Abstract: An apparatus for manufacturing a semiconductor or liquid crystal, which is provided, within a reaction chamber 9, a ceramic holder 1 within which is embedded a resistive heating element 3, and a cylindrical support member 2 one end 2a of which supports a ceramic holder 1 and the other end 2b of which is fixed to the reaction chamber 9, wherein one end 2a of the cylindrical support member 2 is hermetically bonded to the ceramic holder 1 whereas a partition plate 6 and a sealing material 7 are used for hermetic sealing on the side of the other end 2b. In this semiconductor or liquid crystal manufacturing apparatus, it is preferable that the space within the cylindrical support member 2 partitioned by the ceramic holder 1 and the partition plate 6 be depressurized to vacuum or to a reduced pressure atmosphere of an inert gas.