Abstract: The position of the sample is measured and used to correct for any off-axis motion during tomography using x-ray projection microscope system with a rotation stage system. The position is sensed using a precision-machined, low-CTE gold-coated cylinder or disc and three to five capacitive distance sensors. The correction can then be performed purely as image processing in software, by applying an appropriate shift in X and Y of the captured x-ray projections. A calibration is often necessary for each system (gold disc plus sensors plus sample stage) to account for any machining errors of the gold disc or positioning errors of the capacitive sensors. This calibration should also be repeated whenever any maintenance is performed on the metrology setup.

Abstract: Presented are wireless apparatuses, systems, and methods for locating items. According to one embodiment, the apparatus includes a sensor module and an indicator module capable of wireless communication.

Abstract: One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.

Abstract: One or more problems related to processing workpieces using processes that involve optical radiation are presented along with solutions to one or more of the problems. One embodiment of the invention comprises a sensor apparatus for collecting optical radiation data representing one or more process conditions used for processing a workpiece. In a further embodiment, the sensor apparatus is also configured for measuring data other than optical radiation.

Abstract: A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.

Abstract: Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.

Abstract: This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.