Patents by Inventor Matheus Ana Karel VAN LIEROP

Matheus Ana Karel VAN LIEROP has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200050116
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: October 18, 2019
    Publication date: February 13, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Ana Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS