 extend through a space 43 between both lower protective walls 47 and support clips 52. A liquid 41, such as water, is filled in spaces defined by the lateral protective walls 49, the lower protective walls 47, and the outer walls 39. The liquid 41 is filled to cover about half of each rotating shaft 72. Thus, fine dust generated by a transferring mechanism is captured by the liquid 41 and prevented from drifting from the space 34 toward the substrate 54.
    Type: Application
    Filed: November 12, 2019
    Publication date: March 12, 2020
    Inventors: Masayuki UTSUMI, Nobuhiko NAKA
  • Patent number: 10576492
    Abstract: A surface treating apparatus that suppresses occurrence of defects is provided. A treatment solution is accumulated in a tank 15 through a treatment solution collecting port/air discharging port 13 in a lower portion of a body 4. An air heated by the treatment solution flows toward an upper portion (portion without the treatment solution) of the tank 15 via the treatment solution collecting port/air discharging port 13 in the lower portion of the body 4, and is discharged via an exhaust duct 17. In this way, the air that is heated and tends to flow upward in the body 4 is discharged from the lower portion thereof and is replaced with an external air from the upper portion thereof. Accordingly, the air in the body 4 can be maintained at a uniform temperature. Thus, the treatment solution that reaches a lower portion of a substrate 54 from an upper portion thereof can be maintained at a uniform temperature.
    Type: Grant
    Filed: October 6, 2017
    Date of Patent: March 3, 2020
    Assignee: C. UYEMURA & CO., LTD.
    Inventors: Masayuki Utsumi, Masahito Tanigawa
  • Patent number: 10513779
    Abstract: To provide surface treatment that can reduce occurrence of defects caused by incorporation of dust. Rollers 40 are rotatably fixed to rotating shafts 72 provided to protrude from lateral protective walls 49. The lateral protective walls 49 are fixed perpendicularly to lower protective walls 47 fixed to outer walls 39. Hanging plates 64 of a hanger 50 extend through a space 43 between both lower protective walls 47 and support clips 52. A liquid 41, such as water, is filled in spaces defined by the lateral protective walls 49, the lower protective walls 47, and the outer walls 39. The liquid 41 is filled to cover about half of each rotating shaft 72. Thus, fine dust generated by a transferring mechanism is captured by the liquid 41 and prevented from drifting from the space 34 toward the substrate 54.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: December 24, 2019
    Assignee: C. UYEMURA & CO., LTD.
    Inventors: Masayuki Utsumi, Nobuhiko Naka
  • Publication number: 20190359331
    Abstract: A substrate working system includes a plurality of substrate working apparatuses, a component storage that stores a device and a component to be used by the substrate working apparatuses, and a component conveyance flight vehicle. The component conveyance flight vehicle conveys a conveyance article by flying from the component storage to a predetermined position corresponding to a predetermined substrate working apparatus while holding the conveyance article based on necessary article information of the substrate working apparatuses.
    Type: Application
    Filed: September 16, 2016
    Publication date: November 28, 2019
    Applicant: YAMAHA HATSUDOKI KABUSHIKI KAISHA
    Inventors: Masayuki NAKANO, Tomoyoshi UTSUMI
  • Patent number: 10477695
    Abstract: A drying apparatus of the present invention includes a drying tank for performing drying processing of a workpiece, a fixture for the workpiece, heating means opposed to a front surface of the workpiece, and heating means opposed to a back surface of the workpiece, wherein each heating means is inclined from a horizontal line in its longitudinal direction.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: November 12, 2019
    Assignee: C. UYEMURA & CO., LTD.
    Inventors: Masayuki Utsumi, Tomoji Okuda, Yutaka Nishinaka, Daisuke Matsuyama
  • Patent number: 10435778
    Abstract: A device capable of performing surface treatment evenly to an upper portion of a substrate is provided. An upper end of a substrate 54 is sandwiched and held by a clip 52 of a hanger 50. A pipe 56 as a treatment solution releasing section is provided on each side of the substrate 54 that is held by the hanger 50. This pipe 56 is provided with a hole 58 from which the treatment solution is released obliquely upward. The released treatment solution flows down on a surface of the substrate 54, reaches a lower portion thereof, is circulated by a pump 60, and is released from the pipe 56 again.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: October 8, 2019
    Assignee: C. UYEMURA & CO., LTD.
