Abstract: A protective coating formed on a reaction chamber wall comprises a base layer comprising an oxide represented by a chemical formula of AxByOz, wherein A is a metal element, B is a metal or semiconductor element different from A, O is oxygen and each of x, y and z is >0. The protective coating is configured such that upon exposure to a fluorine (F)-containing reactant, at least a portion of the base layer reacts with the fluorine F-containing reactant and is converted to a F-containing region comprising a solid fluoride of the A.

Abstract: A gas diffuser plate in a cyclic deposition chamber is disclosed. The gas diffuser plate as fabricated comprises a substrate diffuser plate having a substrate emissivity and a coating formed on the substrate diffuser plate. The gas diffuser plate having the substrate diffuser plate coated with the coating has an emissivity higher than the substrate emissivity. The coating comprises a first layer formed on the substrate diffuser plate and comprising a first material configured to modulate the emissivity of the gas diffuser plate, and a second layer comprising a second corrosion-resistant material. The first material comprises titanium nitride oxide (TiNxOy). The emissivity of the gas diffuser plate is at least partially based on the ratio of nitrogen and oxygen in TiNxOy.