Patents by Inventor Mathew Cheeran Abraham

Mathew Cheeran Abraham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for extending target material delivery system lifetime
    Patent number: 11690159
    Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: June 27, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Rollinger, Georgiy Olegovich Vaschenko, Chirag Rajyaguru, Alexander Igorevich Ershov, Joshua Mark Lukens, Mathew Cheeran Abraham
  • APPARATUS AND METHOD FOR EXTENDING TARGET MATERIAL DELIVERY SYSTEM LIFETIME
    Publication number: 20210392733
    Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
    Type: Application
    Filed: October 25, 2019
    Publication date: December 16, 2021
    Inventors: Bob Rollinger, Georgiy Olegovich Vaschenko, Chirag Rajyaguru, Alexander Igorevich Ershov, Joshua Mark Lukens, Mathew Cheeran Abraham
  • System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
    Patent number: 11013096
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: May 18, 2021
    Assignee: ASML Nettherlands B.V.
    Inventors: Jonghoon Baek, Mathew Cheeran Abraham, David Robert Evans, Jack Michael Gazza
  • SYSTEM, METHOD AND APPARATUS FOR TARGET MATERIAL DEBRIS CLEANING OF EUV VESSEL AND EUV COLLECTOR
    Publication number: 20200037428
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Application
    Filed: October 7, 2019
    Publication date: January 30, 2020
    Inventors: Jonghoon BAEK, Mathew Cheeran ABRAHAM, David Robert EVANS, Jack Michael GAZZA
  • System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
    Patent number: 10477662
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: November 12, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jonghoon Baek, Mathew Cheeran Abraham, David Robert Evans, Jack Michael Gazza
  • SYSTEM, METHOD AND APPARATUS FOR TARGET MATERIAL DEBRIS CLEANING OF EUV VESSEL AND EUV COLLECTOR
    Publication number: 20190289704
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Application
    Filed: June 7, 2019
    Publication date: September 19, 2019
    Inventors: Jonghoon BAEK, Mathew Cheeran ABRAHAM, David Robert EVANS, Jack Michael GAZZA
  • System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
    Patent number: 10362664
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: July 23, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jonghoon Baek, Mathew Cheeran Abraham, David Robert Evans, Jack Michael Gazza
  • System, Method and Apparatus for Target Material Debris Cleaning of EUV Vessel and EUV Collector
    Publication number: 20180160517
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Application
    Filed: February 2, 2018
    Publication date: June 7, 2018
    Inventors: Jonghoon Baek, Mathew Cheeran Abraham, David Robert Evans, Jack Michael Gazza
  • System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
    Patent number: 9888554
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: February 6, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Jonghoon Baek, Mathew Cheeran Abraham, David Robert Evans, Jack Michael Gazza
  • System, Method and Apparatus for Target Material Debris Cleaning of EUV Vessel and EUV Collector
    Publication number: 20170215265
    Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
    Type: Application
    Filed: January 21, 2016
    Publication date: July 27, 2017
    Inventors: Jonghoon Baek, Mathew Cheeran Abraham, David Robert Evans, Jack Michael Gazza