Patents by Inventor Materion Advanced Materials Technologies and Services Inc.

Materion Advanced Materials Technologies and Services Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DIRECT COOLED ROTARY SPUTTERING TARGET
    Publication number: 20130192981
    Abstract: A rotary deposition target bonded to a backing tube such that the bonding material is applied only at the ends of the rotary sputtering target to form a gap between the rotary sputtering target and the backing tube to enable a target cooling fluid used during the deposition process to contact the target directly and to provide a hermetic seal to contain the cooling fluid within the gap and prevent the fluid from being exposed to the environment within the deposition chamber.
    Type: Application
    Filed: February 1, 2013
    Publication date: August 1, 2013
    Applicant: Materion Advanced Materials Technologies and Services Inc.
    Inventor: Materion Advanced Materials Technologies and Services Inc.