Patents by Inventor Mathieu Kipp

Mathieu Kipp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • $M(c)method for producing inclined flank patterns by photolithography
    Publication number: 20070003839
    Abstract: The invention concerns a photolithography fabrication method enabling production of patterns in a photosensitive resin layer (601) placed on a substrate (600). The patterns (607) comprise flanks (608) inclined relative to a normal ({right arrow over (n)}) relative to the principal plane of the substrate and which have an angle of inclination (?) far greater to that of the patterns obtained according to the prior art. The invention also concerns a device allowing said method to be executed.
    Type: Application
    Filed: August 5, 2004
    Publication date: January 4, 2007
    Inventors: Marc Rabarot, Mathieu Kipp, Christophe Kopp