Patents by Inventor Mathias Beyerlein

Mathias Beyerlein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device and method for measuring surface topography and wave aberration of a lens system, in particular an eye
    Patent number: 7339658
    Abstract: A device and a method are used for measuring the surface topography and a wave aberration of a lens system. The device is fitted with a first measuring system containing a light source radiating a first light beam of a first wavelength, and a detector which captures the first light beam which is reflected on the lens system. In addition the device has a second measuring system containing a light source for radiating a second light beam of a second wavelength and a detector for capturing the second light beam transmitted by the lens system. A diffractive optical element is disposed in a common beam path of the first measuring system and second measuring system. The optical element adapts the respective wave-front course of the first light beam and the second light beam in a wavelength-selective manner.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: March 4, 2008
    Assignee: Optocraft GmbH
    Inventors: Mathias Beyerlein, Johannes Pfund
  • Device and method for measuring surface topography and wave aberration of a lens system, in particular an eye
    Publication number: 20060209256
    Abstract: A device and a method are used for measuring the surface topography and a wave aberration of a lens system. The device is fitted with a first measuring system containing a light source radiating a first light beam of a first wavelength, and a detector which captures the first light beam which is reflected on the lens system. In addition the device has a second measuring system containing a light source for radiating a second light beam of a second wavelength and a detector for capturing the second light beam transmitted by the lens system. A diffractive optical element is disposed in a common beam path of the first measuring system and second measuring system. The optical element adapts the respective wave-front course of the first light beam and the second light beam in a wavelength-selective manner.
    Type: Application
    Filed: March 13, 2006
    Publication date: September 21, 2006
    Inventors: Mathias Beyerlein, Johannes Pfund