Patents by Inventor Mathias Eichhorn
Mathias Eichhorn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6537722Abstract: A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.Type: GrantFiled: July 7, 1998Date of Patent: March 25, 2003Assignee: Afga-Gevaert AGInventors: Mathias Eichhorn, Karin Maerz, Fritz-Feo Grabley
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Publication number: 20020061460Abstract: A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.Type: ApplicationFiled: July 7, 1998Publication date: May 23, 2002Inventors: MATHIAS EICHHORN, KARIN MAERZ, FRITZ-FEO GRABLEY
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Patent number: 6100004Abstract: A positive-working or negative-working radiation-sensitive mixture includes as an IR absorbing component a carbon black pigment having a primary particle size smaller than 80 nm. The carbon black pigment is predispersed in a polymer containing acidic units having a pK.sub.a of less than 13. The radiation-sensitive component may include an ester of (i) a 1,2-naphthoquinone-2-diazide-4-sulfonic acid or a 1,2-naphthoquinone-2-diazide-5-sulfonic acid and (ii) a compound having at least one phenolic hydroxyl group, such as 3 to 6 phenolic hydroxyl groups. After imagewise radiation exposure, the recording material including the radiation-sensitive mixture can be developed without difficulties in an aqueous alkaline solution without leaving residual coating on the areas that became soluble or that remained soluble upon exposure.Type: GrantFiled: March 11, 1998Date of Patent: August 8, 2000Assignee: Agfa-Gevaert N.V.Inventors: Andreas Elsaesser, Otfried Gaschler, Helmut Haberhauer, Mathias Eichhorn, Fritz-Feo Grabley, Thomas Leichsenring, Gabor I. Koletar, Douglas A. Seeley
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Patent number: 5998567Abstract: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.Type: GrantFiled: September 18, 1997Date of Patent: December 7, 1999Assignee: Clariant GmbHInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5912105Abstract: Thermally imageable material, consisting of a substrate and two layers (a) and (b) built up thereon in the stated sequence:(a) a photopolymer layer which is sensitive to radiation in the near UV and in the visible range but not very sensitive to radiation in the infrared range and(b) a layer which is transparent to radiation in the near UV and in the visible range, only slightly permeable to oxygen and more permeable to oxygen under the influence of radiation in the infrared range than before exposure.Type: GrantFiled: December 23, 1997Date of Patent: June 15, 1999Assignee: Agfa-GevaertInventors: Helmuth Haberhauer, Mathias Eichhorn
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Patent number: 5879852Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.Type: GrantFiled: April 30, 1997Date of Patent: March 9, 1999Assignee: AGFA-Gevaert AGInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5776652Abstract: The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.Type: GrantFiled: October 14, 1997Date of Patent: July 7, 1998Assignee: Agfa-Gevaert AGInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5705317Abstract: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.Type: GrantFiled: December 5, 1995Date of Patent: January 6, 1998Assignee: AGFA-Gevaert AGInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5700621Abstract: A polymer comprising repeating units of the formula ##STR1## wherein R.sup.1 , R.sup.2 and R.sup.3 are, independently of one another, hydrogen atoms or alkyl groups,X is CO or SO.sub.2, andY and Z are, independently of one another, alkyl, alkenyl, cycloalkyl, aryl or heterocyclic radicals, or Y and Z are linked to one another and are constituents of a five-membered or six-membered hetero-cyclic ring.Type: GrantFiled: February 28, 1996Date of Patent: December 23, 1997Assignee: Agfa-Gevaert AGInventors: Mathias Eichhorn, Andreas Elsaesser
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Patent number: 5654121Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I) ,R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.Type: GrantFiled: April 27, 1995Date of Patent: August 5, 1997Assignee: Agfa-Gevaert AGInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5637441Abstract: A mechanically and/or electrochemically grained and optionally anodized base material composed of aluminum or its alloys, to which a hydrophilic layer of at least one polymer containing basic and acidic groups is applied. This layer is followed by a further hydrophilic layer which contains at least one compound containing at least one phosphono group. In addition, the invention relates to a method of producing said carrier material and to photosensitive recording material for offset printing plates produced therewith.Type: GrantFiled: June 19, 1995Date of Patent: June 10, 1997Assignee: AGFA-Gevaert AGInventors: Michael Brenk, Mathias Eichhorn, Andreas Elsaesser
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Patent number: 5612169Abstract: The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n>1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical.Type: GrantFiled: August 8, 1994Date of Patent: March 18, 1997Assignee: Hoechst AktiengesellschaftInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5529886Abstract: The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.Type: GrantFiled: May 1, 1995Date of Patent: June 25, 1996Assignee: Hoechst AktiengesellschaftInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5442087Abstract: The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.Type: GrantFiled: December 10, 1993Date of Patent: August 15, 1995Assignee: Hoechst AktiengesellschaftInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5397846Abstract: The invention relates to a process for preparing organic monomeric or polymeric compounds carrying tert-butyloxycarbonyl groups, wherein a monomeric or polymeric organic compound, which possesses at least one heteroatom with an acidic proton, such as an aliphatic or aromatic alcohol, an amide, imide or lactam, is reacted with di-tert-butyl dicarbonate in an inert solvent in the presence of about 0.01 to about 10 mol percent, relative to the compound to be converted, of a catalyst at a temperature from about 0.degree. to about 80.degree. C. The reaction solution can be used for further processing, or the reaction product can be isolated by evaporation of the solvent or by precipitation in water and drying. The compounds are preferably used in light-sensitive coatings.Type: GrantFiled: July 17, 1992Date of Patent: March 14, 1995Assignee: Hoechst AktiengesellschaftInventors: Mathias Eichhorn, Gerhard Buhr