Patents by Inventor Masotoshi Tsuneoka

Masotoshi Tsuneoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern inspection apparatus and method
    Patent number: 9189843
    Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: November 17, 2015
    Assignee: NGR Inc.
    Inventors: Tadashi Kitamura, Toshiaki Hasebe, Masotoshi Tsuneoka
  • Pattern inspection apparatus and method
    Patent number: 8285031
    Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: October 9, 2012
    Assignee: NGR Inc.
    Inventors: Tadashi Kitamura, Toshiaki Hasebe, Masotoshi Tsuneoka
  • PATTERN INSPECTION APPARATUS AND METHOD
    Publication number: 20110235895
    Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
    Type: Application
    Filed: June 2, 2011
    Publication date: September 29, 2011
    Applicant: NGR INC.
    Inventors: Tadashi Kitamura, Toshiaki Hasebe, Masotoshi Tsuneoka