Patents by Inventor Matheus Wilhelmus Kerkhof

Matheus Wilhelmus Kerkhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6704388
    Abstract: An X-ray examination apparatus includes an X-ray source (1) for emitting an X-ray beam (8) having a central X-ray extending along a central beam line (4). There is also provided an X-ray detector (2) for picking up X-ray images. The X-ray source (1) and the X-ray detector (2) are rotatable together around an axis of rotation (3). The X-ray examination apparatus is provided with a calibration system (6, 7). Calibration images of the calibration phantom (6) are formed from different, preferably opposed directions of the X-ray beam (8). The zero orientation of the X-ray source (1) with the X-ray detector (2) is derived from differences in positions of the same aspect of the calibration phantom in the respective calibration images. The central beam line (4) extends perpendicularly to the axis of rotation (3) in the zero orientation.
    Type: Grant
    Filed: October 30, 2001
    Date of Patent: March 9, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Johannes Catharina Antonius Op De Beek, Matheus Wilhelmus Kerkhof
  • Publication number: 20020080909
    Abstract: An X-ray examination apparatus includes an X-ray source (1) for emitting an X-ray beam (8) having a central X-ray extending along a central beam line (4). There is also provided an X-ray detector (2) for picking up X-ray images. The X-ray source (1) and the X-ray detector (2) are rotatable together around an axis of rotation (3). The X-ray examination apparatus is provided with a calibration system (6, 7). Calibration images of the calibration phantom (6) are formed from different, preferably opposed directions of the X-ray beam (8). The zero orientation of the X-ray source (1) with the X-ray detector (2) is derived from differences in positions of the same aspect of the calibration phantom in the respective calibration images. The central beam line (4) extends perpendicularly to the axis of rotation (3) in the zero orientation.
    Type: Application
    Filed: November 30, 2001
    Publication date: June 27, 2002
    Inventors: Johannes Catharina Antonius Op De Beek, Matheus Wilhelmus Kerkhof