    Inventors: Masayuki Utsumi, Hisamitsu Yamamoto, Syunsaku Hoshi, Junji Mizumoto
  • Publication number: 20190301048
    Abstract: A rotational surface treating device with a high treatment efficiency that allows a treatment liquid to be discharged in a short time is provided. When a treatment bath 2 is rotated, parts 20 contact an electrode 50 to be electroplated. In this event, a plating liquid 16 is used as circulated by a pump P. The plating liquid 16 is discharged to the outside through a gap in a side wall 80 for replacement of the plating liquid 16 or the like. During discharge, the plating liquid 16 is not circulated by the pump P. The gap 8 which is formed in the side wall 80 is formed to be smaller than the minimum dimension of the parts 20 on the inner side. The gap 8 is formed to be wider toward the outer side. Thus, water is discharged immediately.
    Type: Application
    Filed: January 21, 2019
    Publication date: October 3, 2019
    Inventors: Teruyuki HOTTA, Kouji SHIMIZU, Masayuki UTSUMI, Masato ARATANI
  • Patent number: 10138558
    Abstract: The ampholytic surfactants show the nature of anionic surfactants in an alkaline region and the nature of cationic surfactants in an acidic region. As described below, the pretreatment solution of the present invention may preferably indicate alkalinity of pH 8.5 or higher, and therefore, it exhibits the nature of cationic surfactants by the use of ampholytic surfactants. As the ampholytic surfactants, those disclosed in JP 2011-228517 A can be used.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: November 27, 2018
    Assignee: C. UYEMURA & CO., LTD.
    Inventors: Yoshikazu Saijo, Hisamitsu Yamamoto, Tetsuji Ishida, Takuya Komeda, Masayuki Utsumi
  • Publication number: 20180133760
    Abstract: An ultrasonic treatment apparatus including: an ultrasonic bath for performing an ultrasonic treatment on a treatment target object; a first ultrasonic vibrator provided on the front surface side of the treatment target object; and a second ultrasonic vibrator provided on the back surface side of the treatment target object; wherein the first ultrasonic vibrator does not face the second ultrasonic vibrator.
    Type: Application
    Filed: November 1, 2017
    Publication date: May 17, 2018
    Inventors: Hisamitsu YAMAMOTO, Masayuki UTSUMI, Yoshikazu SAIJO, Tomoji OKUDA, Yutaka NISHINAKA, Yoshinori NAKANISHI
  • Publication number: 20180117618
    Abstract: A surface treating apparatus that suppresses occurrence of defects is provided. A treatment solution is accumulated in a tank 15 through a treatment solution collecting port/air discharging port 13 in a lower portion of a bath 4. An air heated by the treatment solution flows toward an upper portion (portion without the treatment solution) of the tank 15 via the treatment solution collecting port/air discharging port 13 in the lower portion of the bath 4, and is discharged via an exhaust duct 17. In this way, the air that is heated and tends to flow upward in the bath 4 is discharged from the lower portion thereof and is replaced with an external air from the upper portion thereof. Accordingly, the air in the bath 4 can be maintained at a uniform temperature. Thus, the treatment solution that reaches a lower portion of a substrate 54 from an upper portion thereof can be maintained at a uniform temperature.
    Type: Application
    Filed: October 6, 2017
    Publication date: May 3, 2018
    Inventors: Masayuki UTSUMI, Masahito TANIGAWA
  • Publication number: 20180110128
    Abstract: A drying apparatus of the present invention includes a drying tank for performing drying processing of a workpiece, a fixture for the workpiece, heating means opposed to a front surface of the workpiece, and heating means opposed to a back surface of the workpiece, wherein each heating means is inclined from a horizontal line in its longitudinal direction.
    Type: Application
    Filed: October 17, 2017
    Publication date: April 19, 2018
    Inventors: Masayuki UTSUMI, Tomoji OKUDA, Yutaka NISHINAKA, Daisuke MATSUYAMA
  • Publication number: 20180100237
    Abstract: To provide surface treatment that can reduce occurrence of defects caused by incorporation of dust. Rollers 40 are rotatably fixed to rotating shafts 72 provided to protrude from lateral protective walls 49. The lateral protective walls 49 are fixed perpendicularly to lower protective walls 47 fixed to outer walls 39. Hanging plates 64 of a hanger 50 extend through a space 43 between both lower protective walls 47 and support clips 52. A liquid 41, such as water, is filled in spaces defined by the lateral protective walls 49, the lower protective walls 47, and the outer walls 39. The liquid 41 is filled to cover about half of each rotating shaft 72. Thus, fine dust generated by a transferring mechanism is captured by the liquid 41 and prevented from drifting from the space 34 toward the substrate 54.
    Type: Application
    Filed: September 6, 2017
    Publication date: April 12, 2018
    Inventors: Masayuki UTSUMI, Nobuhiko NAKA