Abstract: To provide a medium suitable for high speed/high resolution, rich in hydrophilicity and resistant to a high concentration aqueous alkaline solution. A medium comprising crosslinked polymer particles containing from 20 to 95 mol % of repeating units derived from a (meth)acryloyl monomer represented by the formula (1): wherein R2 is a hydrogen atom or a C1-4 alkyl group, R1 is —NR3—R4-R5 or —O—R4-R5, R3 is a hydrogen atom or a C1-4 alkyl group, R4 is a C6-15 alkylene group containing an alicyclic ring or a C4-8 linear alkylene group, and R5 is a halogen atom, an alcoholic OH group, an amino group, a glycidyl group or an epoxy group.

Abstract: A planarizing material comprising a resin capable of having its practical temperature for a planarizing step set at a level lower than 200.degree. C., and a melamine-type heat-curing agent and/or an epoxy-type heat-curing agent.

Abstract: A silicon-containing polymer comprising repeating units of silicon-containing cyclic compound, represented by a general formula (I) ##STR1## (wherein m and n are zero or a positive integer, respectively, however m+n>0, and X is any of an alkyl group, alkoxy group, phenyl group, naphthyl group, substituted phenyl group and substituted naphthyl group or a mixture of these, and the substituent of said substituted phenyl group or substituted naphthyl group indicates any of halogen atom, halogenated alkyl group, amino group, aminoalkyl group and nitro group or a mixture of these), and a photosensitive material containing said silicon-containing polymer are disclosed.

Abstract: A method for producing fine patterns is disclosed, comprising spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, water and/or an organic solvent, and a polymer, on a photoresist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein the polymer in the upper layer has a structural unit shown by formula (I): ##STR1## wherein R.sub.1, R.sub.2, and R.sub.3 each represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, or a nitrile group; R.sub.4 represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, a hydroxyl group, or a carboxyl group; and X represents a hydrogen atom, an alkali metal, an alkaline earth metal, or an ammonium group.

Abstract: A positive photosensitive composition for forming lenses, which comprises a polymer, a photosensitive agent, a thermosetting agent and a solvent, wherein said polymer is an alkali-soluble resin, said photosensitive agent is a 1,2-naphthoquinone diazide sulfonate, and said thermosetting agent is a thermosetting agent capable of imparting heat resistance and solvent resistance at the time of forming lenses by heat treatment.

Abstract: A thin film of conductive high molecular compound is formed on a substrate such as Si followed by a heat treatment, and thereafter an electron beam exposure and subsequent development are made, to form pattern of the thin film of conductive high molecular compound; this method can eliminate forming of metal film to prevent the electron charge, can prevent charging of resist in electron-beam exposure or further prevent proximity effect when combined with deep ultraviolet light exposure.

Abstract: A silicon-containing polymer comprising repeating units of silicon-containing cyclic compound, represented by a general formula (I) ##STR1## (wehrein m and n are positive integers including 0, respectively, however m+n>0, and X is any of alkyl group, alkoxy group, phenyl group, naphthyl group, substituted phenyl group and substituted naphthyl group or a mixture of these, and the substituent of said substituted phenyl group or substituted naphthyl group indicates any of halogen atom, halogenated alkyl group, amino group, aminoalkyl group and nitro group or a mixture of these), and a photosensitive material containing said silicon-containing polymer are disclosed.

Abstract: Amine catalysts useful for producing polyurethane foams coated with skin by reaction of an organic polyisocyanate with a polyol. The catalysts comprise 4-methyl-1-(2-hydroxyalkyl)-piperazine, and emit no bad odor, give excellent moldability and are free from deterioration of skin and discoloration of covering materials.

Abstract: Process for producing a high density elastic polyurethane of reduced weight having excellent resistance to bending, which employs as catalyst 4-methyl-1-(2-dimethylaminoethyl)piperazine or a mixture of 4-methyl-1-(2-dimethylaminoethyl)piperazine and another tertiary amine compound as co-catalyst.

Abstract: Disclosed is a catalytic composition comprising a substance having the general formula: ##STR1## where R.sub.1 is an alkyl group having 1 to 3 C atoms and R.sub.2 is a group selected from --H, --CH.sub.3 and CH.sub.2 CH.sub.3.The catalytic composition is odorless and excellent in the urethane forming reaction in production of polyurethane.