Abstract: Provided is a substrate cleaning device, an abnormality determination method of a substrate cleaning device, and an abnormality determination program of a substrate cleaning device for determining whether there is an abnormality in a roll cleaning member that is attached. A substrate cleaning device includes: a holder to which a roll cleaning member for cleaning a substrate is attached in a detachable manner; a rotation device which makes the roll cleaning member attached to the holder rotate; a sensor which measures information concerning a vibration of the roll cleaning member during rotation; and a control device which determines, based on a measurement result of the sensor, whether there is an abnormality in the roll cleaning member attached to the holder.

Abstract: According to one embodiment of the present disclosure, provided is a substrate cleaning method that performs an operation, in a state where a cleaning member is in contact with a rotating substrate, the cleaning member is moved between a first position on the substrate and a second position close to an edge of the substrate, n times (n is an integer of 2 or more), wherein a controller, which controls a driver that moves the cleaning member, controls the driver to perform an edge cleaning step to perform cleaning of the substrate in a state where the cleaning member is in contact with the second position on the substrate for a predetermined period of time after the cleaning member reaches the second position at least in one operation of the first to the (n-1)th operations.

Abstract: A substrate conveyance method, a substrate processing device, and a recording medium are provided. The substrate conveyance method includes: conveying a substrate into a receiving unit and confirming that the substrate is present in the receiving unit by detecting that light irradiated from an optical sensor is blocked by the substrate conveyed to the receiving unit; and stopping light irradiation from the optical sensor before the substrate is conveyed out from the receiving unit.

Abstract: Provided is a substrate cleaning device, an abnormality determination method of a substrate cleaning device, and an abnormality determination program of a substrate cleaning device for determining whether there is an abnormality in a roll cleaning member that is attached. A substrate cleaning device includes: a holder to which a roll cleaning member for cleaning a substrate is attached in a detachable manner; a rotation device which makes the roll cleaning member attached to the holder rotate; a sensor which measures information concerning a vibration of the roll cleaning member during rotation; and a control device which determines, based on a measurement result of the sensor, whether there is an abnormality in the roll cleaning member attached to the holder.

Abstract: According to one embodiment of the present disclosure, provided is a substrate cleaning method that performs an operation, in a state where a cleaning member is in contact with a rotating substrate, the cleaning member is moved between a first position on the substrate and a second position close to an edge of the substrate, n times (n is an integer of 2 or more), wherein a controller, which controls a driver that moves the cleaning member, controls the driver to perform an edge cleaning step to perform cleaning of the substrate in a state where the cleaning member is in contact with the second position on the substrate for a predetermined period of time after the cleaning member reaches the second position at least in one operation of the first to the (n-1)th operations.

Abstract: A substrate processing apparatus includes transport mechanisms 121a to 127a, a sensor 40 for detecting whether a wafer W is held by the transport mechanisms 121a to 127a, a sensor controller 82 for controlling the sensor 40, a position information acquiring part 81 for acquiring position information of the substrate W in the transport passage, a detection result acquiring part 83 for acquiring a detection result from the sensor 40, and a determination processor 84 for determining whether the detection result of the sensor and the position information are consistent with each other. When it is determined that the detection result of the sensor 40 is inconsistent with the position information, the sensor controller 82 makes the sensor 40 retry to detect whether the substrate W is held.

Abstract: A substrate processing apparatus includes transport mechanisms 121a to 127a, a sensor 40 for detecting whether a wafer W is held by the transport mechanisms 121a to 127a, a sensor controller 82 for controlling the sensor 40, a position information acquiring part 81 for acquiring position information of the substrate W in the transport passage, a detection result acquiring part 83 for acquiring a detection result from the sensor 40, and a determination processor 84 for determining whether the detection result of the sensor and the position information are consistent with each other. When it is determined that the detection result of the sensor 40 is inconsistent with the position information, the sensor controller 82 makes the sensor 40 retry to detect whether the substrate W is held.