Patents by Inventor Mathieu Luisier

Mathieu Luisier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240340009
    Abstract: A logic circuit, comprises at least two transistors which are configured for providing a logic function, and at least one voltage-controlled threshold switch, which is arranged in at least one of the pull-up path and the pull-down path of at least one of the at least two transistors.
    Type: Application
    Filed: January 17, 2022
    Publication date: October 10, 2024
    Inventors: Jürg LEUTHOLD, Mathieu LUISIER, Bojun CHENG
  • Patent number: 8309989
    Abstract: Illustrative embodiments of a vertical tunneling field effect transistor are disclosed which may comprise a semiconductor body including a source region doped with a first dopant type and a pocket region doped with a second dopant type, where the pocket region is formed above the source region. The transistor may also comprise an insulated gate formed above the source and pocket regions, the insulated gate being configured to generate electron tunneling between the source and pocket regions if a voltage is applied to the insulated gate. The transistor may further comprise a lateral tunneling barrier formed to substantially prevent electron tunneling between the source region and a drain region of the semiconductor body, where the drain region is doped with the second dopant type.
    Type: Grant
    Filed: August 18, 2010
    Date of Patent: November 13, 2012
    Assignee: Purdue Research Foundation
    Inventors: Mathieu Luisier, Samarth Agarwal, Gerhard Klimeck
  • Publication number: 20120043607
    Abstract: Illustrative embodiments of a vertical tunneling field effect transistor are disclosed which may comprise a semiconductor body including a source region doped with a first dopant type and a pocket region doped with a second dopant type, where the pocket region is formed above the source region. The transistor may also comprise an insulated gate formed above the source and pocket regions, the insulated gate being configured to generate electron tunneling between the source and pocket regions if a voltage is applied to the insulated gate. The transistor may further comprise a lateral tunneling barrier formed to substantially prevent electron tunneling between the source region and a drain region of the semiconductor body, where the drain region is doped with the second dopant type.
    Type: Application
    Filed: August 18, 2010
    Publication date: February 23, 2012
    Inventors: Mathieu Luisier, Samarth Agarwal, Gerhard Klimeck